FR2234986A1 - Negative resist materials from oxygen-contg. vinyl polymers - for making printed circuit masks with high definition - Google Patents
Negative resist materials from oxygen-contg. vinyl polymers - for making printed circuit masks with high definitionInfo
- Publication number
- FR2234986A1 FR2234986A1 FR7415808A FR7415808A FR2234986A1 FR 2234986 A1 FR2234986 A1 FR 2234986A1 FR 7415808 A FR7415808 A FR 7415808A FR 7415808 A FR7415808 A FR 7415808A FR 2234986 A1 FR2234986 A1 FR 2234986A1
- Authority
- FR
- France
- Prior art keywords
- negative resist
- resist materials
- contg
- oxygen
- printed circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000463 material Substances 0.000 title abstract 3
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- 229920002554 vinyl polymer Polymers 0.000 title abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 125000002252 acyl group Chemical group 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 150000002118 epoxides Chemical group 0.000 abstract 1
- 150000002148 esters Chemical group 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 1
- 125000001033 ether group Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 229920001195 polyisoprene Polymers 0.000 abstract 1
- 229920006254 polymer film Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Electrophotography Using Other Than Carlson'S Method (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37419873A | 1973-06-27 | 1973-06-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2234986A1 true FR2234986A1 (en) | 1975-01-24 |
Family
ID=23475747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7415808A Withdrawn FR2234986A1 (en) | 1973-06-27 | 1974-04-29 | Negative resist materials from oxygen-contg. vinyl polymers - for making printed circuit masks with high definition |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5023825A (cs) |
| DE (1) | DE2428812A1 (cs) |
| FR (1) | FR2234986A1 (cs) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5285475A (en) * | 1976-01-09 | 1977-07-15 | Nippon Telegr & Teleph Corp <Ntt> | Formation method of high molecular film patterns by high energy beams |
| JPS52133258A (en) * | 1976-04-30 | 1977-11-08 | Tokyo Electric Co Ltd | Recorder |
-
1974
- 1974-04-29 FR FR7415808A patent/FR2234986A1/fr not_active Withdrawn
- 1974-05-24 JP JP49058036A patent/JPS5023825A/ja active Pending
- 1974-06-14 DE DE19742428812 patent/DE2428812A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5023825A (cs) | 1975-03-14 |
| DE2428812A1 (de) | 1975-01-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |