DE3122992A1 - Verfahren zur herstellung von polysilan - Google Patents
Verfahren zur herstellung von polysilanInfo
- Publication number
- DE3122992A1 DE3122992A1 DE19813122992 DE3122992A DE3122992A1 DE 3122992 A1 DE3122992 A1 DE 3122992A1 DE 19813122992 DE19813122992 DE 19813122992 DE 3122992 A DE3122992 A DE 3122992A DE 3122992 A1 DE3122992 A1 DE 3122992A1
- Authority
- DE
- Germany
- Prior art keywords
- liquid
- tetrahydrofuran
- polysilane
- lithium
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000548 poly(silane) polymer Polymers 0.000 title claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims abstract description 24
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims abstract description 12
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 8
- 239000000725 suspension Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
- 239000003153 chemical reaction reagent Substances 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract description 4
- 229910003822 SiHCl3 Inorganic materials 0.000 abstract description 2
- 239000002243 precursor Substances 0.000 abstract description 2
- 229910003818 SiH2Cl2 Inorganic materials 0.000 abstract 1
- 239000000843 powder Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical compound BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- 229910000497 Amalgam Inorganic materials 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910003826 SiH3Cl Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8019050 | 1980-06-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3122992A1 true DE3122992A1 (de) | 1982-02-04 |
| DE3122992C2 DE3122992C2 (cg-RX-API-DMAC7.html) | 1990-07-19 |
Family
ID=10513960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19813122992 Granted DE3122992A1 (de) | 1980-06-11 | 1981-06-10 | Verfahren zur herstellung von polysilan |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5727915A (cg-RX-API-DMAC7.html) |
| DE (1) | DE3122992A1 (cg-RX-API-DMAC7.html) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10059625A1 (de) * | 2000-09-18 | 2002-05-16 | Peter Plichta | Verfahren zur Herstellung von Höheren Silanen im Hinblick auf ihre Verwendung als Treibstoffe |
| WO2008031427A2 (de) | 2006-09-14 | 2008-03-20 | Rev Renewable Energy Ventures Inc. | Feste polysilan-mischungen |
| US7485691B1 (en) | 2004-10-08 | 2009-02-03 | Kovio, Inc | Polysilane compositions, methods for their synthesis and films formed therefrom |
| US7943721B2 (en) | 2005-10-05 | 2011-05-17 | Kovio, Inc. | Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions |
| US8092867B2 (en) | 2006-10-06 | 2012-01-10 | Kovio, Inc. | Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6027705A (en) * | 1998-01-08 | 2000-02-22 | Showa Denko K.K. | Method for producing a higher silane |
| JP2003313299A (ja) | 2002-04-22 | 2003-11-06 | Seiko Epson Corp | 高次シラン組成物及び該組成物を用いたシリコン膜の形成方法 |
| DE102010063823A1 (de) * | 2010-12-22 | 2012-06-28 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hydridosilanen |
| JP6161719B2 (ja) | 2013-10-21 | 2017-07-12 | 三井化学株式会社 | 高級シランの製造触媒および高級シランの製造方法 |
-
1981
- 1981-06-10 JP JP9070781A patent/JPS5727915A/ja active Granted
- 1981-06-10 DE DE19813122992 patent/DE3122992A1/de active Granted
Non-Patent Citations (1)
| Title |
|---|
| Chem. Berichte, Bd. 56, 1923, S. 247-252 * |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10059625A1 (de) * | 2000-09-18 | 2002-05-16 | Peter Plichta | Verfahren zur Herstellung von Höheren Silanen im Hinblick auf ihre Verwendung als Treibstoffe |
| US8057865B1 (en) | 2004-10-08 | 2011-11-15 | Kovio, Inc. | Polysilane compositions, methods for their synthesis and films formed therefrom |
| US8242227B2 (en) | 2004-10-08 | 2012-08-14 | Kovio, Inc. | Doped polysilanes, compositions containing the same, methods for making the same, and films formed therefrom |
| US7485691B1 (en) | 2004-10-08 | 2009-02-03 | Kovio, Inc | Polysilane compositions, methods for their synthesis and films formed therefrom |
| US7491782B1 (en) | 2004-10-08 | 2009-02-17 | Kovio, Inc. | Polysilane compositions, methods for their synthesis and films formed therefrom |
| US7723457B1 (en) | 2004-10-08 | 2010-05-25 | Kovio, Inc. | Polysilane compositions, methods for their synthesis and films formed therefrom |
| US8455604B1 (en) | 2004-10-08 | 2013-06-04 | Kovio, Inc. | Polysilane compositions, methods for their synthesis and films formed therefrom |
| US8236916B1 (en) | 2004-10-08 | 2012-08-07 | Kovio, Inc. | Polysilane compositions, methods for their synthesis and films formed therefrom |
| US7951892B1 (en) | 2004-10-08 | 2011-05-31 | Kovio, Inc. | Doped polysilanes, compositions containing the same, methods for making the same, and films formed therefrom |
| US8378050B2 (en) | 2005-10-05 | 2013-02-19 | Kovio, Inc. | Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions |
| US7943721B2 (en) | 2005-10-05 | 2011-05-17 | Kovio, Inc. | Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions |
| WO2008031427A3 (de) * | 2006-09-14 | 2008-12-11 | Rev Renewable Energy Ventures | Feste polysilan-mischungen |
| WO2008031427A2 (de) | 2006-09-14 | 2008-03-20 | Rev Renewable Energy Ventures Inc. | Feste polysilan-mischungen |
| US8092867B2 (en) | 2006-10-06 | 2012-01-10 | Kovio, Inc. | Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers |
| US8461284B2 (en) | 2006-10-06 | 2013-06-11 | Kovio, Inc. | Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers |
| US8846507B2 (en) | 2006-10-06 | 2014-09-30 | Thin Film Electronics Asa | Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS641404B2 (cg-RX-API-DMAC7.html) | 1989-01-11 |
| DE3122992C2 (cg-RX-API-DMAC7.html) | 1990-07-19 |
| JPS5727915A (en) | 1982-02-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |