DE3327299A1 - Blaeschenfoermiges filmelement - Google Patents
Blaeschenfoermiges filmelementInfo
- Publication number
- DE3327299A1 DE3327299A1 DE19833327299 DE3327299A DE3327299A1 DE 3327299 A1 DE3327299 A1 DE 3327299A1 DE 19833327299 DE19833327299 DE 19833327299 DE 3327299 A DE3327299 A DE 3327299A DE 3327299 A1 DE3327299 A1 DE 3327299A1
- Authority
- DE
- Germany
- Prior art keywords
- phenoxy resin
- epoxy
- agent
- phenol
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 133
- 239000013034 phenoxy resin Substances 0.000 claims description 99
- 229920006287 phenoxy resin Polymers 0.000 claims description 99
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims description 79
- 239000004593 Epoxy Substances 0.000 claims description 69
- 229920005989 resin Polymers 0.000 claims description 51
- 239000011347 resin Substances 0.000 claims description 51
- 239000006085 branching agent Substances 0.000 claims description 50
- 150000001875 compounds Chemical class 0.000 claims description 48
- 239000003795 chemical substances by application Substances 0.000 claims description 44
- 229920000642 polymer Polymers 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 36
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 30
- 239000011159 matrix material Substances 0.000 claims description 27
- 239000007789 gas Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 21
- 238000003384 imaging method Methods 0.000 claims description 18
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 18
- 229920003986 novolac Polymers 0.000 claims description 17
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 16
- 238000001879 gelation Methods 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 15
- QUWAJPZDCZDTJS-UHFFFAOYSA-N 2-(2-hydroxyphenyl)sulfonylphenol Chemical compound OC1=CC=CC=C1S(=O)(=O)C1=CC=CC=C1O QUWAJPZDCZDTJS-UHFFFAOYSA-N 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 14
- 150000002989 phenols Chemical class 0.000 claims description 13
- 239000000654 additive Substances 0.000 claims description 12
- CXXSQMDHHYTRKY-UHFFFAOYSA-N 4-amino-2,3,5-tris(oxiran-2-ylmethyl)phenol Chemical group C1=C(O)C(CC2OC2)=C(CC2OC2)C(N)=C1CC1CO1 CXXSQMDHHYTRKY-UHFFFAOYSA-N 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 238000011161 development Methods 0.000 claims description 11
- 239000002981 blocking agent Substances 0.000 claims description 10
- 150000002118 epoxides Chemical class 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- 239000002952 polymeric resin Substances 0.000 claims description 9
- 229920003002 synthetic resin Polymers 0.000 claims description 9
- LINPIYWFGCPVIE-UHFFFAOYSA-N 2,4,6-trichlorophenol Chemical compound OC1=C(Cl)C=C(Cl)C=C1Cl LINPIYWFGCPVIE-UHFFFAOYSA-N 0.000 claims description 8
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 claims description 8
- 150000008049 diazo compounds Chemical group 0.000 claims description 8
- 230000006911 nucleation Effects 0.000 claims description 7
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 7
- 229920001296 polysiloxane Polymers 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 206010073306 Exposure to radiation Diseases 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000010899 nucleation Methods 0.000 claims description 6
- -1 phenol compound Chemical class 0.000 claims description 6
- 230000000996 additive effect Effects 0.000 claims description 5
- 230000000903 blocking effect Effects 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims description 5
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 5
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 claims description 4
- 125000000524 functional group Chemical group 0.000 claims description 4
- 239000002667 nucleating agent Substances 0.000 claims description 4
- 239000004094 surface-active agent Substances 0.000 claims description 4
- 238000007334 copolymerization reaction Methods 0.000 claims description 3
- 239000000047 product Substances 0.000 claims description 3
- PUVAFTRIIUSGLK-UHFFFAOYSA-M trimethyl(oxiran-2-ylmethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1CO1 PUVAFTRIIUSGLK-UHFFFAOYSA-M 0.000 claims description 3
- HFZWRUODUSTPEG-UHFFFAOYSA-N 2,4-dichlorophenol Chemical compound OC1=CC=C(Cl)C=C1Cl HFZWRUODUSTPEG-UHFFFAOYSA-N 0.000 claims description 2
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 claims description 2
- HHRACYLRBOUBKM-UHFFFAOYSA-N 2-[(4-tert-butylphenoxy)methyl]oxirane Chemical compound C1=CC(C(C)(C)C)=CC=C1OCC1OC1 HHRACYLRBOUBKM-UHFFFAOYSA-N 0.000 claims description 2
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims description 2
- 229960003742 phenol Drugs 0.000 claims 37
- 125000003118 aryl group Chemical group 0.000 claims 2
- 150000003457 sulfones Chemical class 0.000 claims 2
- 229920001169 thermoplastic Polymers 0.000 claims 2
- 239000004416 thermosoftening plastic Substances 0.000 claims 2
- LHJGJYXLEPZJPM-UHFFFAOYSA-N 2,4,5-trichlorophenol Chemical compound OC1=CC(Cl)=C(Cl)C=C1Cl LHJGJYXLEPZJPM-UHFFFAOYSA-N 0.000 claims 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 claims 1
- 101100346656 Drosophila melanogaster strat gene Proteins 0.000 claims 1
- 101100536354 Drosophila melanogaster tant gene Proteins 0.000 claims 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 claims 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 38
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 22
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 22
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 206010034972 Photosensitivity reaction Diseases 0.000 description 17
- 230000036211 photosensitivity Effects 0.000 description 17
- 238000006116 polymerization reaction Methods 0.000 description 17
- UUODQIKUTGWMPT-UHFFFAOYSA-N 2-fluoro-5-(trifluoromethyl)pyridine Chemical compound FC1=CC=C(C(F)(F)F)C=N1 UUODQIKUTGWMPT-UHFFFAOYSA-N 0.000 description 16
- 239000003054 catalyst Substances 0.000 description 16
- 239000000376 reactant Substances 0.000 description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 14
- 238000009826 distribution Methods 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 239000011592 zinc chloride Substances 0.000 description 11
- 235000005074 zinc chloride Nutrition 0.000 description 11
- 239000000523 sample Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 8
- 230000018109 developmental process Effects 0.000 description 8
- 229940106691 bisphenol a Drugs 0.000 description 7
