DE3043156A1 - Verfahren zum trimmen eines bauelementes fuer akustische oberflaechenwellen - Google Patents
Verfahren zum trimmen eines bauelementes fuer akustische oberflaechenwellenInfo
- Publication number
- DE3043156A1 DE3043156A1 DE19803043156 DE3043156A DE3043156A1 DE 3043156 A1 DE3043156 A1 DE 3043156A1 DE 19803043156 DE19803043156 DE 19803043156 DE 3043156 A DE3043156 A DE 3043156A DE 3043156 A1 DE3043156 A1 DE 3043156A1
- Authority
- DE
- Germany
- Prior art keywords
- component
- etching gas
- trimming
- center frequency
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000034 method Methods 0.000 title claims description 35
- 238000009966 trimming Methods 0.000 title claims description 25
- 239000000463 material Substances 0.000 claims description 25
- 238000005530 etching Methods 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 19
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 239000007772 electrode material Substances 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims 1
- 150000001805 chlorine compounds Chemical class 0.000 claims 1
- 150000002222 fluorine compounds Chemical class 0.000 claims 1
- 238000010897 surface acoustic wave method Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000012544 monitoring process Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- -1 CCl Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
- H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/113,832 US4278492A (en) | 1980-01-21 | 1980-01-21 | Frequency trimming of surface acoustic wave devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3043156A1 true DE3043156A1 (de) | 1981-07-23 |
Family
ID=22351767
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19803043156 Ceased DE3043156A1 (de) | 1980-01-21 | 1980-11-15 | Verfahren zum trimmen eines bauelementes fuer akustische oberflaechenwellen |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4278492A (enExample) |
| JP (1) | JPS56103513A (enExample) |
| DE (1) | DE3043156A1 (enExample) |
| FR (1) | FR2474256A1 (enExample) |
| GB (1) | GB2069277B (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4364016A (en) * | 1980-11-03 | 1982-12-14 | Sperry Corporation | Method for post fabrication frequency trimming of surface acoustic wave devices |
| US4414243A (en) * | 1982-07-06 | 1983-11-08 | General Electric Company | Method for making surface acoustic wave devices |
| FR2551861B1 (fr) * | 1983-09-09 | 1985-10-18 | Thomson Csf | Procede de mesure de la profondeur d'une gravure ionique |
| US4595853A (en) * | 1983-11-17 | 1986-06-17 | Hitachi, Ltd. | Apparatus for and method of determining properties of saw substrates |
| US4764244A (en) * | 1985-06-11 | 1988-08-16 | The Foxboro Company | Resonant sensor and method of making same |
| US4672254A (en) * | 1985-10-11 | 1987-06-09 | Massachusetts Institute Of Technology | Surface acoustic wave devices and method of manufacture thereof |
| GB2203590B (en) * | 1987-04-02 | 1991-02-06 | Stc Plc | Resonator manufacture |
| US4836882A (en) * | 1988-09-12 | 1989-06-06 | The United States Of America As Represented By The Secretary Of The Army | Method of making an acceleration hardened resonator |
| US4890369A (en) * | 1988-10-28 | 1990-01-02 | United Technologies Corporation | Method of manufacturing saw devices |
| US5111168A (en) * | 1990-08-15 | 1992-05-05 | Texas Instruments Incorporated | Real-time, in-situ saw filter delay adjustment |
| JP3244386B2 (ja) * | 1994-08-23 | 2002-01-07 | 松下電器産業株式会社 | 弾性表面波装置 |
| US5630949A (en) * | 1995-06-01 | 1997-05-20 | Tfr Technologies, Inc. | Method and apparatus for fabricating a piezoelectric resonator to a resonant frequency |
