DE2452826B2 - Verfahren und Vorrichtung zur Bestimmung der Höhenlage von Punkten einer Oberfläche - Google Patents

Verfahren und Vorrichtung zur Bestimmung der Höhenlage von Punkten einer Oberfläche

Info

Publication number
DE2452826B2
DE2452826B2 DE2452826A DE2452826A DE2452826B2 DE 2452826 B2 DE2452826 B2 DE 2452826B2 DE 2452826 A DE2452826 A DE 2452826A DE 2452826 A DE2452826 A DE 2452826A DE 2452826 B2 DE2452826 B2 DE 2452826B2
Authority
DE
Germany
Prior art keywords
detector
electrons
reference plane
determining
shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE2452826A
Other languages
German (de)
English (en)
Other versions
DE2452826A1 (de
Inventor
Edward A. Depew Gasiecki
Hiramie T. Williamsville Mcadams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Calspan Corp
Original Assignee
Calspan Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Calspan Corp filed Critical Calspan Corp
Publication of DE2452826A1 publication Critical patent/DE2452826A1/de
Publication of DE2452826B2 publication Critical patent/DE2452826B2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/04—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/08—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring roughness or irregularity of surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
DE2452826A 1973-11-09 1974-11-07 Verfahren und Vorrichtung zur Bestimmung der Höhenlage von Punkten einer Oberfläche Withdrawn DE2452826B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US414568A US3876879A (en) 1973-11-09 1973-11-09 Method and apparatus for determining surface characteristics incorporating a scanning electron microscope

Publications (2)

Publication Number Publication Date
DE2452826A1 DE2452826A1 (de) 1975-05-15
DE2452826B2 true DE2452826B2 (de) 1979-10-04

Family

ID=23642012

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2452826A Withdrawn DE2452826B2 (de) 1973-11-09 1974-11-07 Verfahren und Vorrichtung zur Bestimmung der Höhenlage von Punkten einer Oberfläche

Country Status (6)

Country Link
US (1) US3876879A (cg-RX-API-DMAC7.html)
JP (1) JPS5511204B2 (cg-RX-API-DMAC7.html)
DE (1) DE2452826B2 (cg-RX-API-DMAC7.html)
FR (1) FR2250977A1 (cg-RX-API-DMAC7.html)
GB (1) GB1485449A (cg-RX-API-DMAC7.html)
NL (1) NL7414104A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3811673A1 (de) * 1988-04-07 1989-10-19 Herbert Dr Konitz Rasterelektronenmikroskopisches verfahren zum vermessen der profilierung, insbesondere der rauhigkeit, von oberflaechen und vorrichtung zur durchfuehrung des verfahrens

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD124091A1 (cg-RX-API-DMAC7.html) * 1975-09-24 1977-02-02
US4144488A (en) * 1977-12-22 1979-03-13 The United States Of America As Represented By The Secretary Of The Navy Investigation of near-surface electronic properties in semiconductors by electron beam scanning
US4142145A (en) * 1977-12-22 1979-02-27 The United States Of America As Represented By The Secretary Of The Navy Method for determining conduction-band edge and electron affinity in semiconductors
CA1202508A (en) * 1981-05-07 1986-04-01 Norio Murata Protective packaging assembly and method for optical fibers
DE3306194A1 (de) * 1982-02-25 1983-09-08 Mitsubishi Denki K.K., Tokyo Verfahren zur pruefung von schraubenoberflaechen auf fehler und vorrichtung zu seiner durchfuehrung
US4475037A (en) * 1982-05-11 1984-10-02 International Business Machines Corporation Method of inspecting a mask using an electron beam vector scan system
JPS6089050A (ja) * 1983-10-20 1985-05-18 Toshiba Corp ストロボ走査電子顕微鏡
US4733074A (en) * 1985-04-17 1988-03-22 Hitachi, Ltd. Sample surface structure measuring method
US4788431A (en) * 1987-04-10 1988-11-29 The Perkin-Elmer Corporation Specimen distance measuring system
JPH0663758B2 (ja) * 1987-10-14 1994-08-22 株式会社東芝 パターンの測定方法
FR2634061B1 (fr) * 1988-07-06 1991-04-05 Commissariat Energie Atomique Evaporateur a bombardement electronique muni de moyens de recuperation des electrons retrodiffuses
US5150392A (en) * 1991-09-09 1992-09-22 International Business Machines Corporation X-ray mask containing a cantilevered tip for gap control and alignment
US5734164A (en) * 1996-11-26 1998-03-31 Amray, Inc. Charged particle apparatus having a canted column
US6969852B2 (en) * 2004-03-22 2005-11-29 General Phoshonix Llc Method of evaluating of a scanning electron microscope for precise measurements
JP2005286161A (ja) * 2004-03-30 2005-10-13 Ebara Corp 形状修復方法及び装置、並びにそれらを用いた半導体デバイス製造方法
JP4538421B2 (ja) * 2006-02-24 2010-09-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1195271A (en) * 1967-02-16 1970-06-17 Cambridge Instr Co Ltd Electron Beam Apparatus
US3549999A (en) * 1968-06-05 1970-12-22 Gen Electric Method and apparatus for testing circuits by measuring secondary emission electrons generated by electron beam bombardment of the pulsed circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3811673A1 (de) * 1988-04-07 1989-10-19 Herbert Dr Konitz Rasterelektronenmikroskopisches verfahren zum vermessen der profilierung, insbesondere der rauhigkeit, von oberflaechen und vorrichtung zur durchfuehrung des verfahrens

Also Published As

Publication number Publication date
DE2452826A1 (de) 1975-05-15
JPS5081175A (cg-RX-API-DMAC7.html) 1975-07-01
GB1485449A (en) 1977-09-14
FR2250977A1 (cg-RX-API-DMAC7.html) 1975-06-06
NL7414104A (nl) 1975-05-13
US3876879A (en) 1975-04-08
JPS5511204B2 (cg-RX-API-DMAC7.html) 1980-03-24

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Legal Events

Date Code Title Description
OGA New person/name/address of the applicant
OGA New person/name/address of the applicant
BHN Withdrawal