JPS56112769A - Manufacture of light emitting diode - Google Patents
Manufacture of light emitting diodeInfo
- Publication number
- JPS56112769A JPS56112769A JP1553780A JP1553780A JPS56112769A JP S56112769 A JPS56112769 A JP S56112769A JP 1553780 A JP1553780 A JP 1553780A JP 1553780 A JP1553780 A JP 1553780A JP S56112769 A JPS56112769 A JP S56112769A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- type gaalas
- dopant
- density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002019 doping agent Substances 0.000 abstract 3
- 239000012535 impurity Substances 0.000 abstract 1
- 239000007791 liquid phase Substances 0.000 abstract 1
- 150000002736 metal compounds Chemical class 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/0008—Devices characterised by their operation having p-n or hi-lo junctions
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
PURPOSE:To obtain an infrared ray emitting element having high efficiency, high light output and stable electric characteristics by setting the carrier density of an n type GaAlAs layer making contact with a p type GaAlAs metal compound semiconductor layer as a dopant at 6X10<16>-1X10<18>atom.cm<-3>. CONSTITUTION:The light emitting diode is formed by forming a p type GaAlAs layer 2 and an n type GaAlAs layer 3 by a liquid phase epitaxial growth on a p type GaAlAs substrate 1 and then forming an n<+> type contact part 4 and a p<+> type contact part 5 thereat. When the layer 3 is formed, the absolute difference value ¦ND-NA¦ between the carrier density and hence the doner density and the acceptor density as a dopant is set in the range from 6X10<16> to 1X10<18>atom.cm<-3>. The dopant may include impurity elements such as Sn, Te, Se, Si or the like.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1553780A JPS56112769A (en) | 1980-02-13 | 1980-02-13 | Manufacture of light emitting diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1553780A JPS56112769A (en) | 1980-02-13 | 1980-02-13 | Manufacture of light emitting diode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56112769A true JPS56112769A (en) | 1981-09-05 |
Family
ID=11891545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1553780A Pending JPS56112769A (en) | 1980-02-13 | 1980-02-13 | Manufacture of light emitting diode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56112769A (en) |
-
1980
- 1980-02-13 JP JP1553780A patent/JPS56112769A/en active Pending
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