| US6273991B1 (en) * | 1999-07-28 | 2001-08-14 | Saunders & Associates, Inc. | Apparatus for plasma ion trimming of frequency devices |
| RU2190922C2 (ru) * | 2000-11-30 | 2002-10-10 | Омский научно-исследовательский институт приборостроения | Способ настройки на центральную частоту сверхузкополосного элемента на поверхностных акустических волнах |
| EP1381156A4 (en) * | 2001-04-19 | 2004-09-08 | Matsushita Electric Industrial Co Ltd | SURFACE WAVE COMPONENT AND METHOD FOR THE PRODUCTION THEREOF AND ELECTRONIC COMPONENT THEREFOR |
| KR101245296B1 (ko) | 2005-04-06 | 2013-03-19 | 바이오스케일, 아이엔씨. | 전기 응답 디바이스 |
| US9164051B2 (en) | 2005-04-06 | 2015-10-20 | Bioscale, Inc. | Electrically responsive device |
| WO2007127107A2 (en) * | 2006-04-21 | 2007-11-08 | Bioscale, Inc. | Microfabricated devices and method for fabricating microfabricated devices |
| US8689426B2 (en) | 2008-12-17 | 2014-04-08 | Sand 9, Inc. | Method of manufacturing a resonating structure |
| WO2011109382A1 (en) | 2010-03-01 | 2011-09-09 | Sand9, Inc. | Microelectromechanical gyroscopes and related apparatus and methods |
| US8833161B2 (en) | 2010-04-20 | 2014-09-16 | Sand 9, Inc. | Microelectromechanical gyroscopes and related apparatus and methods |
| WO2012040043A1 (en) | 2010-09-20 | 2012-03-29 | Sand9, Inc. | Resonant sensing using extensional modes of a plate |
| US9383208B2 (en) | 2011-10-13 | 2016-07-05 | Analog Devices, Inc. | Electromechanical magnetometer and applications thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3971684A (en) * | 1973-12-03 | 1976-07-27 | Hewlett-Packard Company | Etching thin film circuits and semiconductor chips |
| US4092588A (en) * | 1976-03-05 | 1978-05-30 | Thomson-Csf | Method of monitoring the machining by ion bombardment of a piezoelectric wafer |
| US4144507A (en) * | 1976-09-29 | 1979-03-13 | Texas Instruments Incorporated | Surface acoustic wave resonator incorporating coupling transducer into reflecting arrays |
| US4176004A (en) * | 1978-08-21 | 1979-11-27 | Westinghouse Electric Corp. | Method for modifying the characteristics of a semiconductor fusions |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1529941A (en) * | 1975-01-15 | 1978-10-25 | Mullard Ltd | Electrical filters including coupled resonators |
-
1980
- 1980-01-21 US US06/113,832 patent/US4278492A/en not_active Expired - Lifetime
- 1980-10-29 GB GB8034778A patent/GB2069277B/en not_active Expired
- 1980-11-15 DE DE19803043156 patent/DE3043156A1/de not_active Ceased
- 1980-12-30 FR FR8027786A patent/FR2474256A1/fr active Granted
-
1981
- 1981-01-21 JP JP778681A patent/JPS56103513A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3971684A (en) * | 1973-12-03 | 1976-07-27 | Hewlett-Packard Company | Etching thin film circuits and semiconductor chips |
| US4092588A (en) * | 1976-03-05 | 1978-05-30 | Thomson-Csf | Method of monitoring the machining by ion bombardment of a piezoelectric wafer |
| US4144507A (en) * | 1976-09-29 | 1979-03-13 | Texas Instruments Incorporated | Surface acoustic wave resonator incorporating coupling transducer into reflecting arrays |
| US4176004A (en) * | 1978-08-21 | 1979-11-27 | Westinghouse Electric Corp. | Method for modifying the characteristics of a semiconductor fusions |
Non-Patent Citations (7)
| Title |
|---|
| #### * |
| ADAMS,CH. et al: Deeplay Etched S.A.W. Resonators,In: Proc. 31st Frequency Control Symposium (1977),S. 246-250 * |
| COLDREN, L.A. et al: Surface-Acoustic-Wave Resonator Filters. In: Proc. of the IEEE, Vol.67, No.1, Jan. 1979, S.147-158 * |
| CROSS, P.S. et al: Electronically variable survace-acoustic-wave velocity and tunable SAW resonators. In: Applied Physics Letters, Vol.28, No.1, 1. Jan. 1976, S.1-3 * |
| HAYDL,W.H. et al: Fine Tuning of Surface-Acoustic-Wave Resonantor Filters with Metallisation Thickness. In: Electronics Letters, 12th June 1975Vol. 11, No.12, S.252-253 * |
| JAMES, S. et al: Fine Tuning of S.A.W. Resona- tors using Argon Ion Bombardment. In: Electronics Letters, 11th Oct. 1979, Vol.15, No.21, S.683-684 * |
| TANSKI, W.J.: Surface Acoustic Wave Resonators on Quartz. In: IEEE Transactions on Sonics and Ultrasonics, Vol.SU-26,No.2,March 1979,S.03-104 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US4278492A (en) | 1981-07-14 |
| JPS56103513A (en) | 1981-08-18 |
| FR2474256B1 (enExample) | 1985-03-29 |
| GB2069277B (en) | 1984-05-10 |
| GB2069277A (en) | 1981-08-19 |
| FR2474256A1 (fr) | 1981-07-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3043156A1 (de) | Verfahren zum trimmen eines bauelementes fuer akustische oberflaechenwellen | |
| DE10207342B4 (de) | Verfahren zum Liefern unterschiedlicher Frequenzeinstellungen bei einem akustischen Dünnfilmvolumenresonator- (FBAR-) Filter und Vorrichtung, die das Verfahren beinhaltet | |
| DE10207341B4 (de) | Verfahren zum Erzeugen akustischer Dünnfilmvolumenresonatoren (FBARs) mit unterschiedlichen Frequenzen auf einem einzelnen Substrat und Vorrichtung, die das Verfahren beinhaltet | |
| DE10207324B4 (de) | Verfahren zum Herstellen akustischer Dünnfilmvolumenresonatoren (FBARs) mit unterschiedlichen Frequenzen auf dem gleichen Substrat durch ein Substraktionsverfahren und Vorrichtung, die das Verfahren beinhaltet | |
| DE10207329B4 (de) | Verfahren zur Massenbelastung akustischer Dünnfilmvolumenresonatoren (FBARs) zum Erzeugen von Resonatoren mit unterschiedlichen Frequenzen und Vorrichtung, die das Verfahren beinhaltet | |
| DE3437498C2 (de) | Akustischer Wellenresonator und Verfahren zu seiner Herstellung | |
| DE3013185C2 (enExample) | ||
| DE10207328A1 (de) | Verfahren zum Liefern unterschiedlicher Frequenzeinstellungen bei einem akustischen Dünnfilmvolumenresonator- (FBAR-) Filter und Vorrichtung, die das Verfahren beinhaltet | |
| DE2521290A1 (de) | Oberflaechenwellenresonatorvorrichtung | |
| DE68918372T2 (de) | Piezoelektrischer Wandler zur Volumenwellenerregung. | |
| DE3026655C2 (enExample) | ||
| DE2303798C2 (de) | Verfahren zum Herstellen von Halbleiterbauelementen | |
| DE3245658C2 (enExample) | ||
| DE2849782C2 (de) | Piezoelektrischer Schwinger | |
| DE69124339T2 (de) | Elektroden- und elektrodenleitungsstruktur eines piezoelektrischen resonators aus einer ultradünnen schicht | |
| DE2604105A1 (de) | Oberflaechenwellenbauelement | |
| DE3336281A1 (de) | Oberflaechenschallwellenvorrichtung | |
| DE10254611A1 (de) | Kristalloszillator und Verfahren zu dessen Herstellung | |
| DE2256624C3 (de) | Quarzkristallschwinger und Verfahren zu seiner Herstellung | |
| DE2440718C2 (de) | Anordnung für akustische Oberflächenwellen und Verfahren zur Herstellung einer derartigen Anordnung | |
| DE7307288U (de) | Akustischer oberflaechenschwingungsresonator | |
| DE19916885B4 (de) | Piezoelektrisches Bauteil | |
| DE10146363B4 (de) | Oberflächenwellenbauelement und Verfahren zum Herstellen desselben | |
| DE2708720A1 (de) | Verfahren und vorrichtung zum chemischen behandeln eines werkstuecks vermittels glimmentladung | |
| DE2239696B2 (de) | Piezoelektrischer Hochfrequenz-Dickenresonator und Verfahren zu seiner Herstellung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8128 | New person/name/address of the agent |
Representative=s name: SCHULTE, K., DIPL.-ING., PAT.-ASS., 7030 BOEBLINGE |
|
| 8128 | New person/name/address of the agent |
Representative=s name: KOHLER, R., DIPL.-PHYS. SCHWINDLING, H., DIPL.-PHY |
|
| 8110 | Request for examination paragraph 44 | ||
| 8131 | Rejection |