SE402358B - Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering - Google Patents

Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering

Info

Publication number
SE402358B
SE402358B SE7511440A SE7511440A SE402358B SE 402358 B SE402358 B SE 402358B SE 7511440 A SE7511440 A SE 7511440A SE 7511440 A SE7511440 A SE 7511440A SE 402358 B SE402358 B SE 402358B
Authority
SE
Sweden
Prior art keywords
layer
copper
procedure
applying
respect
Prior art date
Application number
SE7511440A
Other languages
English (en)
Swedish (sv)
Other versions
SE7511440L (sv
Inventor
K Klupfel
H Sprengel
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SE7511440L publication Critical patent/SE7511440L/xx
Publication of SE402358B publication Critical patent/SE402358B/xx

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/155—Nonresinous additive to promote interlayer adhesion in element

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
SE7511440A 1974-10-14 1975-10-13 Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering SE402358B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2448850A DE2448850C2 (de) 1974-10-14 1974-10-14 Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial

Publications (2)

Publication Number Publication Date
SE7511440L SE7511440L (sv) 1976-04-15
SE402358B true SE402358B (sv) 1978-06-26

Family

ID=5928240

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7511440A SE402358B (sv) 1974-10-14 1975-10-13 Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering

Country Status (10)

Country Link
US (1) US4233395A (xx)
JP (1) JPS5952413B2 (xx)
BE (1) BE834454A (xx)
CA (1) CA1075956A (xx)
CH (1) CH599578A5 (xx)
DE (1) DE2448850C2 (xx)
FR (1) FR2288337A1 (xx)
GB (1) GB1530913A (xx)
IT (1) IT1047810B (xx)
SE (1) SE402358B (xx)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
JPS5651735A (en) * 1979-10-03 1981-05-09 Asahi Chem Ind Co Ltd Photoreactive composition
JPS5876827A (ja) * 1981-10-30 1983-05-10 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS58100485A (ja) * 1981-12-10 1983-06-15 株式会社　オ−ク製作所 プリント基板製造方法
US4615950A (en) * 1985-03-15 1986-10-07 M&T Chemicals Inc. Printed circuit boards having improved adhesion between solder mask and metal
JPS61217036A (ja) * 1985-03-22 1986-09-26 Kuraray Co Ltd 水溶性感光性組成物
US4764449A (en) * 1985-11-01 1988-08-16 The Chromaline Corporation Adherent sandblast photoresist laminate
US5089376A (en) * 1986-12-08 1992-02-18 Armstrong World Industries, Inc. Photoimagable solder mask coating
US5320933A (en) * 1990-03-30 1994-06-14 Morton International, Inc. Photoimageable composition having improved adhesion promoter
US5466325A (en) * 1993-06-02 1995-11-14 Nitto Denko Corporation Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method
US6124044A (en) * 1995-10-27 2000-09-26 Cal-West Equipment Company, Inc. Polymeric peel-off coating compositions and methods of use thereof
EP2202579A3 (en) * 2004-12-03 2010-10-27 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified photoresist composition, photoresist laminated product, manufacturing method for photoresist composition, manufacturing method for photoresist pattern, and manufacturing method for connection element

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1275471A (en) * 1969-06-04 1972-05-24 Du Pont Improvements relating to photo-resists
US3873316A (en) * 1970-06-11 1975-03-25 Kalle Ag Process for the production of a light-sensitive copying material having a copper-containing support, and copying material so produced
US3645772A (en) * 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
US3853727A (en) * 1972-07-31 1974-12-10 Grace W R & Co Sprayable photocurable surface coating composition

Also Published As

Publication number Publication date
FR2288337A1 (fr) 1976-05-14
GB1530913A (en) 1978-11-01
JPS5952413B2 (ja) 1984-12-19
IT1047810B (it) 1980-10-20
BE834454A (fr) 1976-04-13
SE7511440L (sv) 1976-04-15
CA1075956A (en) 1980-04-22
JPS5164920A (en) 1976-06-04
DE2448850A1 (de) 1976-04-22
CH599578A5 (xx) 1978-05-31
US4233395A (en) 1980-11-11
FR2288337B1 (xx) 1982-07-02
DE2448850C2 (de) 1986-03-13

Similar Documents

Publication Publication Date Title
RO67457A (ro) Compozitie fotopolimerizabila pentru straturi protectoare
NL184316C (nl) Werkwijze ter vervaardiging van een mechanisch bewerkbaar gietstuk en werkwijze ter vervaardiging van een samenstel van siliciumcarbide.
IT1041222B (it) Procedimento per indurire strati fotograici
DK32176A (da) Fotopolymeriserbare materialer
SE427277C (sv) Fotopolymeriserbar komposition
BE844879A (fr) Pellicules revetues
IT1047687B (it) Procedimento per produrre materiali a strato
DK145620C (da) Fotopolymeriserbar silketryksvaerte til dannelse af et beskyttelseslag paa et underlag
SE402358B (sv) Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering
SE446481B (sv) Anordning for bildande av ett virvelskikt i ett massgods
SE428878B (sv) Ostagad segelmast for en segelbreda
CA1033472A (en) Method for developing resist films
SE424604B (sv) Forfarande for extrahering av metaller
DK159376A (da) Fremgangsmade til paforing af en overfladebelegning
DK140244B (da) Fremgangsmåde til filmovertrækning af en terapeutisk tablet.
JPS5248311A (en) Method of hardening photographic layer film
NL7507546A (nl) Ontwikkelinrichting voor fotografische films.
SE383922B (sv) Anordning for skikttjockleksbestemning alternativt yttopografimetning
SE402653B (sv) Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering
SE7512282L (sv) Anordning for snabb lagtrycksgjutning
FR2301314A1 (fr) Flan pour un fourr
FR2323030A1 (fr) Distributeur a volute pour turbomachine hydraulique
AR223801A1 (es) Metodo para obtener un matizador con peliculizacion reducida
SE397902B (sv) Forfarande for att astadkomma ett skyddsskikt pa ytan pa halvledarkomponenter
BR7608652A (pt) Metodo para a titulacao dos anticorpos anti-estreptolisinicos

Legal Events

Date Code Title Description
NAL Patent in force

Ref document number: 7511440-5

Format of ref document f/p: F

NUG Patent has lapsed

Ref document number: 7511440-5

Format of ref document f/p: F