DE2902860A1 - Durch bestrahlung vernetzbare masse fuer die herstellung photographischer aufzeichnungsmaterialien - Google Patents

Durch bestrahlung vernetzbare masse fuer die herstellung photographischer aufzeichnungsmaterialien

Info

Publication number
DE2902860A1
DE2902860A1 DE19792902860 DE2902860A DE2902860A1 DE 2902860 A1 DE2902860 A1 DE 2902860A1 DE 19792902860 DE19792902860 DE 19792902860 DE 2902860 A DE2902860 A DE 2902860A DE 2902860 A1 DE2902860 A1 DE 2902860A1
Authority
DE
Germany
Prior art keywords
iii
cobalt
complex
amine
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19792902860
Other languages
German (de)
English (en)
Inventor
Anthony Adin
John Charles Wilson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of DE2902860A1 publication Critical patent/DE2902860A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE19792902860 1978-01-27 1979-01-25 Durch bestrahlung vernetzbare masse fuer die herstellung photographischer aufzeichnungsmaterialien Withdrawn DE2902860A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87285278A 1978-01-27 1978-01-27
US91886578A 1978-06-26 1978-06-26

Publications (1)

Publication Number Publication Date
DE2902860A1 true DE2902860A1 (de) 1979-08-02

Family

ID=27128264

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19792902860 Withdrawn DE2902860A1 (de) 1978-01-27 1979-01-25 Durch bestrahlung vernetzbare masse fuer die herstellung photographischer aufzeichnungsmaterialien

Country Status (4)

Country Link
JP (1) JPS54113326A (enrdf_load_stackoverflow)
DE (1) DE2902860A1 (enrdf_load_stackoverflow)
FR (1) FR2415823A1 (enrdf_load_stackoverflow)
GB (1) GB2013214B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4225689A (en) * 1978-07-26 1980-09-30 Eastman Kodak Company Aldehyde-containing vinylaryl ethers
JPH02173752A (ja) * 1988-12-27 1990-07-05 Japan Synthetic Rubber Co Ltd 感放射線性組成物
KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE757961A (fr) * 1969-10-24 1971-04-01 Ici Ltd Procedes pour enregistrer une image
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex

Also Published As

Publication number Publication date
JPS54113326A (en) 1979-09-04
GB2013214A (en) 1979-08-08
FR2415823B1 (enrdf_load_stackoverflow) 1981-04-10
GB2013214B (en) 1982-08-18
FR2415823A1 (fr) 1979-08-24

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee