DE3222484A1 - Zusammensetzung zur erzielung eines vor der entwicklung gut sichtbaren bildes nach der bestrahlung - Google Patents
Zusammensetzung zur erzielung eines vor der entwicklung gut sichtbaren bildes nach der bestrahlungInfo
- Publication number
- DE3222484A1 DE3222484A1 DE19823222484 DE3222484A DE3222484A1 DE 3222484 A1 DE3222484 A1 DE 3222484A1 DE 19823222484 DE19823222484 DE 19823222484 DE 3222484 A DE3222484 A DE 3222484A DE 3222484 A1 DE3222484 A1 DE 3222484A1
- Authority
- DE
- Germany
- Prior art keywords
- composition according
- acid
- free
- composition
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
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- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- JEVGKYBUANQAKG-UHFFFAOYSA-N victoria blue R Chemical compound [Cl-].C12=CC=CC=C2C(=[NH+]CC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JEVGKYBUANQAKG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/273,790 US4350753A (en) | 1981-06-15 | 1981-06-15 | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3222484A1 true DE3222484A1 (de) | 1982-12-30 |
Family
ID=23045409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19823222484 Withdrawn DE3222484A1 (de) | 1981-06-15 | 1982-06-15 | Zusammensetzung zur erzielung eines vor der entwicklung gut sichtbaren bildes nach der bestrahlung |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4350753A (enExample) |
| JP (1) | JPS57212437A (enExample) |
| AU (1) | AU549200B2 (enExample) |
| CA (1) | CA1183035A (enExample) |
| DE (1) | DE3222484A1 (enExample) |
| FR (1) | FR2510771B1 (enExample) |
| GB (1) | GB2102586B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4143081A1 (de) * | 1990-12-27 | 1992-07-02 | Toshiba Kawasaki Kk | Lichtempfindliche masse und verfahren zur herstellung eines musters unter verwendung derselben |
Families Citing this family (60)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3144499A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
| GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
| EP0130599B1 (en) * | 1983-06-29 | 1988-08-10 | Fuji Photo Film Co., Ltd. | Photosolubilizable composition |
| US4758497A (en) * | 1985-08-22 | 1988-07-19 | Polychrome Corporation | Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds |
| US4845008A (en) * | 1986-02-20 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent |
| NL8601096A (nl) * | 1986-04-29 | 1987-11-16 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak. |
| US4721665A (en) * | 1986-09-29 | 1988-01-26 | Polychrome Corporation | Method for neutralizing acidic novolak resin in a lithographic coating composition |
| JPS6477051A (en) * | 1987-06-03 | 1989-03-23 | Konishiroku Photo Ind | Photosensitive composition and photosensitive planographic printing plate |
| GB8719730D0 (en) * | 1987-08-20 | 1987-09-30 | Vickers Plc | Radiation sensitive compounds |
| EP0325863A3 (en) * | 1987-12-28 | 1990-07-11 | Mark S. Depalma | Multi-color ultraviolet radiation measurement device |
| US4937174A (en) * | 1988-02-24 | 1990-06-26 | Arizona Board Of Regents | Process of obtaining improved contrast in electron beam lithography |
| US4877716A (en) * | 1988-02-24 | 1989-10-31 | Arizona Board Of Regents | Developer solutions for PMMA electron resist |
| EP0455228B1 (en) * | 1990-05-02 | 1998-08-12 | Mitsubishi Chemical Corporation | Photoresist composition |
| JPH04296754A (ja) * | 1991-03-26 | 1992-10-21 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| CA2085868A1 (en) * | 1991-12-25 | 1993-06-26 | Mitsubishi Chemical Corporation | Photosensitive composition |
| GB2277382A (en) * | 1993-04-19 | 1994-10-26 | Pan Graphics Ind Limited | Photoresist composition |
| US6017661A (en) | 1994-11-09 | 2000-01-25 | Kimberly-Clark Corporation | Temporary marking using photoerasable colorants |
| US5643356A (en) | 1993-08-05 | 1997-07-01 | Kimberly-Clark Corporation | Ink for ink jet printers |
| US5733693A (en) | 1993-08-05 | 1998-03-31 | Kimberly-Clark Worldwide, Inc. | Method for improving the readability of data processing forms |
| US5700850A (en) | 1993-08-05 | 1997-12-23 | Kimberly-Clark Worldwide | Colorant compositions and colorant stabilizers |
| US5645964A (en) | 1993-08-05 | 1997-07-08 | Kimberly-Clark Corporation | Digital information recording media and method of using same |
| US6211383B1 (en) | 1993-08-05 | 2001-04-03 | Kimberly-Clark Worldwide, Inc. | Nohr-McDonald elimination reaction |
| US5865471A (en) | 1993-08-05 | 1999-02-02 | Kimberly-Clark Worldwide, Inc. | Photo-erasable data processing forms |
| US5721287A (en) | 1993-08-05 | 1998-02-24 | Kimberly-Clark Worldwide, Inc. | Method of mutating a colorant by irradiation |
| CA2120838A1 (en) | 1993-08-05 | 1995-02-06 | Ronald Sinclair Nohr | Solid colored composition mutable by ultraviolet radiation |
| US5681380A (en) | 1995-06-05 | 1997-10-28 | Kimberly-Clark Worldwide, Inc. | Ink for ink jet printers |
| US5773182A (en) | 1993-08-05 | 1998-06-30 | Kimberly-Clark Worldwide, Inc. | Method of light stabilizing a colorant |
| US5685754A (en) * | 1994-06-30 | 1997-11-11 | Kimberly-Clark Corporation | Method of generating a reactive species and polymer coating applications therefor |
| US6071979A (en) | 1994-06-30 | 2000-06-06 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition method of generating a reactive species and applications therefor |
| US6242057B1 (en) | 1994-06-30 | 2001-06-05 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition and applications therefor |
| US5739175A (en) | 1995-06-05 | 1998-04-14 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer |
| US6008268A (en) | 1994-10-21 | 1999-12-28 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition, method of generating a reactive species, and applications therefor |
| US5837429A (en) | 1995-06-05 | 1998-11-17 | Kimberly-Clark Worldwide | Pre-dyes, pre-dye compositions, and methods of developing a color |
| US5811199A (en) | 1995-06-05 | 1998-09-22 | Kimberly-Clark Worldwide, Inc. | Adhesive compositions containing a photoreactor composition |
| US5798015A (en) | 1995-06-05 | 1998-08-25 | Kimberly-Clark Worldwide, Inc. | Method of laminating a structure with adhesive containing a photoreactor composition |
| US5849411A (en) | 1995-06-05 | 1998-12-15 | Kimberly-Clark Worldwide, Inc. | Polymer film, nonwoven web and fibers containing a photoreactor composition |
| US5786132A (en) | 1995-06-05 | 1998-07-28 | Kimberly-Clark Corporation | Pre-dyes, mutable dye compositions, and methods of developing a color |
| US5747550A (en) | 1995-06-05 | 1998-05-05 | Kimberly-Clark Worldwide, Inc. | Method of generating a reactive species and polymerizing an unsaturated polymerizable material |
| EP0846146B1 (en) | 1995-06-28 | 2001-09-26 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizing composition |
| SK102397A3 (en) | 1995-11-28 | 1998-02-04 | Kimberly Clark Co | Colorant stabilizers |
| US6099628A (en) | 1996-03-29 | 2000-08-08 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5782963A (en) | 1996-03-29 | 1998-07-21 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5855655A (en) | 1996-03-29 | 1999-01-05 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5891229A (en) | 1996-03-29 | 1999-04-06 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5948596A (en) * | 1997-05-27 | 1999-09-07 | Kodak Polychrome Graphics Llc | Digital printing plate comprising a thermal mask |
| US6524379B2 (en) | 1997-08-15 | 2003-02-25 | Kimberly-Clark Worldwide, Inc. | Colorants, colorant stabilizers, ink compositions, and improved methods of making the same |
| KR20010022593A (ko) | 1998-06-03 | 2001-03-26 | 로날드 디. 맥크레이 | 신규 광개시제 및 그 이용 |
| BR9906580A (pt) | 1998-06-03 | 2000-09-26 | Kimberly Clark Co | Neonanoplastos e tecnologia de microemulsão para tintas e impressão de jato de tinta |
| AU5219299A (en) | 1998-07-20 | 2000-02-07 | Kimberly-Clark Worldwide, Inc. | Improved ink jet ink compositions |
| PL366326A1 (en) | 1998-09-28 | 2005-01-24 | Kimberly-Clark Worldwide, Inc. | Novel photoinitiators and applications therefor |
| AU2853000A (en) | 1999-01-19 | 2000-08-01 | Kimberly-Clark Worldwide, Inc. | Novel colorants, colorant stabilizers, ink compositions, and improved methods ofmaking the same |
