DE3064508D1 - Light-sensitive silver halide materials comprising fluorine-containing surfactants - Google Patents

Light-sensitive silver halide materials comprising fluorine-containing surfactants

Info

Publication number
DE3064508D1
DE3064508D1 DE8080200101T DE3064508T DE3064508D1 DE 3064508 D1 DE3064508 D1 DE 3064508D1 DE 8080200101 T DE8080200101 T DE 8080200101T DE 3064508 T DE3064508 T DE 3064508T DE 3064508 D1 DE3064508 D1 DE 3064508D1
Authority
DE
Germany
Prior art keywords
fluorine
light
silver halide
sensitive silver
containing surfactants
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080200101T
Other languages
English (en)
Inventor
Robert Joseph Pollet
Hendrik Emmanuel Kokelenberg
Rafael Pierre Samijn
Frans Jeanne Sels
Frans Jan Ville
Jaeger Nikolaas Cyriel De
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Application granted granted Critical
Publication of DE3064508D1 publication Critical patent/DE3064508D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/125—Saturated compounds having only one carboxyl group and containing ether groups, groups, groups, or groups
    • C07C59/135—Saturated compounds having only one carboxyl group and containing ether groups, groups, groups, or groups containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C65/00—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C65/21—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C11D1/006—Surface-active compounds containing fluorine and phosphorus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/38—Dispersants; Agents facilitating spreading
    • G03C1/385—Dispersants; Agents facilitating spreading containing fluorine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE8080200101T 1979-02-28 1980-02-07 Light-sensitive silver halide materials comprising fluorine-containing surfactants Expired DE3064508D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7907040 1979-02-28

Publications (1)

Publication Number Publication Date
DE3064508D1 true DE3064508D1 (en) 1983-09-15

Family

ID=10503492

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080200101T Expired DE3064508D1 (en) 1979-02-28 1980-02-07 Light-sensitive silver halide materials comprising fluorine-containing surfactants

Country Status (5)

Country Link
US (1) US4292402A (de)
EP (1) EP0015592B1 (de)
JP (1) JPS55116799A (de)
CA (1) CA1132397A (de)
DE (1) DE3064508D1 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5711341A (en) * 1980-06-25 1982-01-21 Fuji Photo Film Co Ltd Photographic sensitive material
GB2080559B (en) * 1980-06-25 1983-10-12 Fuji Photo Film Co Ltd Silver halide photographic materials
US4335201A (en) * 1980-11-24 1982-06-15 Eastman Kodak Company Antistatic compositions and elements containing same
US4508764A (en) * 1982-12-14 1985-04-02 E. I. Du Pont De Nemours And Company Coating process employs surfactants
JPS60441A (ja) * 1983-06-17 1985-01-05 Fuji Photo Film Co Ltd 製版用ハロゲン化銀写真感光材料
JPS62109044A (ja) * 1985-11-08 1987-05-20 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
EP0239363B1 (de) 1986-03-25 1992-10-28 Konica Corporation Lichtempfindliches photographisches Silberhalogenidmaterial, das für schnelle Entwicklung verwendbar ist
USH674H (en) 1986-11-04 1989-09-05 Konica Corporation Silver halide photographic light-sensitive material capable of super-rapid processing
JPH01268696A (ja) * 1988-04-19 1989-10-26 Daikin Ind Ltd 含フッ素リン酸エステル及びその製法並びに含フッ素防錆剤
GB8817811D0 (en) * 1988-07-26 1988-09-01 Kodak Ltd Hydrophilic colloid compositions for photographic materials
JP2876133B2 (ja) * 1989-08-29 1999-03-31 コニカ株式会社 ハロゲン化銀写真感光材料
EP0693709A1 (de) * 1994-07-18 1996-01-24 Minnesota Mining And Manufacturing Company Fluoropolymeren und fluorierte Tenside zur Verbesserung des antistatischen Verhaltens von Materialien und lichtempfindliches Material mit verbessertem antistatischen Verhalten
US7279522B2 (en) * 2001-09-05 2007-10-09 3M Innovative Properties Company Fluoropolymer dispersions containing no or little low molecular weight fluorinated surfactant
US20080015304A1 (en) 2006-07-13 2008-01-17 Klaus Hintzer Aqueous emulsion polymerization process for producing fluoropolymers
GB0525978D0 (en) 2005-12-21 2006-02-01 3M Innovative Properties Co Fluorinated Surfactants For Making Fluoropolymers
GB0514398D0 (en) 2005-07-15 2005-08-17 3M Innovative Properties Co Aqueous emulsion polymerization of fluorinated monomers using a fluorinated surfactant
US7795332B2 (en) 2005-07-15 2010-09-14 3M Innovative Properties Company Method of removing fluorinated carboxylic acid from aqueous liquid
GB0523853D0 (en) * 2005-11-24 2006-01-04 3M Innovative Properties Co Fluorinated surfactants for use in making a fluoropolymer
US7754795B2 (en) 2006-05-25 2010-07-13 3M Innovative Properties Company Coating composition
DE102006031143A1 (de) * 2006-07-04 2008-01-24 Merck Patent Gmbh Fluortenside
DE102006031262A1 (de) * 2006-07-04 2008-01-10 Merck Patent Gmbh Fluortenside
DE102006031149A1 (de) 2006-07-04 2008-01-10 Merck Patent Gmbh Fluortenside
DE102006032391A1 (de) * 2006-07-04 2008-01-17 Merck Patent Gmbh Fluortenside
DE102006031151A1 (de) 2006-07-04 2008-01-10 Merck Patent Gmbh Fluortenside
US8119750B2 (en) 2006-07-13 2012-02-21 3M Innovative Properties Company Explosion taming surfactants for the production of perfluoropolymers
KR20100017848A (ko) 2007-05-23 2010-02-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화 계면활성제의 수성 조성물 및 그의 사용 방법
WO2008154345A1 (en) 2007-06-06 2008-12-18 3M Innovative Properties Company Fluorinated ether compositions and methods of using the same
CN102149674A (zh) * 2008-07-18 2011-08-10 3M创新有限公司 氟化醚化合物及其使用方法
WO2010080473A1 (en) 2008-12-18 2010-07-15 3M Innovative Properties Company Method of contacting hydrocarbon-bearing formations with fluorinated ether compositions
TW201127809A (en) * 2009-09-02 2011-08-16 Du Pont Process for the synthesis of fluorinated ethers of aromatic acids
WO2014095036A1 (de) 2012-12-21 2014-06-26 Merck Patent Gmbh Fluortenside
WO2015124290A1 (de) 2014-02-21 2015-08-27 Merck Patent Gmbh Fluortenside
US11104639B2 (en) * 2016-09-14 2021-08-31 Daikin Industries, Ltd. Branched fluorine-containing compound

