JPS5731184A - Semiconductor light-emitting element and manufacture thereof - Google Patents
Semiconductor light-emitting element and manufacture thereofInfo
- Publication number
- JPS5731184A JPS5731184A JP10603780A JP10603780A JPS5731184A JP S5731184 A JPS5731184 A JP S5731184A JP 10603780 A JP10603780 A JP 10603780A JP 10603780 A JP10603780 A JP 10603780A JP S5731184 A JPS5731184 A JP S5731184A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- density
- low
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
Abstract
PURPOSE:To make it possible to set the doner density of an N type layer and enable a high light-emitting efficiency to be obtained, by adding N at the beginning of growth of the N type layer. CONSTITUTION:An N type semiconductor layer 12, which includes N and has a low donor density, is formed on an N type GaP single crystal substrate 11. An N type semiconductor layer 13, which includes no N, is accmulated on the layer 12 continuously. A P layer 14 is formed on the layer 13 continuously. An element thus formed can set the donor density of the layer 12 low by adding N at the beginning of growth of the N type layer. Therefore, as the donor density of a layer 13 to be grown subsequently is kept low, the impurity density difference between the parts near a P-N junction can be made extremely large. As a result, said element has a large amount of carrier injection at light-emitting operation and can obtain a high light-emitting efficiency.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10603780A JPS5731184A (en) | 1980-08-01 | 1980-08-01 | Semiconductor light-emitting element and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10603780A JPS5731184A (en) | 1980-08-01 | 1980-08-01 | Semiconductor light-emitting element and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5731184A true JPS5731184A (en) | 1982-02-19 |
Family
ID=14423435
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10603780A Pending JPS5731184A (en) | 1980-08-01 | 1980-08-01 | Semiconductor light-emitting element and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5731184A (en) |
-
1980
- 1980-08-01 JP JP10603780A patent/JPS5731184A/en active Pending
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