IT1113683B - Apparecchiatura per formare tracciati su substrati fotosensibili - Google Patents

Apparecchiatura per formare tracciati su substrati fotosensibili

Info

Publication number
IT1113683B
IT1113683B IT29567/77A IT2956777A IT1113683B IT 1113683 B IT1113683 B IT 1113683B IT 29567/77 A IT29567/77 A IT 29567/77A IT 2956777 A IT2956777 A IT 2956777A IT 1113683 B IT1113683 B IT 1113683B
Authority
IT
Italy
Prior art keywords
equipment
forming tracks
photosensitive substrates
photosensitive
substrates
Prior art date
Application number
IT29567/77A
Other languages
English (en)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1113683B publication Critical patent/IT1113683B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
IT29567/77A 1976-12-13 1977-11-11 Apparecchiatura per formare tracciati su substrati fotosensibili IT1113683B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/750,292 US4110594A (en) 1976-12-13 1976-12-13 Pattern mask generating method and apparatus

Publications (1)

Publication Number Publication Date
IT1113683B true IT1113683B (it) 1986-01-20

Family

ID=25017260

Family Applications (1)

Application Number Title Priority Date Filing Date
IT29567/77A IT1113683B (it) 1976-12-13 1977-11-11 Apparecchiatura per formare tracciati su substrati fotosensibili

Country Status (6)

Country Link
US (1) US4110594A (it)
JP (1) JPS5942974B2 (it)
DE (1) DE2752942A1 (it)
FR (1) FR2373815A1 (it)
GB (1) GB1539305A (it)
IT (1) IT1113683B (it)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4205216A (en) * 1978-09-26 1980-05-27 Western Electric Company, Inc. Laser welding system and method
US4316074A (en) * 1978-12-20 1982-02-16 Quantronix Corporation Method and apparatus for laser irradiating semiconductor material
US4317021A (en) * 1980-02-22 1982-02-23 The United States Of America As Represented By The United States Department Of Energy Laser cutting apparatus for nuclear core fuel subassembly
US4633058A (en) * 1982-01-21 1986-12-30 Preci-Spark Limited Laser machining apparatus
US4638144A (en) * 1985-04-24 1987-01-20 Automated Industrial Systems Indexing laser marker
JPS61251032A (ja) * 1985-04-30 1986-11-08 Toshiba Mach Co Ltd レ−ザ描画装置
KR920002820B1 (ko) * 1987-05-27 1992-04-04 마쯔시다덴기산교 가부시기가이샤 주사형 투영 노광장치
US6986559B1 (en) 2001-04-20 2006-01-17 Elesys, Inc. Position information apparatus and methods for radial printing
US6910750B2 (en) 2000-06-02 2005-06-28 Elesys, Inc. Low-profile ink head cartridge with integrated movement mechanism and service station
US6786563B1 (en) 2001-04-18 2004-09-07 Elesys, Inc. Interleaving apparatus and methods for radial printing
US7284804B2 (en) * 2001-04-18 2007-10-23 Elesys, Inc. Interleaving apparatus and methods for radial printing
US7497534B2 (en) * 2000-03-21 2009-03-03 Elesys, Inc. Enhancing angular position information for a radial printing system
US6264295B1 (en) 1998-04-17 2001-07-24 Elesys, Inc. Radial printing system and methods
US6854841B1 (en) 1998-04-17 2005-02-15 Elesys, Inc. Point-of-incidence ink-curing mechanisms for radial printing
US6030154A (en) * 1998-06-19 2000-02-29 International Business Machines Corporation Minimum error algorithm/program
US6252241B1 (en) * 1998-12-28 2001-06-26 Creo, Ltd. Rotational scanning image recording system having both a large format and high resolution
DE10004022A1 (de) 2000-01-31 2001-08-02 Focke & Co Verfahren und Vorrichtung zum Anbringen von Codierungen an (Zigaretten-)Packungen
US8189902B1 (en) 2007-12-21 2012-05-29 Doug Carson & Associates Creating an XY image pattern on a rotating substrate
JP5226557B2 (ja) * 2008-04-22 2013-07-03 富士フイルム株式会社 レーザ露光方法、フォトレジスト層の加工方法およびパターン成形品の製造方法
JP5751935B2 (ja) * 2011-06-06 2015-07-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料作製方法
CN108873624A (zh) * 2018-09-29 2018-11-23 深圳市先地图像科技有限公司 一种无掩膜极坐标旋转扫描曝光成像装置及其使用方法
CN114002921A (zh) * 2021-11-09 2022-02-01 深圳市先地图像科技有限公司 一种激光成像设备以及激光成像方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3438050A (en) * 1965-01-06 1969-04-08 Itek Corp Laser data recorder
FR2030468A5 (it) * 1969-01-29 1970-11-13 Thomson Brandt Csf
US3622742A (en) * 1970-05-27 1971-11-23 Bell Telephone Labor Inc Laser machining method and apparatus
US3834613A (en) * 1971-03-01 1974-09-10 Int Equipment Co Centrifuge rotor with sample holding means and means for balancing the same
US4028732A (en) * 1973-03-02 1977-06-07 Lucien Salter Apparatus and method for display of images
US3825323A (en) * 1973-05-17 1974-07-23 Teletype Corp Rotary disc recording and readout system having capacitance controlled lens positioning means
US4032743A (en) * 1975-06-27 1977-06-28 Marvel Engineering Company Laser microperforator

Also Published As

Publication number Publication date
FR2373815B1 (it) 1980-12-19
DE2752942A1 (de) 1978-06-15
JPS5942974B2 (ja) 1984-10-18
JPS5374380A (en) 1978-07-01
GB1539305A (en) 1979-01-31
US4110594A (en) 1978-08-29
FR2373815A1 (fr) 1978-07-07

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