| US6331056B1 (en) | 1999-02-25 | 2001-12-18 | Kimberly-Clark Worldwide, Inc. | Printing apparatus and applications therefor |
| US6187510B1 (en) | 1999-03-09 | 2001-02-13 | Kodak Polychrome Graphics Llc | Digital lithographic printing plate and method of making thereof |
| US6294698B1 (en) | 1999-04-16 | 2001-09-25 | Kimberly-Clark Worldwide, Inc. | Photoinitiators and applications therefor |
| US6368395B1 (en) | 1999-05-24 | 2002-04-09 | Kimberly-Clark Worldwide, Inc. | Subphthalocyanine colorants, ink compositions, and method of making the same |
| JP2004501987A (ja) | 2000-06-19 | 2004-01-22 | キンバリー クラーク ワールドワイド インコーポレイテッド | 新規な光開始剤及びその用途 |
| US6548215B2 (en) | 2001-02-09 | 2003-04-15 | Kodak Polychrome Graphics Llc | Method for the production of a printing plate using the dual-feed technology |
| US6656661B2 (en) | 2001-04-04 | 2003-12-02 | Kodak Polychrome Graphics, Llc | Waterless imageable element with crosslinked silicone layer |
| US6706454B2 (en) | 2001-07-05 | 2004-03-16 | Kodak Polychrome Graphics Llc | Method for the production of a printing plate using particle growing acceleration by an additive polymer |
| EP3278038A1 (en) * | 2015-03-30 | 2018-02-07 | Carrier Corporation | Low-oil refrigerants and vapor compression systems |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1363984A (fr) * | 1962-04-27 | 1964-06-19 | Minnesota Mining & Mfg | Feuille composite à revêtement diazoïque photo-sensible |
| FR1407899A (fr) * | 1963-07-12 | 1965-08-06 | Kalle Ag | Plaques d'impression sensibilisées préalablement par des o-naphtoquinone-diazides |
| GB1386586A (en) * | 1970-12-30 | 1975-03-12 | Kodak Ltd | Preparation of resist images |
| US3954475A (en) * | 1971-09-03 | 1976-05-04 | Minnesota Mining And Manufacturing Company | Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines |
| DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| US4148654A (en) * | 1976-07-22 | 1979-04-10 | Oddi Michael J | Positive acting photoresist comprising diazide ester, novolak resin and rosin |
| DE2641100C2 (de) * | 1976-09-13 | 1987-02-26 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
| US4189323A (en) * | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
| GB2005855A (en) * | 1977-10-03 | 1979-04-25 | Polychrome Corp | Lithographic imaging composition having improved image visibility |
| US4173470A (en) * | 1977-11-09 | 1979-11-06 | Bell Telephone Laboratories, Incorporated | Novolak photoresist composition and preparation thereof |
| JPS5577742A (en) * | 1978-12-08 | 1980-06-11 | Fuji Photo Film Co Ltd | Photosensitive composition |
-
1981
- 1981-06-15 US US06/273,790 patent/US4350753A/en not_active Expired - Lifetime
-
1982
- 1982-06-09 JP JP57099108A patent/JPS57212437A/ja active Granted
- 1982-06-14 GB GB08217173A patent/GB2102586B/en not_active Expired
- 1982-06-14 CA CA000405073A patent/CA1183035A/en not_active Expired
- 1982-06-15 FR FR828210559A patent/FR2510771B1/fr not_active Expired
- 1982-06-15 DE DE19823222484 patent/DE3222484A1/de not_active Withdrawn
- 1982-06-15 AU AU84864/82A patent/AU549200B2/en not_active Ceased
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4143081A1 (de) * | 1990-12-27 | 1992-07-02 | Toshiba Kawasaki Kk | Lichtempfindliche masse und verfahren zur herstellung eines musters unter verwendung derselben |
| US5332648A (en) * | 1990-12-27 | 1994-07-26 | Kabushiki Kaisha Toshiba | Potosensitive composition and method of forming a pattern using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CA1183035A (en) | 1985-02-26 |
| GB2102586A (en) | 1983-02-02 |
| GB2102586B (en) | 1985-04-03 |
| FR2510771A1 (fr) | 1983-02-04 |
| FR2510771B1 (fr) | 1989-06-30 |
| JPS57212437A (en) | 1982-12-27 |
| JPH0228141B2 (enExample) | 1990-06-21 |
| AU8486482A (en) | 1982-12-23 |
| US4350753A (en) | 1982-09-21 |
| AU549200B2 (en) | 1986-01-16 |
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| Date | Code | Title | Description |
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| 8139 | Disposal/non-payment of the annual fee |