DE3473616D1 - Porous silicon nitride semiconductor dopant carriers - Google Patents

Porous silicon nitride semiconductor dopant carriers

Info

Publication number
DE3473616D1
DE3473616D1 DE8484303899T DE3473616T DE3473616D1 DE 3473616 D1 DE3473616 D1 DE 3473616D1 DE 8484303899 T DE8484303899 T DE 8484303899T DE 3473616 T DE3473616 T DE 3473616T DE 3473616 D1 DE3473616 D1 DE 3473616D1
Authority
DE
Germany
Prior art keywords
silicon nitride
nitride semiconductor
porous silicon
dopant
semiconductor dopant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484303899T
Other languages
English (en)
Inventor
Gabriel Paul Demunda
Richard Ernest Tressler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stemcor Corp
Original Assignee
Stemcor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stemcor Corp filed Critical Stemcor Corp
Application granted granted Critical
Publication of DE3473616D1 publication Critical patent/DE3473616D1/de
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16Feed and outlet means for the gases; Modifying the flow of the gases
    • C30B31/165Diffusion sources
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S252/00Compositions
    • Y10S252/95Doping agent source material
    • Y10S252/951Doping agent source material for vapor transport

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Products (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
DE8484303899T 1983-06-08 1984-06-08 Porous silicon nitride semiconductor dopant carriers Expired DE3473616D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/502,286 US4596716A (en) 1983-06-08 1983-06-08 Porous silicon nitride semiconductor dopant carriers

Publications (1)

Publication Number Publication Date
DE3473616D1 true DE3473616D1 (de) 1988-09-29

Family

ID=23997147

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484303899T Expired DE3473616D1 (de) 1983-06-08 1984-06-08 Porous silicon nitride semiconductor dopant carriers

Country Status (7)

Country Link
US (1) US4596716A (de)
EP (1) EP0156054B1 (de)
JP (1) JPS6024011A (de)
AT (1) ATE36727T1 (de)
CA (1) CA1245424A (de)
DE (1) DE3473616D1 (de)
IE (1) IE55724B1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525429A (en) * 1983-06-08 1985-06-25 Kennecott Corporation Porous semiconductor dopant carriers
US4749615A (en) * 1986-10-31 1988-06-07 Stemcor Corporation Semiconductor dopant source
DE3901401C2 (de) * 1988-03-01 1996-12-19 Fraunhofer Ges Forschung Verfahren zur Steuerung einer Vakuum-Lichtbogenentladung
US5332697A (en) * 1989-05-31 1994-07-26 Smith Rosemary L Formation of silicon nitride by nitridation of porous silicon
JP4368230B2 (ja) * 2004-03-30 2009-11-18 電気化学工業株式会社 ホウ素化合物の固定方法及びホウ素拡散源

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1340696A (en) * 1970-07-10 1973-12-12 Lucas Industries Ltd Method of manufacturing silicon nitride products
US3849344A (en) * 1972-03-31 1974-11-19 Carborundum Co Solid diffusion sources containing phosphorus and silicon
IT989744B (it) * 1972-10-02 1975-06-10 Ford Motor Co Convertitore catalitico a base di nitruro di silicio per il tratta mento dei gas di scarico di motori a combustione interna e procedi mento per la sua produzione
JPS4995567A (de) * 1973-01-12 1974-09-10
US3923563A (en) * 1973-04-16 1975-12-02 Owens Illinois Inc Process for doping silicon semiconductors using an impregnated refractory dopant source
DE2603273A1 (de) * 1976-01-29 1977-08-04 Itt Ind Gmbh Deutsche Diffusionsverfahren
IE56118B1 (en) * 1983-06-08 1991-04-24 Kennecott Corp Foam semiconductor dopant carriers
US4525429A (en) * 1983-06-08 1985-06-25 Kennecott Corporation Porous semiconductor dopant carriers

Also Published As

Publication number Publication date
CA1245424A (en) 1988-11-29
IE841413L (en) 1984-12-08
ATE36727T1 (de) 1988-09-15
IE55724B1 (en) 1991-01-02
JPS6024011A (ja) 1985-02-06
EP0156054A1 (de) 1985-10-02
US4596716A (en) 1986-06-24
EP0156054B1 (de) 1988-08-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee