DE3417607A1 - Verfahren zur herstellung feiner muster - Google Patents

Verfahren zur herstellung feiner muster

Info

Publication number
DE3417607A1
DE3417607A1 DE19843417607 DE3417607A DE3417607A1 DE 3417607 A1 DE3417607 A1 DE 3417607A1 DE 19843417607 DE19843417607 DE 19843417607 DE 3417607 A DE3417607 A DE 3417607A DE 3417607 A1 DE3417607 A1 DE 3417607A1
Authority
DE
Germany
Prior art keywords
azidobenzal
compound
alkaline
etching
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19843417607
Other languages
German (de)
English (en)
Other versions
DE3417607C2 (enExample
Inventor
Asao Hitachi Isobe
Shigeru Koibuchi
Daisuke Mito Makino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP58083176A external-priority patent/JPS59208549A/ja
Priority claimed from JP58152959A external-priority patent/JPS6045239A/ja
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Publication of DE3417607A1 publication Critical patent/DE3417607A1/de
Application granted granted Critical
Publication of DE3417607C2 publication Critical patent/DE3417607C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE19843417607 1983-05-12 1984-05-11 Verfahren zur herstellung feiner muster Granted DE3417607A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58083176A JPS59208549A (ja) 1983-05-12 1983-05-12 微細パタ−ンの製造法
JP58152959A JPS6045239A (ja) 1983-08-22 1983-08-22 微細パタ−ンの製造法

Publications (2)

Publication Number Publication Date
DE3417607A1 true DE3417607A1 (de) 1984-11-15
DE3417607C2 DE3417607C2 (enExample) 1988-09-01

Family

ID=26424233

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843417607 Granted DE3417607A1 (de) 1983-05-12 1984-05-11 Verfahren zur herstellung feiner muster

Country Status (2)

Country Link
US (1) US4722883A (enExample)
DE (1) DE3417607A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0814382A1 (en) * 1996-06-19 1997-12-29 Printing Developments Inc Improved photoresists and method for making printing plates

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5264327A (en) * 1988-05-26 1993-11-23 Canon Kabushiki Kaisha Method for preparing information recording medium
US5783367A (en) * 1989-09-20 1998-07-21 Fujitsu Limited Process for production of semiconductor device and resist developing apparatus used therein
US6037085A (en) * 1996-06-19 2000-03-14 Printing Development Inc. Photoresists and method for making printing plates
US5855811A (en) * 1996-10-03 1999-01-05 Micron Technology, Inc. Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication
US6558570B2 (en) 1998-07-01 2003-05-06 Micron Technology, Inc. Polishing slurry and method for chemical-mechanical polishing
US7011923B2 (en) * 2004-04-07 2006-03-14 International Business Machines Corporation Negative photoresist and method of using thereof
JP5835123B2 (ja) * 2012-06-21 2015-12-24 Jsr株式会社 パターン形成用自己組織化組成物及びパターン形成方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597614B2 (de) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt Lichtempfindliche kopiermasse
EP0030107A1 (en) * 1979-11-30 1981-06-10 Fujitsu Limited Process for forming resist pattern
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
DE3415033A1 (de) * 1983-04-20 1984-10-11 Hitachi Chemical Co., Ltd. 4'-azidobenzal-2-methoxyacetophenon, verfahren zu seiner herstellung und es enthaltende, photoempfindliche masse

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
GB1375461A (enExample) * 1972-05-05 1974-11-27
US3887373A (en) * 1973-04-11 1975-06-03 Motorola Inc Non-polluting photoresist developing process
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597614B2 (de) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt Lichtempfindliche kopiermasse
EP0030107A1 (en) * 1979-11-30 1981-06-10 Fujitsu Limited Process for forming resist pattern
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
DE3415033A1 (de) * 1983-04-20 1984-10-11 Hitachi Chemical Co., Ltd. 4'-azidobenzal-2-methoxyacetophenon, verfahren zu seiner herstellung und es enthaltende, photoempfindliche masse

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IEEE Transactions on Electron Devices, Vol. ED-11, S. 1306-1311 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0814382A1 (en) * 1996-06-19 1997-12-29 Printing Developments Inc Improved photoresists and method for making printing plates

Also Published As

Publication number Publication date
DE3417607C2 (enExample) 1988-09-01
US4722883A (en) 1988-02-02

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee