DE2428812A1 - Verfahren zur herstellung von masken aus negativem resistmaterial - Google Patents

Verfahren zur herstellung von masken aus negativem resistmaterial

Info

Publication number
DE2428812A1
DE2428812A1 DE19742428812 DE2428812A DE2428812A1 DE 2428812 A1 DE2428812 A1 DE 2428812A1 DE 19742428812 DE19742428812 DE 19742428812 DE 2428812 A DE2428812 A DE 2428812A DE 2428812 A1 DE2428812 A1 DE 2428812A1
Authority
DE
Germany
Prior art keywords
polymer
polymer film
resist material
solvent
negative resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19742428812
Other languages
German (de)
English (en)
Inventor
Charles Anthony Cortellino
Edward Gipstein
Wayne Martin Moreau
Falls N Y Wappingers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2428812A1 publication Critical patent/DE2428812A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
DE19742428812 1973-06-27 1974-06-14 Verfahren zur herstellung von masken aus negativem resistmaterial Pending DE2428812A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37419873A 1973-06-27 1973-06-27

Publications (1)

Publication Number Publication Date
DE2428812A1 true DE2428812A1 (de) 1975-01-23

Family

ID=23475747

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19742428812 Pending DE2428812A1 (de) 1973-06-27 1974-06-14 Verfahren zur herstellung von masken aus negativem resistmaterial

Country Status (3)

Country Link
JP (1) JPS5023825A (cs)
DE (1) DE2428812A1 (cs)
FR (1) FR2234986A1 (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5285475A (en) * 1976-01-09 1977-07-15 Nippon Telegr & Teleph Corp <Ntt> Formation method of high molecular film patterns by high energy beams
JPS52133258A (en) * 1976-04-30 1977-11-08 Tokyo Electric Co Ltd Recorder

Also Published As

Publication number Publication date
JPS5023825A (cs) 1975-03-14
FR2234986A1 (en) 1975-01-24

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