DE2501344C2 - Halbleiterlaser mit Doppelheterostruktur - Google Patents
Halbleiterlaser mit DoppelheterostrukturInfo
- Publication number
- DE2501344C2 DE2501344C2 DE2501344A DE2501344A DE2501344C2 DE 2501344 C2 DE2501344 C2 DE 2501344C2 DE 2501344 A DE2501344 A DE 2501344A DE 2501344 A DE2501344 A DE 2501344A DE 2501344 C2 DE2501344 C2 DE 2501344C2
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- active zone
- layer
- zone
- width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title claims description 8
- 230000005855 radiation Effects 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 29
- 230000007704 transition Effects 0.000 description 14
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000005284 excitation Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/065—Gp III-V generic compounds-processing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/067—Graded energy gap
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/072—Heterojunctions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/145—Shaped junctions
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US434181A US3883821A (en) | 1974-01-17 | 1974-01-17 | Single transverse mode operation in double heterostructure junction lasers having an active layer of nonuniform thickness |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2501344A1 DE2501344A1 (de) | 1975-08-07 |
DE2501344C2 true DE2501344C2 (de) | 1984-03-15 |
Family
ID=23723141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2501344A Expired DE2501344C2 (de) | 1974-01-17 | 1975-01-15 | Halbleiterlaser mit Doppelheterostruktur |
Country Status (6)
Country | Link |
---|---|
US (1) | US3883821A (en, 2012) |
JP (1) | JPS5740672B2 (en, 2012) |
CA (1) | CA1020657A (en, 2012) |
DE (1) | DE2501344C2 (en, 2012) |
FR (1) | FR2258711B1 (en, 2012) |
GB (1) | GB1493201A (en, 2012) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4213805A (en) * | 1973-05-28 | 1980-07-22 | Hitachi, Ltd. | Liquid phase epitaxy method of forming a filimentary laser device |
US4121177A (en) * | 1973-05-28 | 1978-10-17 | Hitachi, Ltd. | Semiconductor device and a method of fabricating the same |
US3916339A (en) * | 1974-11-25 | 1975-10-28 | Rca Corp | Asymmetrically excited semiconductor injection laser |
US4326176A (en) * | 1976-04-16 | 1982-04-20 | Hitachi, Ltd. | Semiconductor laser device |
US4166253A (en) * | 1977-08-15 | 1979-08-28 | International Business Machines Corporation | Heterostructure diode injection laser having a constricted active region |
US4190813A (en) * | 1977-12-28 | 1980-02-26 | Bell Telephone Laboratories, Incorporated | Strip buried heterostructure laser |
CA1127282A (en) * | 1978-05-22 | 1982-07-06 | Takashi Sugino | Semiconductor laser and method of making the same |
JPS5522807A (en) * | 1978-06-30 | 1980-02-18 | Hitachi Ltd | Semiconductor laser element and manufacturing of the same |
US4340967A (en) * | 1980-06-02 | 1982-07-20 | Bell Telephone Laboratories, Incorporated | Semiconductor lasers with stable higher-order modes parallel to the junction plane |
JPS58165282U (ja) * | 1982-04-30 | 1983-11-02 | 藤倉ゴム工業株式会社 | ピストン式流体作動装置 |
JPS58165283U (ja) * | 1982-04-30 | 1983-11-02 | 藤倉ゴム工業株式会社 | ピストン式流体作動装置 |
US4787086A (en) * | 1986-05-19 | 1988-11-22 | American Telephone And Telegraph Company, At&T Bell Laboratories | High-power, fundamental transverse mode laser |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3758875A (en) * | 1970-05-01 | 1973-09-11 | Bell Telephone Labor Inc | Double heterostructure junction lasers |
JPS502235B1 (en, 2012) * | 1970-09-07 | 1975-01-24 | ||
GB1273284A (en) * | 1970-10-13 | 1972-05-03 | Standard Telephones Cables Ltd | Improvements in or relating to injection lasers |
US3790902A (en) * | 1972-09-05 | 1974-02-05 | Bell Telephone Labor Inc | Fundamental transverse mode operation in solid state lasers |
-
1974
- 1974-01-17 US US434181A patent/US3883821A/en not_active Expired - Lifetime
- 1974-11-18 CA CA213,952A patent/CA1020657A/en not_active Expired
-
1975
- 1975-01-14 FR FR7501027A patent/FR2258711B1/fr not_active Expired
- 1975-01-14 GB GB1634/75A patent/GB1493201A/en not_active Expired
- 1975-01-15 DE DE2501344A patent/DE2501344C2/de not_active Expired
- 1975-01-17 JP JP50007184A patent/JPS5740672B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1493201A (en) | 1977-11-30 |
JPS50104883A (en, 2012) | 1975-08-19 |
US3883821A (en) | 1975-05-13 |
DE2501344A1 (de) | 1975-08-07 |
FR2258711A1 (en, 2012) | 1975-08-18 |
FR2258711B1 (en, 2012) | 1977-07-01 |
JPS5740672B2 (en, 2012) | 1982-08-28 |
CA1020657A (en) | 1977-11-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2165006C3 (de) | Halbleiterlaser | |
DE69033518T2 (de) | Im transversalen Mode schwingender Halbleiterlaser | |
DE2454733C2 (de) | Halbleiterlaser | |
DE19531615A1 (de) | Belastete Quantumwell-Struktur | |
DE69314816T2 (de) | Lichtemittierende Halbleitervorrichtung | |
DE2716750A1 (de) | Halbleiterlaser | |
DE2501344C2 (de) | Halbleiterlaser mit Doppelheterostruktur | |
DE2822146C2 (de) | Heterostruktur-Halbleiterlaserdiode und Verfahren zur Herstellung einer Heterostruktur-Halbleiterdiode | |
DE2643503B2 (de) | Verfahren zur Herstellung eines Injektionslasers | |
DE2538471A1 (de) | Optisches bauelement mit doppelheterostruktur | |
DE2925648C2 (en, 2012) | ||
DE19514392B4 (de) | Halbleiterlaservorrichtung mit großem Ansteuerungsstrom | |
DE2856507A1 (de) | Halbleiter-laserdiode | |
DE68910492T2 (de) | Halbleiterlaservorrichtung. | |
DE69029935T2 (de) | Halbleiterlaser mit Grabenprofil in Form einer inversen Mesa | |
DE60222724T2 (de) | Halbleiterlaserelement | |
DE69315303T2 (de) | Halbleiterlaser-Element | |
DE2236410A1 (de) | Halbleiter-injektionslaser | |
DE3714512C2 (en, 2012) | ||
DE2556850C2 (de) | Heteroübergangs-Diodenlaser | |
DE3786934T2 (de) | Halbleiterlaser von eingebettetem Struktur-Typ und dessen Herstellungsverfahren. | |
DE3221497A1 (de) | Stabilisierter halbleiterlaser | |
DE2312162B2 (de) | Halbleiterlaserplaettchen und verfahren zu seiner herstellung | |
DE69815461T2 (de) | Halbleiterlaservorrichtung | |
DE2632222A1 (de) | Halbleiter-lichtquelle |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
8125 | Change of the main classification |
Ipc: H01S 3/19 |
|
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |