DE2448850C2 - Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial - Google Patents
Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und SchichtübertragungsmaterialInfo
- Publication number
- DE2448850C2 DE2448850C2 DE2448850A DE2448850A DE2448850C2 DE 2448850 C2 DE2448850 C2 DE 2448850C2 DE 2448850 A DE2448850 A DE 2448850A DE 2448850 A DE2448850 A DE 2448850A DE 2448850 C2 DE2448850 C2 DE 2448850C2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- copper
- mercapto
- dry
- photopolymerizable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
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- 239000000463 material Substances 0.000 title description 10
- 238000012546 transfer Methods 0.000 title description 8
- 239000010949 copper Substances 0.000 claims description 34
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 32
- 229910052802 copper Inorganic materials 0.000 claims description 31
- 239000002318 adhesion promoter Substances 0.000 claims description 24
- -1 mercapto compound Chemical class 0.000 claims description 17
- 239000011230 binding agent Substances 0.000 claims description 8
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- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
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- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
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- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 2
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 2
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- 229910000906 Bronze Inorganic materials 0.000 description 2
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- 238000011161 development Methods 0.000 description 2
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- 239000000975 dye Substances 0.000 description 2
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- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
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- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- MAOBFOXLCJIFLV-UHFFFAOYSA-N (2-aminophenyl)-phenylmethanone Chemical compound NC1=CC=CC=C1C(=O)C1=CC=CC=C1 MAOBFOXLCJIFLV-UHFFFAOYSA-N 0.000 description 1
- MRIKSZXJKCQQFT-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) prop-2-enoate Chemical compound OCC(C)(C)COC(=O)C=C MRIKSZXJKCQQFT-UHFFFAOYSA-N 0.000 description 1
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- YVCHPMROVUZJDK-UHFFFAOYSA-N 2-sulfanylicosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCC(S)C(O)=O YVCHPMROVUZJDK-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 1
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- 229910001369 Brass Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
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- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- FHNINJWBTRXEBC-UHFFFAOYSA-N Sudan III Chemical compound OC1=CC=C2C=CC=CC2=C1N=NC(C=C1)=CC=C1N=NC1=CC=CC=C1 FHNINJWBTRXEBC-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229910000994 Tombac Inorganic materials 0.000 description 1
- AGKPGIOZNCJFTQ-UHFFFAOYSA-N [2-(methylamino)phenyl]-phenylmethanone Chemical compound CNC1=CC=CC=C1C(=O)C1=CC=CC=C1 AGKPGIOZNCJFTQ-UHFFFAOYSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- HDFRDWFLWVCOGP-UHFFFAOYSA-N carbonothioic O,S-acid Chemical class OC(S)=O HDFRDWFLWVCOGP-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 241001233037 catfish Species 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- 230000001055 chewing effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
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- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- MNEVGNCIZWZKLR-UHFFFAOYSA-N copper;phenol Chemical compound [Cu].OC1=CC=CC=C1.OC1=CC=CC=C1 MNEVGNCIZWZKLR-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
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- 239000012954 diazonium Substances 0.000 description 1
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- 235000013312 flour Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
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- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 1
- LDTLDBDUBGAEDT-UHFFFAOYSA-N methyl 3-sulfanylpropanoate Chemical compound COC(=O)CCS LDTLDBDUBGAEDT-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- BODCCJMIZYPXCB-UHFFFAOYSA-N n-[3-[2-cyanoethyl(2-hydroxyethyl)amino]-4-methoxyphenyl]acetamide Chemical compound COC1=CC=C(NC(C)=O)C=C1N(CCO)CCC#N BODCCJMIZYPXCB-UHFFFAOYSA-N 0.000 description 1
- SGMHGVVTMOGJMX-UHFFFAOYSA-N n-naphthalen-2-yl-2-sulfanylacetamide Chemical compound C1=CC=CC2=CC(NC(=O)CS)=CC=C21 SGMHGVVTMOGJMX-UHFFFAOYSA-N 0.000 description 1
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 1
- 239000010956 nickel silver Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- UCUPUEARJPTGKU-UHFFFAOYSA-N octadecyl 3-sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCS UCUPUEARJPTGKU-UHFFFAOYSA-N 0.000 description 1
- QUWPKSVNVOPLKX-UHFFFAOYSA-N octan-3-yl 2-sulfanylacetate Chemical compound CCCCCC(CC)OC(=O)CS QUWPKSVNVOPLKX-UHFFFAOYSA-N 0.000 description 1
- 150000002897 organic nitrogen compounds Chemical class 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- PHIQPXBZDGYJOG-UHFFFAOYSA-N sodium silicate nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[Na+].[Na+].[O-][Si]([O-])=O PHIQPXBZDGYJOG-UHFFFAOYSA-N 0.000 description 1
