JPS5511204B2 - - Google Patents
Info
- Publication number
- JPS5511204B2 JPS5511204B2 JP12948074A JP12948074A JPS5511204B2 JP S5511204 B2 JPS5511204 B2 JP S5511204B2 JP 12948074 A JP12948074 A JP 12948074A JP 12948074 A JP12948074 A JP 12948074A JP S5511204 B2 JPS5511204 B2 JP S5511204B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/04—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/08—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring roughness or irregularity of surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US414568A US3876879A (en) | 1973-11-09 | 1973-11-09 | Method and apparatus for determining surface characteristics incorporating a scanning electron microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5081175A JPS5081175A (ja) | 1975-07-01 |
| JPS5511204B2 true JPS5511204B2 (ja) | 1980-03-24 |
Family
ID=23642012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12948074A Expired JPS5511204B2 (ja) | 1973-11-09 | 1974-11-08 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3876879A (ja) |
| JP (1) | JPS5511204B2 (ja) |
| DE (1) | DE2452826B2 (ja) |
| FR (1) | FR2250977A1 (ja) |
| GB (1) | GB1485449A (ja) |
| NL (1) | NL7414104A (ja) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD124091A1 (ja) * | 1975-09-24 | 1977-02-02 | ||
| US4144488A (en) * | 1977-12-22 | 1979-03-13 | The United States Of America As Represented By The Secretary Of The Navy | Investigation of near-surface electronic properties in semiconductors by electron beam scanning |
| US4142145A (en) * | 1977-12-22 | 1979-02-27 | The United States Of America As Represented By The Secretary Of The Navy | Method for determining conduction-band edge and electron affinity in semiconductors |
| CA1202508A (en) * | 1981-05-07 | 1986-04-01 | Norio Murata | Protective packaging assembly and method for optical fibers |
| DE3306194A1 (de) * | 1982-02-25 | 1983-09-08 | Mitsubishi Denki K.K., Tokyo | Verfahren zur pruefung von schraubenoberflaechen auf fehler und vorrichtung zu seiner durchfuehrung |
| US4475037A (en) * | 1982-05-11 | 1984-10-02 | International Business Machines Corporation | Method of inspecting a mask using an electron beam vector scan system |
| JPS6089050A (ja) * | 1983-10-20 | 1985-05-18 | Toshiba Corp | ストロボ走査電子顕微鏡 |
| US4733074A (en) * | 1985-04-17 | 1988-03-22 | Hitachi, Ltd. | Sample surface structure measuring method |
| US4788431A (en) * | 1987-04-10 | 1988-11-29 | The Perkin-Elmer Corporation | Specimen distance measuring system |
| JPH0663758B2 (ja) * | 1987-10-14 | 1994-08-22 | 株式会社東芝 | パターンの測定方法 |
| DE3811673A1 (de) * | 1988-04-07 | 1989-10-19 | Herbert Dr Konitz | Rasterelektronenmikroskopisches verfahren zum vermessen der profilierung, insbesondere der rauhigkeit, von oberflaechen und vorrichtung zur durchfuehrung des verfahrens |
| FR2634061B1 (fr) * | 1988-07-06 | 1991-04-05 | Commissariat Energie Atomique | Evaporateur a bombardement electronique muni de moyens de recuperation des electrons retrodiffuses |
| US5150392A (en) * | 1991-09-09 | 1992-09-22 | International Business Machines Corporation | X-ray mask containing a cantilevered tip for gap control and alignment |
| US5734164A (en) * | 1996-11-26 | 1998-03-31 | Amray, Inc. | Charged particle apparatus having a canted column |
| US6969852B2 (en) * | 2004-03-22 | 2005-11-29 | General Phoshonix Llc | Method of evaluating of a scanning electron microscope for precise measurements |
| JP2005286161A (ja) * | 2004-03-30 | 2005-10-13 | Ebara Corp | 形状修復方法及び装置、並びにそれらを用いた半導体デバイス製造方法 |
| JP4538421B2 (ja) | 2006-02-24 | 2010-09-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1195271A (en) * | 1967-02-16 | 1970-06-17 | Cambridge Instr Co Ltd | Electron Beam Apparatus |
| US3549999A (en) * | 1968-06-05 | 1970-12-22 | Gen Electric | Method and apparatus for testing circuits by measuring secondary emission electrons generated by electron beam bombardment of the pulsed circuit |
-
1973
- 1973-11-09 US US414568A patent/US3876879A/en not_active Expired - Lifetime
-
1974
- 1974-10-29 NL NL7414104A patent/NL7414104A/xx unknown
- 1974-11-05 GB GB47837/74A patent/GB1485449A/en not_active Expired
- 1974-11-07 DE DE2452826A patent/DE2452826B2/de not_active Withdrawn
- 1974-11-08 JP JP12948074A patent/JPS5511204B2/ja not_active Expired
- 1974-11-08 FR FR7437083A patent/FR2250977A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| DE2452826B2 (de) | 1979-10-04 |
| GB1485449A (en) | 1977-09-14 |
| FR2250977A1 (ja) | 1975-06-06 |
| US3876879A (en) | 1975-04-08 |
| DE2452826A1 (de) | 1975-05-15 |
| NL7414104A (nl) | 1975-05-13 |
| JPS5081175A (ja) | 1975-07-01 |