GB2102586B - Composition yielding pre-development high visibility image after radiation exposure - Google Patents

Composition yielding pre-development high visibility image after radiation exposure

Info

Publication number
GB2102586B
GB2102586B GB08217173A GB8217173A GB2102586B GB 2102586 B GB2102586 B GB 2102586B GB 08217173 A GB08217173 A GB 08217173A GB 8217173 A GB8217173 A GB 8217173A GB 2102586 B GB2102586 B GB 2102586B
Authority
GB
United Kingdom
Prior art keywords
radiation exposure
high visibility
development high
visibility image
composition yielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08217173A
Other languages
English (en)
Other versions
GB2102586A (en
Inventor
Alan Wilkes
Ken-Ichi Shimazu
Eugene Golda
James Shelnut
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of GB2102586A publication Critical patent/GB2102586A/en
Application granted granted Critical
Publication of GB2102586B publication Critical patent/GB2102586B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
GB08217173A 1981-06-15 1982-06-14 Composition yielding pre-development high visibility image after radiation exposure Expired GB2102586B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/273,790 US4350753A (en) 1981-06-15 1981-06-15 Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff

Publications (2)

Publication Number Publication Date
GB2102586A GB2102586A (en) 1983-02-02
GB2102586B true GB2102586B (en) 1985-04-03

Family

ID=23045409

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08217173A Expired GB2102586B (en) 1981-06-15 1982-06-14 Composition yielding pre-development high visibility image after radiation exposure

Country Status (7)

Country Link
US (1) US4350753A (enExample)
JP (1) JPS57212437A (enExample)
AU (1) AU549200B2 (enExample)
CA (1) CA1183035A (enExample)
DE (1) DE3222484A1 (enExample)
FR (1) FR2510771B1 (enExample)
GB (1) GB2102586B (enExample)

Families Citing this family (61)

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DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
EP0130599B1 (en) * 1983-06-29 1988-08-10 Fuji Photo Film Co., Ltd. Photosolubilizable composition
US4758497A (en) * 1985-08-22 1988-07-19 Polychrome Corporation Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds
US4845008A (en) * 1986-02-20 1989-07-04 Fuji Photo Film Co., Ltd. Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
US4721665A (en) * 1986-09-29 1988-01-26 Polychrome Corporation Method for neutralizing acidic novolak resin in a lithographic coating composition
JPS6477051A (en) * 1987-06-03 1989-03-23 Konishiroku Photo Ind Photosensitive composition and photosensitive planographic printing plate
GB8719730D0 (en) * 1987-08-20 1987-09-30 Vickers Plc Radiation sensitive compounds
EP0325863A3 (en) * 1987-12-28 1990-07-11 Mark S. Depalma Multi-color ultraviolet radiation measurement device
US4937174A (en) * 1988-02-24 1990-06-26 Arizona Board Of Regents Process of obtaining improved contrast in electron beam lithography
US4877716A (en) * 1988-02-24 1989-10-31 Arizona Board Of Regents Developer solutions for PMMA electron resist
EP0455228B1 (en) * 1990-05-02 1998-08-12 Mitsubishi Chemical Corporation Photoresist composition
JP2919142B2 (ja) * 1990-12-27 1999-07-12 株式会社東芝 感光性組成物およびそれを用いたパターン形成方法
JPH04296754A (ja) * 1991-03-26 1992-10-21 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
CA2085868A1 (en) * 1991-12-25 1993-06-26 Mitsubishi Chemical Corporation Photosensitive composition
GB2277382A (en) * 1993-04-19 1994-10-26 Pan Graphics Ind Limited Photoresist composition
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5685754A (en) * 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5837429A (en) 1995-06-05 1998-11-17 Kimberly-Clark Worldwide Pre-dyes, pre-dye compositions, and methods of developing a color
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
EP0846146B1 (en) 1995-06-28 2001-09-26 Kimberly-Clark Worldwide, Inc. Colorant stabilizing composition
SK102397A3 (en) 1995-11-28 1998-02-04 Kimberly Clark Co Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5948596A (en) * 1997-05-27 1999-09-07 Kodak Polychrome Graphics Llc Digital printing plate comprising a thermal mask
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
KR20010022593A (ko) 1998-06-03 2001-03-26 로날드 디. 맥크레이 신규 광개시제 및 그 이용
BR9906580A (pt) 1998-06-03 2000-09-26 Kimberly Clark Co Neonanoplastos e tecnologia de microemulsão para tintas e impressão de jato de tinta
AU5219299A (en) 1998-07-20 2000-02-07 Kimberly-Clark Worldwide, Inc. Improved ink jet ink compositions
PL366326A1 (en) 1998-09-28 2005-01-24 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
AU2853000A (en) 1999-01-19 2000-08-01 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods ofmaking the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6187510B1 (en) 1999-03-09 2001-02-13 Kodak Polychrome Graphics Llc Digital lithographic printing plate and method of making thereof
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
JP2004501987A (ja) 2000-06-19 2004-01-22 キンバリー　クラーク　ワールドワイド　インコーポレイテッド 新規な光開始剤及びその用途
US6548215B2 (en) 2001-02-09 2003-04-15 Kodak Polychrome Graphics Llc Method for the production of a printing plate using the dual-feed technology
US6656661B2 (en) 2001-04-04 2003-12-02 Kodak Polychrome Graphics, Llc Waterless imageable element with crosslinked silicone layer
US6706454B2 (en) 2001-07-05 2004-03-16 Kodak Polychrome Graphics Llc Method for the production of a printing plate using particle growing acceleration by an additive polymer
EP3278038A1 (en) * 2015-03-30 2018-02-07 Carrier Corporation Low-oil refrigerants and vapor compression systems

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1363984A (fr) * 1962-04-27 1964-06-19 Minnesota Mining & Mfg Feuille composite à revêtement diazoïque photo-sensible
FR1407899A (fr) * 1963-07-12 1965-08-06 Kalle Ag Plaques d'impression sensibilisées préalablement par des o-naphtoquinone-diazides
GB1386586A (en) * 1970-12-30 1975-03-12 Kodak Ltd Preparation of resist images
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4148654A (en) * 1976-07-22 1979-04-10 Oddi Michael J Positive acting photoresist comprising diazide ester, novolak resin and rosin
DE2641100C2 (de) * 1976-09-13 1987-02-26 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
GB2005855A (en) * 1977-10-03 1979-04-25 Polychrome Corp Lithographic imaging composition having improved image visibility
US4173470A (en) * 1977-11-09 1979-11-06 Bell Telephone Laboratories, Incorporated Novolak photoresist composition and preparation thereof
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition

Also Published As

Publication number Publication date
CA1183035A (en) 1985-02-26
DE3222484A1 (de) 1982-12-30
GB2102586A (en) 1983-02-02
FR2510771A1 (fr) 1983-02-04
FR2510771B1 (fr) 1989-06-30
JPS57212437A (en) 1982-12-27
JPH0228141B2 (enExample) 1990-06-21
AU8486482A (en) 1982-12-23
US4350753A (en) 1982-09-21
AU549200B2 (en) 1986-01-16

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Legal Events

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PCNP Patent ceased through non-payment of renewal fee