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- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/155—Nonresinous additive to promote interlayer adhesion in element
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2448850A DE2448850C2 (de) | 1974-10-14 | 1974-10-14 | Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
CA237,433A CA1075956A (en) | 1974-10-14 | 1975-10-10 | Alkyl mercaptan derivative used in association with a thermoplastic photopolymerizable copying layer to impart adhesion |
IT7551227A IT1047810B (it) | 1974-10-14 | 1975-10-10 | Procedimento per l applicazione di uno strato di copiatura e materiale per realizzarlo |
CH1317275A CH599578A5 (forum.php) | 1974-10-14 | 1975-10-10 | |
JP50123153A JPS5952413B2 (ja) | 1974-10-14 | 1975-10-13 | 光重合可能な複写層を施す方法 |
GB41800/75A GB1530913A (en) | 1974-10-14 | 1975-10-13 | Copying materials |
FR7531235A FR2288337A1 (fr) | 1974-10-14 | 1975-10-13 | Procede pour appliquer une couche reprographique (cas 2) |
SE7511440A SE402358B (sv) | 1974-10-14 | 1975-10-13 | Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering |
BE160897A BE834454A (fr) | 1974-10-14 | 1975-10-13 | Procede pour appliquer une couche reprographique |
US06/004,124 US4233395A (en) | 1974-10-14 | 1979-01-17 | Photopolymerizable transfer material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2448850A DE2448850C2 (de) | 1974-10-14 | 1974-10-14 | Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2448850A1 DE2448850A1 (de) | 1976-04-22 |
DE2448850C2 true DE2448850C2 (de) | 1986-03-13 |
Family
ID=5928240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2448850A Expired DE2448850C2 (de) | 1974-10-14 | 1974-10-14 | Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
Country Status (10)
Country | Link |
---|---|
US (1) | US4233395A (forum.php) |
JP (1) | JPS5952413B2 (forum.php) |
BE (1) | BE834454A (forum.php) |
CA (1) | CA1075956A (forum.php) |
CH (1) | CH599578A5 (forum.php) |
DE (1) | DE2448850C2 (forum.php) |
FR (1) | FR2288337A1 (forum.php) |
GB (1) | GB1530913A (forum.php) |
IT (1) | IT1047810B (forum.php) |
SE (1) | SE402358B (forum.php) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2658422C2 (de) * | 1976-12-23 | 1986-05-22 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung eines Negativ-Trockenresistfilms |
JPS5651735A (en) * | 1979-10-03 | 1981-05-09 | Asahi Chem Ind Co Ltd | Photoreactive composition |
JPS5876827A (ja) * | 1981-10-30 | 1983-05-10 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
JPS58100485A (ja) * | 1981-12-10 | 1983-06-15 | 株式会社 オ−ク製作所 | プリント基板製造方法 |
US4615950A (en) * | 1985-03-15 | 1986-10-07 | M&T Chemicals Inc. | Printed circuit boards having improved adhesion between solder mask and metal |
JPS61217036A (ja) * | 1985-03-22 | 1986-09-26 | Kuraray Co Ltd | 水溶性感光性組成物 |
US4764449A (en) * | 1985-11-01 | 1988-08-16 | The Chromaline Corporation | Adherent sandblast photoresist laminate |
US5089376A (en) * | 1986-12-08 | 1992-02-18 | Armstrong World Industries, Inc. | Photoimagable solder mask coating |
US5320933A (en) * | 1990-03-30 | 1994-06-14 | Morton International, Inc. | Photoimageable composition having improved adhesion promoter |
US5466325A (en) * | 1993-06-02 | 1995-11-14 | Nitto Denko Corporation | Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method |
US6124044A (en) * | 1995-10-27 | 2000-09-26 | Cal-West Equipment Company, Inc. | Polymeric peel-off coating compositions and methods of use thereof |
WO2006059392A1 (ja) * | 2004-12-03 | 2006-06-08 | Tokyo Ohka Kogyo Co., Ltd. | 化学増幅型ホトレジスト組成物、ホトレジスト層積層体、ホトレジスト組成物製造方法、ホトレジストパターンの製造方法及び接続端子の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1275471A (en) * | 1969-06-04 | 1972-05-24 | Du Pont | Improvements relating to photo-resists |
US3873316A (en) * | 1970-06-11 | 1975-03-25 | Kalle Ag | Process for the production of a light-sensitive copying material having a copper-containing support, and copying material so produced |
US3645772A (en) * | 1970-06-30 | 1972-02-29 | Du Pont | Process for improving bonding of a photoresist to copper |
US3853727A (en) * | 1972-07-31 | 1974-12-10 | Grace W R & Co | Sprayable photocurable surface coating composition |
-
1974
- 1974-10-14 DE DE2448850A patent/DE2448850C2/de not_active Expired
-
1975
- 1975-10-10 IT IT7551227A patent/IT1047810B/it active
- 1975-10-10 CH CH1317275A patent/CH599578A5/xx not_active IP Right Cessation
- 1975-10-10 CA CA237,433A patent/CA1075956A/en not_active Expired
- 1975-10-13 SE SE7511440A patent/SE402358B/xx not_active IP Right Cessation
- 1975-10-13 FR FR7531235A patent/FR2288337A1/fr active Granted
- 1975-10-13 GB GB41800/75A patent/GB1530913A/en not_active Expired
- 1975-10-13 JP JP50123153A patent/JPS5952413B2/ja not_active Expired
- 1975-10-13 BE BE160897A patent/BE834454A/xx not_active IP Right Cessation
-
1979
- 1979-01-17 US US06/004,124 patent/US4233395A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS5952413B2 (ja) | 1984-12-19 |
SE402358B (sv) | 1978-06-26 |
CH599578A5 (forum.php) | 1978-05-31 |
JPS5164920A (en) | 1976-06-04 |
GB1530913A (en) | 1978-11-01 |
US4233395A (en) | 1980-11-11 |
IT1047810B (it) | 1980-10-20 |
DE2448850A1 (de) | 1976-04-22 |
BE834454A (fr) | 1976-04-13 |
SE7511440L (sv) | 1976-04-15 |
CA1075956A (en) | 1980-04-22 |
FR2288337A1 (fr) | 1976-05-14 |
FR2288337B1 (forum.php) | 1982-07-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
8181 | Inventor (new situation) |
Free format text: KLUEPFEL, KURT-WALTER, DR., 6200 WIESBADEN, DE SPRENGEL, HEIDE, 6202 WIESBADEN, DE |
|
D2 | Grant after examination | ||
8364 | No opposition during term of opposition |