DK145620C - Fotopolymeriserbar silketryksvaerte til dannelse af et beskyttelseslag paa et underlag - Google Patents

Fotopolymeriserbar silketryksvaerte til dannelse af et beskyttelseslag paa et underlag

Info

Publication number
DK145620C
DK145620C DK227975A DK227975A DK145620C DK 145620 C DK145620 C DK 145620C DK 227975 A DK227975 A DK 227975A DK 227975 A DK227975 A DK 227975A DK 145620 C DK145620 C DK 145620C
Authority
DK
Denmark
Prior art keywords
photopolymerizable
formation
substrate
protective layer
silk print
Prior art date
Application number
DK227975A
Other languages
English (en)
Other versions
DK227975A (da
DK145620B (da
Inventor
Melvin A Lipson
Dale W Knoth
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynachem Corp filed Critical Dynachem Corp
Publication of DK227975A publication Critical patent/DK227975A/da
Publication of DK145620B publication Critical patent/DK145620B/da
Application granted granted Critical
Publication of DK145620C publication Critical patent/DK145620C/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Printing Methods (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DK227975A 1974-05-24 1975-05-23 Fotopolymeriserbar silketryksvaerte til dannelse af et beskyttelseslag paa et underlag DK145620C (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US05/473,236 US3953214A (en) 1974-05-24 1974-05-24 Photopolymerizable screen printing inks and use thereof
US47323674 1974-05-24

Publications (3)

Publication Number Publication Date
DK227975A DK227975A (da) 1975-11-25
DK145620B DK145620B (da) 1982-12-27
DK145620C true DK145620C (da) 1983-06-06

Family

ID=23878720

Family Applications (1)

Application Number Title Priority Date Filing Date
DK227975A DK145620C (da) 1974-05-24 1975-05-23 Fotopolymeriserbar silketryksvaerte til dannelse af et beskyttelseslag paa et underlag

Country Status (24)

Country Link
US (1) US3953214A (da)
JP (2) JPS5760787B2 (da)
AR (1) AR217794A1 (da)
AT (1) AT346372B (da)
BE (1) BE829438A (da)
BG (1) BG26541A3 (da)
BR (1) BR7503275A (da)
CA (1) CA1069371A (da)
CH (1) CH608516A5 (da)
DD (2) DD120661A5 (da)
DE (1) DE2522057C3 (da)
DK (1) DK145620C (da)
ES (1) ES437454A1 (da)
FI (1) FI64014C (da)
FR (1) FR2272572B1 (da)
GB (1) GB1507841A (da)
IL (1) IL47251A (da)
IN (1) IN144896B (da)
IT (1) IT1035806B (da)
NL (1) NL174795C (da)
NO (1) NO148190C (da)
RO (1) RO67458A (da)
SE (1) SE431880C (da)
ZA (1) ZA753003B (da)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2455303A1 (fr) * 1979-04-24 1980-11-21 Rhone Poulenc Syst Procede pour la fabrication d'une carte d'identification inviolable comportant des photographies et carte obtenue selon ce procede
JPS56143277A (en) * 1980-04-09 1981-11-07 Toyobo Co Ltd Uv-curing type ink composition for screen printing
JPS5713444A (en) * 1980-06-27 1982-01-23 Tamura Kaken Kk Photosensitive composition
JPS6050356B2 (ja) * 1980-11-29 1985-11-08 大日本インキ化学工業株式会社 連続パタ−ンメツキ用レジスト塗膜の形成方法
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4422914A (en) * 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4816295A (en) * 1981-07-06 1989-03-28 C.A.M. Graphics Co., Inc. Method for imparting an apparent finish to the surface of an article
US4485006A (en) * 1982-03-04 1984-11-27 Exxon Research And Engineering Co. Start-up method for a hydrorefining process
JPS58179224U (ja) * 1982-05-26 1983-11-30 川崎重工業株式会社 ２輪車用ラジエタ−の支持構造
JPS59128536A (ja) * 1983-01-14 1984-07-24 Nippon Shokubai Kagaku Kogyo Co Ltd 紫外線硬化用組成物
JPS6042469A (ja) * 1983-08-16 1985-03-06 Mitsubishi Rayon Co Ltd 光硬化型防錆用被覆組成物
DE3411126A1 (de) * 1984-03-26 1985-10-03 BIAS Forschungs- und Entwicklungs-Labor für angewandte Strahltechnik GmbH, 2820 Bremen Vorrichtung zur bearbeitung von werkstuecken durch einen energiestrahl hoher leistungsdichte, insbesondere einem laserstrahl eines co(pfeil abwaerts)2(pfeil abwaerts)-lasers
JPS61106613A (ja) * 1984-10-30 1986-05-24 Nippon Kayaku Co Ltd 光重合性組成物
DE4022405A1 (de) * 1990-07-13 1992-01-16 Hoechst Ag Verfahren zur herstellung von tetrafluorethylen-polymerisat in waessriger suspension
JPH0434047U (da) * 1990-07-16 1992-03-19
US5352326A (en) * 1993-05-28 1994-10-04 International Business Machines Corporation Process for manufacturing metalized ceramic substrates
US6558753B1 (en) 2000-11-09 2003-05-06 3M Innovative Properties Company Inks and other compositions incorporating limited quantities of solvent advantageously used in ink jetting applications
CA2425945C (en) * 2000-11-09 2010-01-26 3M Innovative Properties Company Weather resistant, ink jettable, radiation curable, fluid compositions particularly suitable for outdoor applications
US6467897B1 (en) 2001-01-08 2002-10-22 3M Innovative Properties Company Energy curable inks and other compositions incorporating surface modified, nanometer-sized particles
KR100799318B1 (ko) * 2004-01-06 2008-01-30 애버리 데니슨 코포레이션 텍스쳐 표면을 가진 스크린 인쇄된 라미네이트
KR20080026622A (ko) * 2005-07-06 2008-03-25 애버리 데니슨 코포레이션 텍스쳐 표면을 가진 스크린 인쇄된 라미네이트
TW201238414A (en) * 2011-03-04 2012-09-16 Taiwan Nanotechnology Corp Photosensitive environment friendly ink circuit layout method
JP2017214523A (ja) * 2016-06-02 2017-12-07 株式会社リコー 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、２次元又は３次元の像、その形成装置及び形成方法、構造体並びに成形加工品
FR3135652A1 (fr) * 2022-05-17 2023-11-24 Adèle GUYODO Procédé d'oxydation de feuilles de métal à dorer en sérigraphie aqueuse

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE525225A (da) * 1951-08-20
US3255006A (en) * 1963-03-04 1966-06-07 Purex Corp Ltd Photosensitive masking for chemical etching
US3695877A (en) * 1969-08-13 1972-10-03 Teijin Ltd Photopolymerizable resin compositions
BE793732A (fr) * 1972-01-10 1973-05-02 Grace W R & Co Composition contenant un polyene et un polythiol
JPS5513154B2 (da) * 1972-01-20 1980-04-07
JPS5537869A (en) * 1978-09-11 1980-03-17 Tokyo Shibaura Electric Co Method of judging abnormal temperature of electric eouipment

Also Published As

Publication number Publication date
DE2522057A1 (de) 1975-11-27
NO148190B (no) 1983-05-16
DD123993A5 (da) 1977-01-26
BG26541A3 (da) 1979-04-12
SE431880C (sv) 1990-09-10
JPS5760787B2 (da) 1982-12-21
DD120661A5 (da) 1976-06-20
JPS643352B2 (da) 1989-01-20
FI64014B (fi) 1983-05-31
IL47251A (en) 1978-07-31
ATA400675A (de) 1978-03-15
US3953214A (en) 1976-04-27
DK227975A (da) 1975-11-25
RO67458A (ro) 1980-01-15
IL47251A0 (en) 1975-07-28
DE2522057C3 (de) 1980-10-16
AT346372B (de) 1978-11-10
NL7505886A (nl) 1975-11-26
NL174795B (nl) 1984-03-01
DK145620B (da) 1982-12-27
ES437454A1 (es) 1977-04-01
GB1507841A (en) 1978-04-19
CH608516A5 (da) 1979-01-15
AR217794A1 (es) 1980-04-30
CA1069371A (en) 1980-01-08
BE829438A (fr) 1975-09-15
NL174795C (nl) 1984-08-01
FR2272572B1 (da) 1980-10-24
NO751831L (da) 1975-11-25
BR7503275A (pt) 1976-04-27
AU8093975A (en) 1976-11-11
JPS512503A (da) 1976-01-10
FI751487A (da) 1975-11-25
FI64014C (fi) 1983-09-12
FR2272572A1 (da) 1975-12-19
IT1035806B (it) 1979-10-20
JPS57210692A (en) 1982-12-24
SE7505839L (da) 1975-12-09
SE431880B (sv) 1984-03-05
NO148190C (no) 1983-08-24
IN144896B (da) 1978-07-22
ZA753003B (en) 1976-03-31
DE2522057B2 (de) 1980-02-14

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Legal Events

Date Code Title Description
PBP Patent lapsed