FR2415823A1 - PHOTORETICULABLE COMPOSITION CONTAINING A POLYMER WITH A CARBONYL GROUP, PHOTOSENSITIVE PRODUCT OBTAINED FROM THIS COMPOSITION AND IMAGE FORMATION PROCESS WHICH USES THIS PRODUCT - Google Patents

PHOTORETICULABLE COMPOSITION CONTAINING A POLYMER WITH A CARBONYL GROUP, PHOTOSENSITIVE PRODUCT OBTAINED FROM THIS COMPOSITION AND IMAGE FORMATION PROCESS WHICH USES THIS PRODUCT

Info

Publication number
FR2415823A1
FR2415823A1 FR7901909A FR7901909A FR2415823A1 FR 2415823 A1 FR2415823 A1 FR 2415823A1 FR 7901909 A FR7901909 A FR 7901909A FR 7901909 A FR7901909 A FR 7901909A FR 2415823 A1 FR2415823 A1 FR 2415823A1
Authority
FR
France
Prior art keywords
polymer
composition
product
image formation
carbonyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7901909A
Other languages
French (fr)
Other versions
FR2415823B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2415823A1 publication Critical patent/FR2415823A1/en
Application granted granted Critical
Publication of FR2415823B1 publication Critical patent/FR2415823B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

La présente invention est relative à la photographie. La composition photoréticulable suivant l'invention comprend un polymère comprenant des motifs contenant un ou plusieurs groupes carbonyle pouvant réagir sur une amine et un composé formateur d'amine sous l'action de la lumière. Application à l'obtention d'images de polymère photoréticulé, utile, par exemple, en impression lithographique.The present invention relates to photography. The photocrosslinkable composition according to the invention comprises a polymer comprising units containing one or more carbonyl groups capable of reacting with an amine and an amine-forming compound under the action of light. Application to obtaining images of photocrosslinked polymer, useful, for example, in lithographic printing.

FR7901909A 1978-01-27 1979-01-25 PHOTORETICULABLE COMPOSITION CONTAINING A POLYMER WITH A CARBONYL GROUP, PHOTOSENSITIVE PRODUCT OBTAINED FROM THIS COMPOSITION AND IMAGE FORMATION PROCESS WHICH USES THIS PRODUCT Granted FR2415823A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87285278A 1978-01-27 1978-01-27
US91886578A 1978-06-26 1978-06-26

Publications (2)

Publication Number Publication Date
FR2415823A1 true FR2415823A1 (en) 1979-08-24
FR2415823B1 FR2415823B1 (en) 1981-04-10

Family

ID=27128264

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7901909A Granted FR2415823A1 (en) 1978-01-27 1979-01-25 PHOTORETICULABLE COMPOSITION CONTAINING A POLYMER WITH A CARBONYL GROUP, PHOTOSENSITIVE PRODUCT OBTAINED FROM THIS COMPOSITION AND IMAGE FORMATION PROCESS WHICH USES THIS PRODUCT

Country Status (4)

Country Link
JP (1) JPS54113326A (en)
DE (1) DE2902860A1 (en)
FR (1) FR2415823A1 (en)
GB (1) GB2013214B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2432008A1 (en) * 1978-07-26 1980-02-22 Eastman Kodak Co POLYMERIZABLE VINYL COMPOUND, PROCESS FOR PREPARING SAME, AND POLYMER OBTAINED THEREFROM

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173752A (en) * 1988-12-27 1990-07-05 Japan Synthetic Rubber Co Ltd Radiation sensitive composition
KR100395904B1 (en) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 Organic Anti-reflective coating material and its preparation

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2052198A1 (en) * 1969-10-24 1971-05-06 Imperial Chemical Industries Ltd , London, Ilford Ltd , Ilford, Essex, (Großbritannien) Image recording method and photosensitive material therefor
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2052198A1 (en) * 1969-10-24 1971-05-06 Imperial Chemical Industries Ltd , London, Ilford Ltd , Ilford, Essex, (Großbritannien) Image recording method and photosensitive material therefor
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2432008A1 (en) * 1978-07-26 1980-02-22 Eastman Kodak Co POLYMERIZABLE VINYL COMPOUND, PROCESS FOR PREPARING SAME, AND POLYMER OBTAINED THEREFROM

Also Published As

Publication number Publication date
GB2013214A (en) 1979-08-08
FR2415823B1 (en) 1981-04-10
GB2013214B (en) 1982-08-18
JPS54113326A (en) 1979-09-04
DE2902860A1 (en) 1979-08-02

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