IT1087608B - Procedimento per formare uno strato monocristallino su un substrato - Google Patents

Procedimento per formare uno strato monocristallino su un substrato

Info

Publication number
IT1087608B
IT1087608B IT27967/77A IT2796777A IT1087608B IT 1087608 B IT1087608 B IT 1087608B IT 27967/77 A IT27967/77 A IT 27967/77A IT 2796777 A IT2796777 A IT 2796777A IT 1087608 B IT1087608 B IT 1087608B
Authority
IT
Italy
Prior art keywords
procedure
substrate
forming
monocrystalline layer
monocrystalline
Prior art date
Application number
IT27967/77A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1087608B publication Critical patent/IT1087608B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/08—Epitaxial-layer growth by condensing ionised vapours

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
IT27967/77A 1976-09-30 1977-09-27 Procedimento per formare uno strato monocristallino su un substrato IT1087608B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2644208A DE2644208C3 (de) 1976-09-30 1976-09-30 Verfahren zur Herstellung einer einkristallinen Schicht auf einer Unterlage

Publications (1)

Publication Number Publication Date
IT1087608B true IT1087608B (it) 1985-06-04

Family

ID=5989344

Family Applications (1)

Application Number Title Priority Date Filing Date
IT27967/77A IT1087608B (it) 1976-09-30 1977-09-27 Procedimento per formare uno strato monocristallino su un substrato

Country Status (8)

Country Link
US (1) US4140546A (it)
JP (1) JPS5343684A (it)
BE (1) BE859265A (it)
DE (1) DE2644208C3 (it)
FR (1) FR2366057A1 (it)
GB (1) GB1532759A (it)
IT (1) IT1087608B (it)
NL (1) NL7710742A (it)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179312A (en) * 1977-12-08 1979-12-18 International Business Machines Corporation Formation of epitaxial layers doped with conductivity-determining impurities by ion deposition
DE2941908C2 (de) * 1979-10-17 1986-07-03 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen einer eine Silizium-Schicht aufweisenden Solarzelle
DE3003285A1 (de) * 1980-01-30 1981-08-06 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen niederohmiger, einkristalliner metall- oder legierungsschichten auf substraten
US4340461A (en) * 1980-09-10 1982-07-20 International Business Machines Corp. Modified RIE chamber for uniform silicon etching
US4385946A (en) * 1981-06-19 1983-05-31 Bell Telephone Laboratories, Incorporated Rapid alteration of ion implant dopant species to create regions of opposite conductivity
GB2155042B (en) * 1984-02-21 1987-12-31 Hughes Technology Pty Ltd Laser induced ion beam generator
DE3418330C2 (de) * 1984-05-17 1995-05-24 Daimler Benz Ag Verfahren zur Herstellung eines Halbleiterkörpers
GB2174108B (en) * 1985-04-04 1989-07-19 Sharp Kk Method for forming a polycrystalline silicon thin film
CH665428A5 (de) * 1985-07-26 1988-05-13 Balzers Hochvakuum Verfahren zur beschichtung von mikrovertiefungen.
WO1987006389A1 (en) * 1986-04-09 1987-10-22 J.C. Schumacher Company Semiconductor dopant vaporizer
AU747260B2 (en) 1997-07-25 2002-05-09 Nichia Chemical Industries, Ltd. Nitride semiconductor device
FR2774511B1 (fr) * 1998-01-30 2002-10-11 Commissariat Energie Atomique Substrat compliant en particulier pour un depot par hetero-epitaxie
JP3770014B2 (ja) 1999-02-09 2006-04-26 日亜化学工業株式会社 窒化物半導体素子
EP1168539B1 (en) * 1999-03-04 2009-12-16 Nichia Corporation Nitride semiconductor laser device
US20100330787A1 (en) * 2006-08-18 2010-12-30 Piero Sferlazzo Apparatus and method for ultra-shallow implantation in a semiconductor device
TWI362769B (en) * 2008-05-09 2012-04-21 Univ Nat Chiao Tung Light emitting device and fabrication method therefor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3433677A (en) * 1967-04-05 1969-03-18 Cornell Aeronautical Labor Inc Flexible sheet thin-film photovoltaic generator
US3520741A (en) * 1967-12-18 1970-07-14 Hughes Aircraft Co Method of simultaneous epitaxial growth and ion implantation
US3614423A (en) * 1970-09-21 1971-10-19 Stanford Research Inst Charged particle pattern imaging and exposure system
US3808674A (en) * 1972-08-10 1974-05-07 Westinghouse Electric Corp Epitaxial growth of thermically expandable films and particularly anisotropic ferro-electric films
US3912826A (en) * 1972-08-21 1975-10-14 Airco Inc Method of physical vapor deposition
US3908183A (en) * 1973-03-14 1975-09-23 California Linear Circuits Inc Combined ion implantation and kinetic transport deposition process
US3909308A (en) * 1974-08-19 1975-09-30 Rca Corp Production of lead monoxide coated vidicon target
JPS5148097A (en) * 1974-10-23 1976-04-24 Osaka Koon Denki Kk Iongen
US3924136A (en) * 1975-02-18 1975-12-02 Stanford Research Inst Charged particle apodized pattern imaging and exposure system
US3997368A (en) * 1975-06-24 1976-12-14 Bell Telephone Laboratories, Incorporated Elimination of stacking faults in silicon devices: a gettering process
US4066527A (en) * 1975-07-18 1978-01-03 Futaba Denshi Kogyo K. K. Method of producing semiconductor device

Also Published As

Publication number Publication date
DE2644208A1 (de) 1978-04-06
BE859265A (fr) 1978-01-16
FR2366057A1 (fr) 1978-04-28
NL7710742A (nl) 1978-04-03
US4140546A (en) 1979-02-20
GB1532759A (en) 1978-11-22
FR2366057B1 (it) 1980-04-25
DE2644208C3 (de) 1981-04-30
DE2644208B2 (de) 1980-07-31
JPS5343684A (en) 1978-04-19

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