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2409274A (en) * 1943-04-23 1946-10-15 Du Pont Polyfluoro organic ethers and their preparation
US2973389A (en) * 1957-07-24 1961-02-28 Hoechst Ag Fluorinated organic ethers
GB1130822A (en) * 1966-01-12 1968-10-16 Ici Ltd Flourinated compounds containing functional groups
BE742680A (de) * 1968-12-09 1970-06-05
GB1293189A (en) * 1970-06-04 1972-10-18 Agfa Gevaert Photographic silver halide element
GB1363665A (en) * 1970-07-13 1974-08-14 Polaroid Corp Photographic products and processes
NL7204067A (de) * 1971-03-29 1972-10-03
JPS5040659B1 (de) * 1971-06-18 1975-12-25
US3850642A (en) * 1971-07-16 1974-11-26 Eastman Kodak Co Multilayer radiation sensitive element having controlled triboelectric charging characteristics
CA962281A (en) * 1971-08-21 1975-02-04 Sameeh S. Toukan Fluorinated alkyl sulfides and process for their preparation
JPS5226687B2 (de) * 1973-06-11 1977-07-15
US4047804A (en) * 1973-12-26 1977-09-13 Polaroid Corporation Anti-reflection coatings for photographic bases
JPS576577B2 (de) * 1973-12-29 1982-02-05
US4201586A (en) * 1974-06-17 1980-05-06 Fuji Photo Film Co., Ltd. Photographic light-sensitive material
US4239915A (en) * 1976-12-02 1980-12-16 Ciba-Geigy Corporation Perfluoroalkyl carboxylic acids
JPS6021371B2 (ja) * 1977-07-04 1985-05-27 コニカ株式会社 ハロゲン化銀写真感光材料の製造方法

Also Published As

Publication number Publication date
JPH0228132B2 (de) 1990-06-21
US4292402A (en) 1981-09-29
CA1132397A (en) 1982-09-28
JPS55116799A (en) 1980-09-08
EP0015592B1 (de) 1983-08-10
EP0015592A1 (de) 1980-09-17

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee