DE2616992B2 - - Google Patents

Info

Publication number
DE2616992B2
DE2616992B2 DE19762616992 DE2616992A DE2616992B2 DE 2616992 B2 DE2616992 B2 DE 2616992B2 DE 19762616992 DE19762616992 DE 19762616992 DE 2616992 A DE2616992 A DE 2616992A DE 2616992 B2 DE2616992 B2 DE 2616992B2
Authority
DE
Germany
Prior art keywords
photosensitive
novolak
molecular weight
novolak resin
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19762616992
Other languages
German (de)
English (en)
Other versions
DE2616992C3 (de
DE2616992A1 (de
Inventor
Dieter Dr. 4150 Krefeld Freitag
Manfred Dr. 4150 Krefeld Schmidt
Juergen 5074 Odenthal Strobach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert AG
Original Assignee
Agfa Gevaert AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert AG filed Critical Agfa Gevaert AG
Priority to DE19762616992 priority Critical patent/DE2616992C3/de
Publication of DE2616992A1 publication Critical patent/DE2616992A1/de
Publication of DE2616992B2 publication Critical patent/DE2616992B2/de
Application granted granted Critical
Publication of DE2616992C3 publication Critical patent/DE2616992C3/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
DE19762616992 1976-04-17 1976-04-17 Lichtempfindliches Kopiermaterial zur Herstellung von Reliefs Expired DE2616992C3 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19762616992 DE2616992C3 (de) 1976-04-17 1976-04-17 Lichtempfindliches Kopiermaterial zur Herstellung von Reliefs

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762616992 DE2616992C3 (de) 1976-04-17 1976-04-17 Lichtempfindliches Kopiermaterial zur Herstellung von Reliefs

Publications (3)

Publication Number Publication Date
DE2616992A1 DE2616992A1 (de) 1977-11-03
DE2616992B2 true DE2616992B2 (enExample) 1980-04-17
DE2616992C3 DE2616992C3 (de) 1987-10-22

Family

ID=5975643

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19762616992 Expired DE2616992C3 (de) 1976-04-17 1976-04-17 Lichtempfindliches Kopiermaterial zur Herstellung von Reliefs

Country Status (1)

Country Link
DE (1) DE2616992C3 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4342852A (en) * 1979-12-27 1982-08-03 Mitsui Petrochemical Industries, Ltd. Setting type resin composition containing a substantially linear, high-molecular-weight novolak substituted phenolic resin
JPS5817112A (ja) * 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン ポジ型ノボラツクホトレジスト組成物及びその調製物
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
JPS59152A (ja) * 1982-06-25 1984-01-05 Hitachi Chem Co Ltd 画像形成性樹脂組成物
CA1255952A (en) * 1983-03-04 1989-06-20 Akihiro Furuta Positive type photoresist composition
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPH0650396B2 (ja) * 1985-08-09 1994-06-29 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
CA1279430C (en) * 1985-12-06 1991-01-22 Takashi Kubota High-molecular-weight soluble novolak resin and process for preparation thereof
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
EP0251187A3 (en) * 1986-06-27 1988-03-30 Nippon Zeon Co., Ltd. Method for purifying novolak resins useful as material for coating on a semiconductor substrate
JPH0680119B2 (ja) * 1986-06-27 1994-10-12 日本ゼオン株式会社 ノボラツク樹脂の精製方法
JPH0654391B2 (ja) * 1987-03-06 1994-07-20 住友化学工業株式会社 電子線又はｘ線用ポジ型レジスト組成物
KR100708249B1 (ko) 2002-08-30 2007-04-16 아사히 유키자이 고교 가부시키가이샤 노볼락형 페놀 수지의 제조방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1350773A (en) * 1971-02-26 1974-04-24 Oce Van Der Grinten Nv Naphthoquinone diazide compounds and light-sensitive reproduction materials containing them
JPS5723253B2 (enExample) * 1974-03-25 1982-05-18

Also Published As

Publication number Publication date
DE2616992C3 (de) 1987-10-22
DE2616992A1 (de) 1977-11-03

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Legal Events

Date Code Title Description
OD Request for examination
C3 Grant after two publication steps (3rd publication)
8339 Ceased/non-payment of the annual fee