JPS5023825A - - Google Patents

Info

Publication number
JPS5023825A
JPS5023825A JP49058036A JP5803674A JPS5023825A JP S5023825 A JPS5023825 A JP S5023825A JP 49058036 A JP49058036 A JP 49058036A JP 5803674 A JP5803674 A JP 5803674A JP S5023825 A JPS5023825 A JP S5023825A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49058036A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5023825A publication Critical patent/JPS5023825A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
JP49058036A 1973-06-27 1974-05-24 Pending JPS5023825A (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37419873A 1973-06-27 1973-06-27

Publications (1)

Publication Number Publication Date
JPS5023825A true JPS5023825A (cs) 1975-03-14

Family

ID=23475747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49058036A Pending JPS5023825A (cs) 1973-06-27 1974-05-24

Country Status (3)

Country Link
JP (1) JPS5023825A (cs)
DE (1) DE2428812A1 (cs)
FR (1) FR2234986A1 (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5285475A (en) * 1976-01-09 1977-07-15 Nippon Telegr & Teleph Corp <Ntt> Formation method of high molecular film patterns by high energy beams
JPS52133258A (en) * 1976-04-30 1977-11-08 Tokyo Electric Co Ltd Recorder

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5285475A (en) * 1976-01-09 1977-07-15 Nippon Telegr & Teleph Corp <Ntt> Formation method of high molecular film patterns by high energy beams
JPS52133258A (en) * 1976-04-30 1977-11-08 Tokyo Electric Co Ltd Recorder

Also Published As

Publication number Publication date
DE2428812A1 (de) 1975-01-23
FR2234986A1 (en) 1975-01-24

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