DE3484793D1 - Miniaturisierter monolithischer mehrschichtkondensator sowie geraet und verfahren zur herstellung. - Google Patents

Miniaturisierter monolithischer mehrschichtkondensator sowie geraet und verfahren zur herstellung.

Info

Publication number
DE3484793D1
DE3484793D1 DE8484114923T DE3484793T DE3484793D1 DE 3484793 D1 DE3484793 D1 DE 3484793D1 DE 8484114923 T DE8484114923 T DE 8484114923T DE 3484793 T DE3484793 T DE 3484793T DE 3484793 D1 DE3484793 D1 DE 3484793D1
Authority
DE
Germany
Prior art keywords
producing
same
multilayer capacitor
monolithic multilayer
miniaturized monolithic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8484114923T
Other languages
English (en)
Inventor
David Glen Shaw
Angelo Yializis
Donald Sumner Strycker
Mooyoung Ham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Spectrum Control Inc
Original Assignee
Spectrum Control Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Spectrum Control Inc filed Critical Spectrum Control Inc
Application granted granted Critical
Publication of DE3484793D1 publication Critical patent/DE3484793D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/56—Three layers or more
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G13/00—Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/30—Stacked capacitors
    • H01G4/306—Stacked capacitors made by thin film techniques

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Physical Vapour Deposition (AREA)
DE8484114923T 1983-12-19 1984-12-07 Miniaturisierter monolithischer mehrschichtkondensator sowie geraet und verfahren zur herstellung. Expired - Lifetime DE3484793D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56277983A 1983-12-19 1983-12-19
US62064784A 1984-06-14 1984-06-14

Publications (1)

Publication Number Publication Date
DE3484793D1 true DE3484793D1 (de) 1991-08-14

Family

ID=27073068

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484114923T Expired - Lifetime DE3484793D1 (de) 1983-12-19 1984-12-07 Miniaturisierter monolithischer mehrschichtkondensator sowie geraet und verfahren zur herstellung.

Country Status (3)

