DE2525401C3 - Anordnung zur Erzeugung einer Strahlung mit hoher Intensität - Google Patents
Anordnung zur Erzeugung einer Strahlung mit hoher IntensitätInfo
- Publication number
- DE2525401C3 DE2525401C3 DE19752525401 DE2525401A DE2525401C3 DE 2525401 C3 DE2525401 C3 DE 2525401C3 DE 19752525401 DE19752525401 DE 19752525401 DE 2525401 A DE2525401 A DE 2525401A DE 2525401 C3 DE2525401 C3 DE 2525401C3
- Authority
- DE
- Germany
- Prior art keywords
- gas
- discharge space
- arc
- liquid
- arrangement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005855 radiation Effects 0.000 title claims description 16
- 239000007788 liquid Substances 0.000 claims description 38
- 230000000087 stabilizing effect Effects 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 48
- 239000002826 coolant Substances 0.000 description 8
- 239000012530 fluid Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 239000010937 tungsten Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000003260 vortexing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
- H01J61/28—Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
Landscapes
- Discharge Lamps And Accessories Thereof (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US47887274A | 1974-06-13 | 1974-06-13 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2525401A1 DE2525401A1 (de) | 1976-01-02 |
| DE2525401B2 DE2525401B2 (de) | 1977-10-27 |
| DE2525401C3 true DE2525401C3 (de) | 1978-06-22 |
Family
ID=23901715
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19752525401 Expired DE2525401C3 (de) | 1974-06-13 | 1975-06-06 | Anordnung zur Erzeugung einer Strahlung mit hoher Intensität |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5111684A (https=) |
| CA (1) | CA1015817A (https=) |
| DE (1) | DE2525401C3 (https=) |
| FR (1) | FR2275024A1 (https=) |
| GB (1) | GB1468137A (https=) |
| NL (1) | NL166580C (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2310883A1 (en) | 1999-06-07 | 2000-12-07 | Norman L. Arrison | Method and apparatus for fracturing brittle materials by thermal stressing |
| US6912356B2 (en) | 1999-06-07 | 2005-06-28 | Diversified Industries Ltd. | Method and apparatus for fracturing brittle materials by thermal stressing |
| US6621199B1 (en) | 2000-01-21 | 2003-09-16 | Vortek Industries Ltd. | High intensity electromagnetic radiation apparatus and method |
| CN1926658B (zh) * | 2004-02-12 | 2012-10-10 | 加拿大马特森技术有限公司 | 高强度电磁辐射装置与方法 |
| US7781947B2 (en) | 2004-02-12 | 2010-08-24 | Mattson Technology Canada, Inc. | Apparatus and methods for producing electromagnetic radiation |
| JP2011014541A (ja) * | 2010-07-09 | 2011-01-20 | Mattson Technology Canada Inc | 高強度の電磁放射線発生装置及び発生方法 |
| DE102011089090B4 (de) * | 2011-12-19 | 2014-07-03 | Von Ardenne Anlagentechnik Gmbh | Gasentladungslampe mit Kühleinrichtung |
| US9927094B2 (en) * | 2012-01-17 | 2018-03-27 | Kla-Tencor Corporation | Plasma cell for providing VUV filtering in a laser-sustained plasma light source |
-
1975
- 1975-04-11 CA CA224,438A patent/CA1015817A/en not_active Expired
- 1975-06-03 NL NL7506545A patent/NL166580C/xx not_active IP Right Cessation
- 1975-06-05 FR FR7517599A patent/FR2275024A1/fr active Granted
- 1975-06-06 DE DE19752525401 patent/DE2525401C3/de not_active Expired
- 1975-06-11 JP JP7068275A patent/JPS5111684A/ja active Granted
- 1975-06-12 GB GB2524775A patent/GB1468137A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1468137A (en) | 1977-03-23 |
| JPS5111684A (ja) | 1976-01-29 |
| NL166580B (nl) | 1981-03-16 |
| JPS5340274B2 (https=) | 1978-10-26 |
| FR2275024B1 (https=) | 1978-06-23 |
| FR2275024A1 (fr) | 1976-01-09 |
| DE2525401A1 (de) | 1976-01-02 |
| CA1015817A (en) | 1977-08-16 |
| DE2525401B2 (de) | 1977-10-27 |
| NL166580C (nl) | 1981-08-17 |
| NL7506545A (nl) | 1975-12-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: UNIVERSITY OF BRITISH COLUMBIA, VANCOUVER, BRITISH |
|
| 8328 | Change in the person/name/address of the agent |
Free format text: DEUFEL, P., DIPL.-WIRTSCH.-ING.DR.RER.NAT. HERTEL, W., DIPL.-PHYS. LEWALD, D., DIPL.-ING., PAT.-ANWAELTE, 8000 MUENCHEN |