DE2510210C3 - Plasmafokus-Reaktor - Google Patents
Plasmafokus-ReaktorInfo
- Publication number
- DE2510210C3 DE2510210C3 DE2510210A DE2510210A DE2510210C3 DE 2510210 C3 DE2510210 C3 DE 2510210C3 DE 2510210 A DE2510210 A DE 2510210A DE 2510210 A DE2510210 A DE 2510210A DE 2510210 C3 DE2510210 C3 DE 2510210C3
- Authority
- DE
- Germany
- Prior art keywords
- focus
- inner electrode
- plasma
- electrodes
- plasma focus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001816 cooling Methods 0.000 claims description 17
- 239000000110 cooling liquid Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052805 deuterium Inorganic materials 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/28—Cooling arrangements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2510210A DE2510210C3 (de) | 1975-03-08 | 1975-03-08 | Plasmafokus-Reaktor |
| FR7605381A FR2304244A1 (fr) | 1975-03-08 | 1976-02-26 | Canon a plasma |
| GB7882/76A GB1531326A (en) | 1975-03-08 | 1976-02-27 | Plasma cannon |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2510210A DE2510210C3 (de) | 1975-03-08 | 1975-03-08 | Plasmafokus-Reaktor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2510210A1 DE2510210A1 (de) | 1976-09-30 |
| DE2510210B2 DE2510210B2 (de) | 1979-04-12 |
| DE2510210C3 true DE2510210C3 (de) | 1979-12-13 |
Family
ID=5940847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2510210A Expired DE2510210C3 (de) | 1975-03-08 | 1975-03-08 | Plasmafokus-Reaktor |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2510210C3 (OSRAM) |
| FR (1) | FR2304244A1 (OSRAM) |
| GB (1) | GB1531326A (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4907407A (en) * | 1988-02-10 | 1990-03-13 | Olin Corporation | Lifetime arcjet thruster |
| DE3809292C2 (de) * | 1988-03-19 | 1997-02-06 | Messer Griesheim Gmbh | Flüssigstrahlschneidbrenner |
| DE4226229A1 (de) * | 1992-08-07 | 1994-02-10 | Igenwert Gmbh | Verfahren und Vorrichtung zur Impulsbeaufschlagung einer Festkörperoberfläche, insbesondere einer Werkstoffoberfläche |
| DE102016215712A1 (de) * | 2016-08-22 | 2018-02-22 | Siemens Aktiengesellschaft | Vorrichtung und Verfahren zur Erzeugung eines elektrischen Plasmas |
| CN119922809A (zh) * | 2025-02-26 | 2025-05-02 | 上海科技大学 | 一种适用于等离子体枪的组合式热交换器 |
-
1975
- 1975-03-08 DE DE2510210A patent/DE2510210C3/de not_active Expired
-
1976
- 1976-02-26 FR FR7605381A patent/FR2304244A1/fr active Granted
- 1976-02-27 GB GB7882/76A patent/GB1531326A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1531326A (en) | 1978-11-08 |
| DE2510210A1 (de) | 1976-09-30 |
| DE2510210B2 (de) | 1979-04-12 |
| FR2304244B3 (OSRAM) | 1978-11-17 |
| FR2304244A1 (fr) | 1976-10-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| EHJ | Ceased/non-payment of the annual fee |