- 239000000080 wetting agent Substances 0.000 description 7
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000013459 approach Methods 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 6
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- HSQFVBWFPBKHEB-UHFFFAOYSA-N 2,3,4-trichlorophenol Chemical compound OC1=CC=C(Cl)C(Cl)=C1Cl HSQFVBWFPBKHEB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- WPYCRFCQABTEKC-UHFFFAOYSA-N Diglycidyl resorcinol ether Chemical compound C1OC1COC(C=1)=CC=CC=1OCC1CO1 WPYCRFCQABTEKC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 230000002860 competitive effect Effects 0.000 description 2
- 239000013068 control sample Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DHJKHOVAFCEJMP-UHFFFAOYSA-N (4e)-2-chloro-4-diazo-n,n-diethylcyclohexa-1,5-dien-1-amine Chemical compound CCN(CC)C1=C(Cl)CC(=[N+]=[N-])C=C1 DHJKHOVAFCEJMP-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- BPRYUXCVCCNUFE-UHFFFAOYSA-N 2,4,6-trimethylphenol Chemical compound CC1=CC(C)=C(O)C(C)=C1 BPRYUXCVCCNUFE-UHFFFAOYSA-N 0.000 description 1
- JNKBBTYRRDQUCX-UHFFFAOYSA-N 2,5-dibutoxy-n-(4-diazocyclohexa-1,5-dien-1-yl)benzamide Chemical compound CCCCOC1=CC=C(OCCCC)C(C(=O)NC=2C=CC(CC=2)=[N+]=[N-])=C1 JNKBBTYRRDQUCX-UHFFFAOYSA-N 0.000 description 1
- BGHADPBRDBBRET-UHFFFAOYSA-N 2-[4-(2-diazoethyl)anilino]ethanol Chemical compound OCCNC1=CC=C(CC=[N+]=[N-])C=C1 BGHADPBRDBBRET-UHFFFAOYSA-N 0.000 description 1
- OYUNTGBISCIYPW-UHFFFAOYSA-N 2-chloroprop-2-enenitrile Chemical compound ClC(=C)C#N OYUNTGBISCIYPW-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- VWYSHPVBENQCRM-UHFFFAOYSA-N 4-(4-diazo-2,5-diethoxycyclohexa-1,5-dien-1-yl)morpholine hydrochloride Chemical compound Cl.C1=C(OCC)C(=[N+]=[N-])CC(OCC)=C1N1CCOCC1 VWYSHPVBENQCRM-UHFFFAOYSA-N 0.000 description 1
- POSATVGPDSBSIB-UHFFFAOYSA-N 4-(4-diazo-2,5-diethoxycyclohexa-1,5-dien-1-yl)morpholine;2-sulfooxybenzoic acid Chemical compound OC(=O)C1=CC=CC=C1OS(O)(=O)=O.C1=C(OCC)C(=[N+]=[N-])CC(OCC)=C1N1CCOCC1 POSATVGPDSBSIB-UHFFFAOYSA-N 0.000 description 1
- YCECUQBPPHIDTB-UHFFFAOYSA-N 4-(4-diazo-2,5-diethoxycyclohexa-1,5-dien-1-yl)morpholine;trifluoromethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)F.C1=C(OCC)C(=[N+]=[N-])CC(OCC)=C1N1CCOCC1 YCECUQBPPHIDTB-UHFFFAOYSA-N 0.000 description 1
- UINBLFKLIBLFQG-UHFFFAOYSA-N 4-(4-diazo-2,5-dimethoxycyclohexa-1,5-dien-1-yl)morpholine hydrochloride Chemical compound Cl.C1=C(OC)C(=[N+]=[N-])CC(OC)=C1N1CCOCC1 UINBLFKLIBLFQG-UHFFFAOYSA-N 0.000 description 1
- SCETWWDGKCBPMK-UHFFFAOYSA-N 4-[(4e)-4-diazocyclohexa-1,5-dien-1-yl]morpholine Chemical compound C1=CC(=[N+]=[N-])CC=C1N1CCOCC1 SCETWWDGKCBPMK-UHFFFAOYSA-N 0.000 description 1
- YVHUZWZXUCTCSB-UHFFFAOYSA-N 4-[4-diazo-2,5-di(propan-2-yloxy)cyclohexa-1,5-dien-1-yl]morpholine;2-sulfooxybenzoic acid Chemical compound OC(=O)C1=CC=CC=C1OS(O)(=O)=O.C1=C(OC(C)C)C(=[N+]=[N-])CC(OC(C)C)=C1N1CCOCC1 YVHUZWZXUCTCSB-UHFFFAOYSA-N 0.000 description 1
- WLLCFUHMPIOUMC-UHFFFAOYSA-N 4-[4-diazo-2,5-di(propan-2-yloxy)cyclohexa-1,5-dien-1-yl]morpholine;trifluoromethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)F.C1=C(OC(C)C)C(=[N+]=[N-])CC(OC(C)C)=C1N1CCOCC1 WLLCFUHMPIOUMC-UHFFFAOYSA-N 0.000 description 1
- QEJUOCBDRDCLOP-UHFFFAOYSA-N 4-diazo-3-ethoxy-n,n-diethylcyclohexa-1,5-dien-1-amine Chemical compound CCOC1C=C(N(CC)CC)C=CC1=[N+]=[N-] QEJUOCBDRDCLOP-UHFFFAOYSA-N 0.000 description 1
- YZYFPMLAGIGAJJ-UHFFFAOYSA-N 4-diazo-n,n-diethylcyclohexa-1,5-dien-1-amine Chemical compound CCN(CC)C1=CCC(=[N+]=[N-])C=C1 YZYFPMLAGIGAJJ-UHFFFAOYSA-N 0.000 description 1
- LAXPFHMCFLHGKK-UHFFFAOYSA-N 4-diazo-n,n-dimethylcyclohexa-1,5-dien-1-amine Chemical compound CN(C)C1=CCC(=[N+]=[N-])C=C1 LAXPFHMCFLHGKK-UHFFFAOYSA-N 0.000 description 1
- OOLOJIWHMPGATB-UHFFFAOYSA-N 5-diazo-1,4-dimethoxy-2-(4-methylphenyl)sulfanylcyclohexa-1,3-diene Chemical compound C1=C(OC)C(=[N+]=[N-])CC(OC)=C1SC1=CC=C(C)C=C1 OOLOJIWHMPGATB-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 101100232929 Caenorhabditis elegans pat-4 gene Proteins 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- XEVRDFDBXJMZFG-UHFFFAOYSA-N carbonyl dihydrazine Chemical group NNC(=O)NN XEVRDFDBXJMZFG-UHFFFAOYSA-N 0.000 description 1
- 150000001731 carboxylic acid azides Chemical class 0.000 description 1
- 231100000357 carcinogen Toxicity 0.000 description 1
- 239000003183 carcinogenic agent Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
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- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000035784 germination Effects 0.000 description 1
- 239000008125 glucin Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- GZOZQFALVQWNII-UHFFFAOYSA-N n-(4-diazocyclohexa-1,5-dien-1-yl)-2,5-diethoxybenzamide Chemical compound CCOC1=CC=C(OCC)C(C(=O)NC=2C=CC(CC=2)=[N+]=[N-])=C1 GZOZQFALVQWNII-UHFFFAOYSA-N 0.000 description 1
- VOVZXURTCKPRDQ-CQSZACIVSA-N n-[4-[chloro(difluoro)methoxy]phenyl]-6-[(3r)-3-hydroxypyrrolidin-1-yl]-5-(1h-pyrazol-5-yl)pyridine-3-carboxamide Chemical compound C1[C@H](O)CCN1C1=NC=C(C(=O)NC=2C=CC(OC(F)(F)Cl)=CC=2)C=C1C1=CC=NN1 VOVZXURTCKPRDQ-CQSZACIVSA-N 0.000 description 1
- DGYAZWJDJHRVKI-UHFFFAOYSA-N n-benzyl-4-(2-diazoethyl)aniline Chemical compound C1=CC(CC=[N+]=[N-])=CC=C1NCC1=CC=CC=C1 DGYAZWJDJHRVKI-UHFFFAOYSA-N 0.000 description 1
- USWUTUCXLQBQCG-UHFFFAOYSA-N naphthalene-1,3,8-triol Chemical compound OC1=CC=CC2=CC(O)=CC(O)=C21 USWUTUCXLQBQCG-UHFFFAOYSA-N 0.000 description 1
- XULSCZPZVQIMFM-IPZQJPLYSA-N odevixibat Chemical compound C12=CC(SC)=C(OCC(=O)N[C@@H](C(=O)N[C@@H](CC)C(O)=O)C=3C=CC(O)=CC=3)C=C2S(=O)(=O)NC(CCCC)(CCCC)CN1C1=CC=CC=C1 XULSCZPZVQIMFM-IPZQJPLYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003214 poly(methacrylonitrile) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000011045 prefiltration Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- MOODSJOROWROTO-UHFFFAOYSA-N salicylsulfuric acid Chemical compound OC(=O)C1=CC=CC=C1OS(O)(=O)=O MOODSJOROWROTO-UHFFFAOYSA-N 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229940071103 sulfosalicylate Drugs 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- LXSHJEFJEZVRMK-UHFFFAOYSA-L zinc;4-diazo-n,n-diethylcyclohexa-1,5-dien-1-amine;dichloride Chemical compound [Cl-].[Cl-].[Zn+2].CCN(CC)C1=CCC(=[N+]=[N-])C=C1 LXSHJEFJEZVRMK-UHFFFAOYSA-L 0.000 description 1
- ZPWSKXDJLWXYSL-UHFFFAOYSA-L zinc;4-diazo-n,n-dimethylcyclohexa-1,5-dien-1-amine;dichloride Chemical compound [Cl-].[Cl-].[Zn+2].CN(C)C1=CCC(=[N+]=[N-])C=C1 ZPWSKXDJLWXYSL-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/60—Processes for obtaining vesicular images
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/403,108 US4451550A (en) | 1982-07-29 | 1982-07-29 | Vesicular film and composition with phenoxy resin matrix |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3327299A1 true DE3327299A1 (de) | 1984-02-09 |
Family
ID=23594499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19833327299 Withdrawn DE3327299A1 (de) | 1982-07-29 | 1983-07-28 | Blaeschenfoermiges filmelement |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4451550A (cg-RX-API-DMAC7.html) |
| JP (1) | JPS5993444A (cg-RX-API-DMAC7.html) |
| BE (1) | BE897409A (cg-RX-API-DMAC7.html) |
| CH (1) | CH656886A5 (cg-RX-API-DMAC7.html) |
| DE (1) | DE3327299A1 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2531091B1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB2124630B (cg-RX-API-DMAC7.html) |
| IT (1) | IT1206511B (cg-RX-API-DMAC7.html) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR8507103A (pt) * | 1984-12-04 | 1987-03-31 | Dow Chemical Co | Resina termoplastica termicamente estavel |
| US4632971A (en) * | 1985-07-15 | 1986-12-30 | The Dow Chemical Company | Thermally stable capped thermoplastic phenolic resin |
| EP0362853A3 (en) * | 1988-10-06 | 1991-03-27 | James River-Graphics, Inc. | Phenoxy resins suitable for vesicular imaging and process for their synthesis |
| US4939112A (en) * | 1988-10-06 | 1990-07-03 | James River Paper Company, Inc. | Catalyst for synthesis of vesicular phenoxy resins |
| US6210862B1 (en) | 1989-03-03 | 2001-04-03 | International Business Machines Corporation | Composition for photoimaging |
| US5322757A (en) * | 1989-09-08 | 1994-06-21 | Ocg Microelectronic Materials, Inc. | Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present |
| US5443938A (en) * | 1992-09-25 | 1995-08-22 | Brother Kogyo Kabushiki Kaisha | Photosensitive printing member having ink-receptive capillary structures in the support and photosensitive layer |
| US6680440B1 (en) | 1998-02-23 | 2004-01-20 | International Business Machines Corporation | Circuitized structures produced by the methods of electroless plating |
| US6066889A (en) * | 1998-09-22 | 2000-05-23 | International Business Machines Corporation | Methods of selectively filling apertures |
| US6204456B1 (en) | 1998-09-24 | 2001-03-20 | International Business Machines Corporation | Filling open through holes in a multilayer board |
| US6528218B1 (en) | 1998-12-15 | 2003-03-04 | International Business Machines Corporation | Method of fabricating circuitized structures |
| US6194098B1 (en) | 1998-12-17 | 2001-02-27 | Moltech Corporation | Protective coating for separators for electrochemical cells |
| US6277514B1 (en) | 1998-12-17 | 2001-08-21 | Moltech Corporation | Protective coating for separators for electrochemical cells |
| KR101020164B1 (ko) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법 |
| KR20110111447A (ko) * | 2008-12-30 | 2011-10-11 | 다우 글로벌 테크놀로지스 엘엘씨 | 하이드록실-관능성 폴리에테르 및 이의 제조 방법 |
| KR102818768B1 (ko) * | 2019-09-26 | 2025-06-10 | 세키스이가가쿠 고교가부시키가이샤 | 전자 디바이스용 광 경화성 수지 조성물 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0036036A2 (en) * | 1980-03-19 | 1981-09-23 | R.Q.O. Holding Company,Inc. | Vesicular film elements |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL110124C (cg-RX-API-DMAC7.html) * | 1957-05-02 | |||
