AU4029478A - Lithographic imaging composition - Google Patents

Lithographic imaging composition

Info

Publication number
AU4029478A
AU4029478A AU40294/78A AU4029478A AU4029478A AU 4029478 A AU4029478 A AU 4029478A AU 40294/78 A AU40294/78 A AU 40294/78A AU 4029478 A AU4029478 A AU 4029478A AU 4029478 A AU4029478 A AU 4029478A
Authority
AU
Australia
Prior art keywords
imaging composition
lithographic imaging
lithographic
composition
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
AU40294/78A
Inventor
Eugene Golda
Alan Leonard Wilkes
Albert S Deutsch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of AU4029478A publication Critical patent/AU4029478A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AU40294/78A 1977-10-03 1978-09-28 Lithographic imaging composition Pending AU4029478A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US83877477A 1977-10-03 1977-10-03

Publications (1)

Publication Number Publication Date
AU4029478A true AU4029478A (en) 1980-04-03

Family

ID=25278012

Family Applications (1)

Application Number Title Priority Date Filing Date
AU40294/78A Pending AU4029478A (en) 1977-10-03 1978-09-28 Lithographic imaging composition

Country Status (7)

Country Link
JP (1) JPS5472103A (en)
AU (1) AU4029478A (en)
DE (1) DE2843069A1 (en)
FR (1) FR2404870A1 (en)
GB (1) GB2005855A (en)
NL (1) NL7809997A (en)
SE (1) SE7810323L (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
US4350753A (en) * 1981-06-15 1982-09-21 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
DE3144480A1 (en) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
JPS5929245A (en) * 1982-08-11 1984-02-16 Hitachi Ltd Photosensitive composition and formation of pattern using it
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
FR2558274A1 (en) * 1984-01-17 1985-07-19 Chemistry Technology Sa Process for the production of positive images on a substrate from a positive transparent plate employing a diazo sensitive surface
EP0161660B1 (en) * 1984-05-14 1991-10-09 Kabushiki Kaisha Toshiba Pattern forming method and composition for pattern formation to be used therefor
TWI791249B (en) * 2021-07-27 2023-02-01 財團法人工業技術研究院 Impregnation liquid and activated carbon cloth and method of forming the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
JPS5626012B2 (en) * 1973-12-07 1981-06-16
DE2331377C2 (en) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Photosensitive copying material
DE2641100C2 (en) * 1976-09-13 1987-02-26 Hoechst Ag, 6230 Frankfurt Light-sensitive mixture

Also Published As

Publication number Publication date
GB2005855A (en) 1979-04-25
SE7810323L (en) 1979-05-17
FR2404870A1 (en) 1979-04-27
DE2843069A1 (en) 1979-04-12
JPS5472103A (en) 1979-06-09
NL7809997A (en) 1979-04-05

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