DE2361931A1 - Lichtempfindliche ueberzugsmassen und deren verwendung - Google Patents

Lichtempfindliche ueberzugsmassen und deren verwendung

Info

Publication number
DE2361931A1
DE2361931A1 DE2361931A DE2361931A DE2361931A1 DE 2361931 A1 DE2361931 A1 DE 2361931A1 DE 2361931 A DE2361931 A DE 2361931A DE 2361931 A DE2361931 A DE 2361931A DE 2361931 A1 DE2361931 A1 DE 2361931A1
Authority
DE
Germany
Prior art keywords
compound
composition according
coating composition
acid
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE2361931A
Other languages
German (de)
English (en)
Inventor
Eugene Golda
William Rowe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of DE2361931A1 publication Critical patent/DE2361931A1/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Polyurethanes Or Polyureas (AREA)
DE2361931A 1972-12-14 1973-12-13 Lichtempfindliche ueberzugsmassen und deren verwendung Ceased DE2361931A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31520772A 1972-12-14 1972-12-14

Publications (1)

Publication Number Publication Date
DE2361931A1 true DE2361931A1 (de) 1974-06-20

Family

ID=23223361

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2361931A Ceased DE2361931A1 (de) 1972-12-14 1973-12-13 Lichtempfindliche ueberzugsmassen und deren verwendung

Country Status (9)

Country Link
JP (1) JPS543727B2 (https=)
BR (1) BR7309820D0 (https=)
CH (1) CH587500A5 (https=)
DE (1) DE2361931A1 (https=)
FR (1) FR2327569A1 (https=)
GB (1) GB1463818A (https=)
IT (1) IT1000315B (https=)
NL (1) NL7317180A (https=)
SE (1) SE404094B (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4186017A (en) * 1976-09-08 1980-01-29 Hoechst Aktiengesellschaft Light-sensitive copying composition
EP0351628A3 (de) * 1988-07-16 1991-04-03 Hoechst Aktiengesellschaft Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
WO1993006528A1 (en) * 1991-09-13 1993-04-01 Sun Chemical Corporation Positive-working coating compositions

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8001085A (nl) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg Fotogevoelige materialen en voorwerpen.
DE2948554A1 (de) * 1979-12-03 1981-06-04 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
JPS5938747A (ja) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk 感光性平版印刷版
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
ATE422066T1 (de) * 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1321372A (en) * 1970-01-19 1973-06-27 Dainippon Ink & Chemicals Photopolymerisable polyurethane compositions

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4186017A (en) * 1976-09-08 1980-01-29 Hoechst Aktiengesellschaft Light-sensitive copying composition
EP0351628A3 (de) * 1988-07-16 1991-04-03 Hoechst Aktiengesellschaft Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
WO1993006528A1 (en) * 1991-09-13 1993-04-01 Sun Chemical Corporation Positive-working coating compositions

Also Published As

Publication number Publication date
CH587500A5 (https=) 1977-05-13
IT1000315B (it) 1976-03-30
NL7317180A (https=) 1974-06-18
SE404094B (sv) 1978-09-18
IT7354275A1 (it) 1975-06-12
AU6328473A (en) 1975-06-12
BR7309820D0 (pt) 1974-09-24
JPS543727B2 (https=) 1979-02-26
JPS5018585A (https=) 1975-02-27
FR2327569B1 (https=) 1978-03-24
GB1463818A (en) 1977-02-09
FR2327569A1 (fr) 1977-05-06

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Legal Events

Date Code Title Description
OD Request for examination
8125 Change of the main classification

Ipc: G03F 7/08

8131 Rejection