| GB975457A (en) * | 1960-03-14 | 1964-11-18 | Alfred Frank Daech | Improvements in or relating to photographic films |
| BE639945A (cg-RX-API-DMAC7.html) * | 1962-11-15 | |||
| US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
| GB1115611A (en) * | 1964-08-27 | 1968-05-29 | Union Carbide Corp | Epoxy resins |
| BE757479A (fr) * | 1969-10-15 | 1971-04-14 | Xidex Corp | Element vesiculaire de formation d'une image |
| US3652272A (en) * | 1969-10-31 | 1972-03-28 | Lithoplate Inc | Phenoxy photopolymer having no epoxy groups, and article made therefrom |
| US3779768A (en) * | 1971-08-26 | 1973-12-18 | Xidex Corp | Fluorocarbon surfactants for vesicular films |
| US3779774A (en) * | 1972-05-09 | 1973-12-18 | Xidex Corp | Silicone surfactants for vesicular films |
| JPS5321104B2 (cg-RX-API-DMAC7.html) * | 1972-06-21 | 1978-06-30 | ||
| US4289838A (en) * | 1972-12-14 | 1981-09-15 | Polychrome Corporation | Diazo-unsaturated monomer light sensitive compositions |
| US4093463A (en) * | 1977-02-22 | 1978-06-06 | Eastman Kodak Company | Water soluble binder overcoat on vesicular element containing N2 -releasing agent |
| US4272603A (en) * | 1977-06-03 | 1981-06-09 | Chenevert Donald J | Resin blends for improved vesicular systems |
| US4288565A (en) * | 1978-06-22 | 1981-09-08 | Ciba-Geigy Corporation | Storable, solid mixture for the preparation of plastics which are based on epoxide resin and are stable to hydrolysis, the use of this mixture for the preparation of such plastics and plastics obtained in this way |
| DE2948554A1 (de) * | 1979-12-03 | 1981-06-04 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch |
| EP0077758B1 (de) * | 1981-10-19 | 1986-04-02 | Ciba-Geigy Ag | Feste Epoxidharzsysteme |
-
1982
- 1982-07-29 US US06/403,108 patent/US4451550A/en not_active Expired - Fee Related
-
1983
- 1983-07-26 CH CH4103/83A patent/CH656886A5/de not_active IP Right Cessation
- 1983-07-28 BE BE0/211262A patent/BE897409A/fr not_active IP Right Cessation
- 1983-07-28 DE DE19833327299 patent/DE3327299A1/de not_active Withdrawn
- 1983-07-28 GB GB08320316A patent/GB2124630B/en not_active Expired
- 1983-07-28 IT IT8322282A patent/IT1206511B/it active
- 1983-07-29 JP JP58137943A patent/JPS5993444A/ja active Granted
- 1983-07-29 FR FR8312557A patent/FR2531091B1/fr not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0036036A2 (en) * | 1980-03-19 | 1981-09-23 | R.Q.O. Holding Company,Inc. | Vesicular film elements |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5993444A (ja) | 1984-05-29 |
| US4451550A (en) | 1984-05-29 |
| BE897409A (fr) | 1983-11-14 |
| GB2124630B (en) | 1986-11-19 |
| FR2531091A1 (fr) | 1984-02-03 |
| GB2124630A (en) | 1984-02-22 |
| FR2531091B1 (fr) | 1986-11-21 |
| CH656886A5 (de) | 1986-07-31 |
| IT8322282A0 (it) | 1983-07-28 |
| JPH0462376B2 (cg-RX-API-DMAC7.html) | 1992-10-06 |
| GB8320316D0 (en) | 1983-09-01 |
| IT1206511B (it) | 1989-04-27 |
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| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8139 | Disposal/non-payment of the annual fee |