JPS54113326A - Photocrosslinkable composition - Google Patents

Photocrosslinkable composition

Info

Publication number
JPS54113326A
JPS54113326A JP770179A JP770179A JPS54113326A JP S54113326 A JPS54113326 A JP S54113326A JP 770179 A JP770179 A JP 770179A JP 770179 A JP770179 A JP 770179A JP S54113326 A JPS54113326 A JP S54113326A
Authority
JP
Japan
Prior art keywords
photocrosslinkable composition
photocrosslinkable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP770179A
Other languages
Japanese (ja)
Inventor
Adein Ansonii
Chiyaaruzu Uiruson Jiyon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of JPS54113326A publication Critical patent/JPS54113326A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP770179A 1978-01-27 1979-01-27 Photocrosslinkable composition Pending JPS54113326A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87285278A 1978-01-27 1978-01-27
US91886578A 1978-06-26 1978-06-26

Publications (1)

Publication Number Publication Date
JPS54113326A true JPS54113326A (en) 1979-09-04

Family

ID=27128264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP770179A Pending JPS54113326A (en) 1978-01-27 1979-01-27 Photocrosslinkable composition

Country Status (4)

Country Link
JP (1) JPS54113326A (en)
DE (1) DE2902860A1 (en)
FR (1) FR2415823A1 (en)
GB (1) GB2013214B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173752A (en) * 1988-12-27 1990-07-05 Japan Synthetic Rubber Co Ltd Radiation sensitive composition

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4225689A (en) * 1978-07-26 1980-09-30 Eastman Kodak Company Aldehyde-containing vinylaryl ethers
KR100395904B1 (en) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 Organic Anti-reflective coating material and its preparation

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE757961A (en) * 1969-10-24 1971-04-01 Ici Ltd METHODS FOR SAVING AN IMAGE
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173752A (en) * 1988-12-27 1990-07-05 Japan Synthetic Rubber Co Ltd Radiation sensitive composition

Also Published As

Publication number Publication date
FR2415823A1 (en) 1979-08-24
DE2902860A1 (en) 1979-08-02
FR2415823B1 (en) 1981-04-10
GB2013214A (en) 1979-08-08
GB2013214B (en) 1982-08-18

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