GB1463818A - Diazo-unsaturated monomer light sensitive compositions - Google Patents

Diazo-unsaturated monomer light sensitive compositions

Info

Publication number
GB1463818A
GB1463818A GB5770673A GB5770673A GB1463818A GB 1463818 A GB1463818 A GB 1463818A GB 5770673 A GB5770673 A GB 5770673A GB 5770673 A GB5770673 A GB 5770673A GB 1463818 A GB1463818 A GB 1463818A
Authority
GB
United Kingdom
Prior art keywords
compound
active hydrogen
diazo
compounds
iii
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5770673A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of GB1463818A publication Critical patent/GB1463818A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Polyurethanes Or Polyureas (AREA)
GB5770673A 1972-12-14 1973-12-13 Diazo-unsaturated monomer light sensitive compositions Expired GB1463818A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31520772A 1972-12-14 1972-12-14

Publications (1)

Publication Number Publication Date
GB1463818A true GB1463818A (en) 1977-02-09

Family

ID=23223361

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5770673A Expired GB1463818A (en) 1972-12-14 1973-12-13 Diazo-unsaturated monomer light sensitive compositions

Country Status (9)

Country Link
JP (1) JPS543727B2 (https=)
BR (1) BR7309820D0 (https=)
CH (1) CH587500A5 (https=)
DE (1) DE2361931A1 (https=)
FR (1) FR2327569A1 (https=)
GB (1) GB1463818A (https=)
IT (1) IT1000315B (https=)
NL (1) NL7317180A (https=)
SE (1) SE404094B (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
US4337307A (en) * 1979-12-03 1982-06-29 Hoechst Aktiengesellschaft Light-sensitive diazo composition and material with branched polyurethane resin
GB2263906A (en) * 1992-01-21 1993-08-11 Du Pont Polyunsaturated diazonium compounds
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
EP1788431A3 (en) * 2005-11-18 2007-07-18 Agfa Graphics N.V. Method of making a lithographic printing plate

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU75749A1 (https=) * 1976-09-08 1978-04-27
NL8001085A (nl) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg Fotogevoelige materialen en voorwerpen.
JPS5938747A (ja) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk 感光性平版印刷版
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor
DE3824146A1 (de) * 1988-07-16 1990-02-22 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten
WO1993006528A1 (en) * 1991-09-13 1993-04-01 Sun Chemical Corporation Positive-working coating compositions

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1321372A (en) * 1970-01-19 1973-06-27 Dainippon Ink & Chemicals Photopolymerisable polyurethane compositions

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4337307A (en) * 1979-12-03 1982-06-29 Hoechst Aktiengesellschaft Light-sensitive diazo composition and material with branched polyurethane resin
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
GB2263906A (en) * 1992-01-21 1993-08-11 Du Pont Polyunsaturated diazonium compounds
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
EP1788431A3 (en) * 2005-11-18 2007-07-18 Agfa Graphics N.V. Method of making a lithographic printing plate
WO2007057337A3 (en) * 2005-11-18 2007-08-23 Agfa Graphics Nv Method of making a lithographic printing plate
US8088558B2 (en) 2005-11-18 2012-01-03 Agfa Graphics Nv Method of making a lithographic printing plate

Also Published As

Publication number Publication date
CH587500A5 (https=) 1977-05-13
IT1000315B (it) 1976-03-30
NL7317180A (https=) 1974-06-18
SE404094B (sv) 1978-09-18
DE2361931A1 (de) 1974-06-20
IT7354275A1 (it) 1975-06-12
AU6328473A (en) 1975-06-12
BR7309820D0 (pt) 1974-09-24
JPS543727B2 (https=) 1979-02-26
JPS5018585A (https=) 1975-02-27
FR2327569B1 (https=) 1978-03-24
FR2327569A1 (fr) 1977-05-06

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee