DE2426687A1 - Verfahren und vorrichtung fuer vakuumverdampfungsplattierung - Google Patents

Verfahren und vorrichtung fuer vakuumverdampfungsplattierung

Info

Publication number
DE2426687A1
DE2426687A1 DE19742426687 DE2426687A DE2426687A1 DE 2426687 A1 DE2426687 A1 DE 2426687A1 DE 19742426687 DE19742426687 DE 19742426687 DE 2426687 A DE2426687 A DE 2426687A DE 2426687 A1 DE2426687 A1 DE 2426687A1
Authority
DE
Germany
Prior art keywords
heating
substance
evaporator
evaporated
heating element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19742426687
Other languages
German (de)
English (en)
Inventor
Fukumatsu Sakaue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Publication of DE2426687A1 publication Critical patent/DE2426687A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Photoreceptors In Electrophotography (AREA)
DE19742426687 1973-06-04 1974-06-01 Verfahren und vorrichtung fuer vakuumverdampfungsplattierung Pending DE2426687A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48061799A JPS5234039B2 (enExample) 1973-06-04 1973-06-04

Publications (1)

Publication Number Publication Date
DE2426687A1 true DE2426687A1 (de) 1974-12-19

Family

ID=13181497

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19742426687 Pending DE2426687A1 (de) 1973-06-04 1974-06-01 Verfahren und vorrichtung fuer vakuumverdampfungsplattierung

Country Status (5)

Country Link
US (1) US3927638A (enExample)
JP (1) JPS5234039B2 (enExample)
DE (1) DE2426687A1 (enExample)
FR (1) FR2232077B1 (enExample)
NL (1) NL7407523A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0499124A3 (en) * 1991-02-14 1995-01-04 4P Verpackungen Ronsberg Gmbh Line evaporator

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943873A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発材料収容器
JPS6286155A (ja) * 1985-10-11 1987-04-20 Mitsubishi Electric Corp 溶融物質の蒸気噴出装置
US5182567A (en) * 1990-10-12 1993-01-26 Custom Metallizing Services, Inc. Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means
JP3508484B2 (ja) * 1997-07-14 2004-03-22 松下電器産業株式会社 機能性薄膜の形成方法及び形成装置
JP4593008B2 (ja) * 2001-05-23 2010-12-08 キヤノンアネルバ株式会社 蒸着源並びにそれを用いた薄膜形成方法及び形成装置
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
US7431807B2 (en) * 2005-01-07 2008-10-07 Universal Display Corporation Evaporation method using infrared guiding heater
EP1978563A3 (en) * 2007-03-23 2012-10-24 FUJIFILM Corporation Radiation detector and method for producing photoconductive layer for recording thereof
WO2012029260A1 (ja) * 2010-09-01 2012-03-08 シャープ株式会社 蒸着セル及びこれを備えた真空蒸着装置
JP2024531516A (ja) * 2021-09-01 2024-08-29 インテグリス・インコーポレーテッド 気化器アセンブリ

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3057282A (en) * 1959-04-06 1962-10-09 Eastman Kodak Co Fluid treating device for sheet or strip materials
GB1172230A (en) * 1965-12-16 1969-11-26 Matsushita Electronics Corp A Method of Manufacturing Semiconductor Device
US3634647A (en) * 1967-07-14 1972-01-11 Ernest Brock Dale Jr Evaporation of multicomponent alloys
US3515852A (en) * 1967-08-10 1970-06-02 Sylvania Electric Prod Metal-evaporating source
US3655429A (en) * 1969-04-16 1972-04-11 Westinghouse Electric Corp Method of forming thin insulating films particularly for piezoelectric transducers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0499124A3 (en) * 1991-02-14 1995-01-04 4P Verpackungen Ronsberg Gmbh Line evaporator

Also Published As

Publication number Publication date
JPS5234039B2 (enExample) 1977-09-01
FR2232077A1 (enExample) 1974-12-27
JPS5010288A (enExample) 1975-02-01
NL7407523A (enExample) 1974-12-06
FR2232077B1 (enExample) 1977-03-11
US3927638A (en) 1975-12-23

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