Country Link
EP (1) EP0147696B1 (de)
JP (2) JPH0782962B2 (de)
DE (1) DE3484793D1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
EP0242462B1 (de) * 1986-04-21 1994-12-28 SPECTRUM CONTROL, INC. (a Pennsylvania corporation) Kondensator mit einem Polymer von einem Polyacrylat-Polyäther-Vorpolymer als Dielektrikum
EP0242460A1 (de) * 1985-01-18 1987-10-28 SPECTRUM CONTROL, INC. (a Pennsylvania corporation) Zerstäuber zum Verdampfen eines Monomers
US4757759A (en) * 1986-03-05 1988-07-19 Tam Ceramics, Inc. Multilayer ceramic bar printing and assembling apparatus
US4954371A (en) * 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
EP0339844A3 (de) * 1988-04-29 1991-01-16 SPECTRUM CONTROL, INC. (a Delaware corporation) Mehrschichtstruktur und Verfahren zu deren Herstellung
EP0355183A1 (de) * 1988-08-18 1990-02-28 Siemens Aktiengesellschaft Verfahren und Vorrichtung zur kontinuierlichen Herstellung von Schichtstrukturen für elektrische Zwecke
JPH0670941B2 (ja) * 1988-12-15 1994-09-07 株式会社村田製作所 積層コンデンサの製造方法
US6576523B1 (en) 1997-11-18 2003-06-10 Matsushita Electric Industrial Co., Ltd. Layered product, capacitor and a method for producing the layered product
WO1999030336A1 (en) * 1997-12-08 1999-06-17 Peter Anthony Fry Herbert A method and apparatus for the production of multilayer electrical components
JP3843572B2 (ja) * 1998-01-20 2006-11-08 松下電器産業株式会社 薄膜積層体及び薄膜積層体の製造方法
JP2000094578A (ja) * 1998-06-25 2000-04-04 Toray Ind Inc 金属蒸着フイルムとその製造方法、およびそれを用いた製品
JP4814408B2 (ja) * 1998-10-20 2011-11-16 パナソニック株式会社 フィルムコンデンサの製造方法及びその製造装置
GC0000088A (en) 1999-02-15 2004-06-30 Shell Int Research Process for the preparation of hydrocarbons from carbon monoxide and hydrogen.
DE19906676A1 (de) * 1999-02-18 2000-08-24 Leybold Systems Gmbh Bedampfungsvorrichtung
US6503564B1 (en) 1999-02-26 2003-01-07 3M Innovative Properties Company Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile
JP3701138B2 (ja) 1999-04-23 2005-09-28 松下電器産業株式会社 電子部品の製造方法
US6866901B2 (en) 1999-10-25 2005-03-15 Vitex Systems, Inc. Method for edge sealing barrier films
TWI245034B (en) 2000-07-24 2005-12-11 Matsushita Electric Ind Co Ltd Capacitor
US8808457B2 (en) 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US8900366B2 (en) 2002-04-15 2014-12-02 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
JP2003231207A (ja) * 2002-11-25 2003-08-19 Matsushita Electric Ind Co Ltd 複合薄膜
US6766793B2 (en) * 2002-12-12 2004-07-27 General Atomics Electromagnetic gun and rotating pulse forming network
JP4331950B2 (ja) * 2003-01-29 2009-09-16 京セラ株式会社 積層型薄膜コンデンサ
US7648925B2 (en) 2003-04-11 2010-01-19 Vitex Systems, Inc. Multilayer barrier stacks and methods of making multilayer barrier stacks
US7767498B2 (en) 2005-08-25 2010-08-03 Vitex Systems, Inc. Encapsulated devices and method of making
JP4226002B2 (ja) * 2005-12-27 2009-02-18 ルビコン株式会社 積層形フィルムコンデンサの製造方法
US9337446B2 (en) 2008-12-22 2016-05-10 Samsung Display Co., Ltd. Encapsulated RGB OLEDs having enhanced optical output
US9184410B2 (en) 2008-12-22 2015-11-10 Samsung Display Co., Ltd. Encapsulated white OLEDs having enhanced optical output
US8590338B2 (en) 2009-12-31 2013-11-26 Samsung Mobile Display Co., Ltd. Evaporator with internal restriction
JP5694023B2 (ja) * 2011-03-23 2015-04-01 小島プレス工業株式会社 積層構造体の製造装置
TWI559080B (zh) * 2015-11-09 2016-11-21 新應材股份有限公司 正型感光性絕緣樹脂組成物塗佈溶液及其絕緣膜的製造方法
JP6737118B2 (ja) 2016-10-11 2020-08-05 Tdk株式会社 薄膜コンデンサ
JP6805702B2 (ja) 2016-10-11 2020-12-23 Tdk株式会社 薄膜コンデンサ
JP6805703B2 (ja) * 2016-10-11 2020-12-23 Tdk株式会社 薄膜コンデンサ
JP2018063989A (ja) 2016-10-11 2018-04-19 Tdk株式会社 薄膜キャパシタ
JP7201372B2 (ja) * 2018-09-11 2023-01-10 株式会社アルバック アクリル気化器
GB201815842D0 (en) * 2018-09-28 2018-11-14 Power Roll Ltd Method of processing substrate for an energy storage device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USB453061I5 (de) * 1965-05-04 Radiation Res Corp
JPS4212184Y1 (de) * 1966-10-03 1967-07-10
JPS5333958B2 (de) * 1971-10-26 1978-09-18
JPS52153150A (en) * 1976-06-15 1977-12-20 Nissin Electric Co Ltd Capacitor
DE2843581C2 (de) * 1978-10-05 1986-03-27 Siemens AG, 1000 Berlin und 8000 München Elektrischer Schichtkondensator und Verfahren zu seiner Herstellung
DE2847620C2 (de) * 1978-11-02 1984-10-18 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur Herstellung von elektrischen Bauelementen, insbesondere Schichtkondensatoren
DE3028123A1 (de) * 1980-07-24 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur herstellung von schichtkondensatoren
BR8009098A (pt) * 1980-08-04 1982-06-22 Siemens Ag Dispositivo para produzir camadas de metal sobrepostas e previstas lateralmente deslocadas entre si inclusive camadas de polimerizado incandescente
JPS57134558A (en) * 1981-02-16 1982-08-19 Fuji Photo Film Co Ltd Production of organic vapor deposited thin film
JPS607028B2 (ja) * 1981-08-14 1985-02-21 日本真空技術株式会社 真空蒸着多層膜形成装置

Also Published As

Publication number Publication date
EP0147696A2 (de) 1985-07-10
JPH0782961B2 (ja) 1995-09-06
EP0147696B1 (de) 1991-07-10
JPS6372107A (ja) 1988-04-01
JPS6372108A (ja) 1988-04-01
EP0147696A3 (en) 1987-01-14
JPH0782962B2 (ja) 1995-09-06

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