DE2247368A1 - Verfahren zum ausbessern defekter filmmuster - Google Patents
Verfahren zum ausbessern defekter filmmusterInfo
- Publication number
- DE2247368A1 DE2247368A1 DE19722247368 DE2247368A DE2247368A1 DE 2247368 A1 DE2247368 A1 DE 2247368A1 DE 19722247368 DE19722247368 DE 19722247368 DE 2247368 A DE2247368 A DE 2247368A DE 2247368 A1 DE2247368 A1 DE 2247368A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- defect
- photoresist
- photomask
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 25
- 230000002950 deficient Effects 0.000 title claims description 6
- 239000000463 material Substances 0.000 claims description 29
- 230000007547 defect Effects 0.000 claims description 25
- 229920002120 photoresistant polymer Polymers 0.000 claims description 21
- 239000010408 film Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 4
- 238000001228 spectrum Methods 0.000 claims description 3
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 239000004020 conductor Substances 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 241001233037 catfish Species 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18773971A | 1971-10-08 | 1971-10-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2247368A1 true DE2247368A1 (de) | 1973-04-12 |
Family
ID=22690259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722247368 Pending DE2247368A1 (de) | 1971-10-08 | 1972-09-27 | Verfahren zum ausbessern defekter filmmuster |
Country Status (4)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0036310A3 (en) * | 1980-03-14 | 1981-12-30 | Fujitsu Limited | Method and apparatus for amending a photomask |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5632777B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1974-05-10 | 1981-07-30 | ||
| JPS599942A (ja) * | 1982-07-08 | 1984-01-19 | Mitsubishi Electric Corp | 配線パタ−ン形成法 |
-
1972
- 1972-09-22 IT IT2957572A patent/IT967781B/it active
- 1972-09-27 DE DE19722247368 patent/DE2247368A1/de active Pending
- 1972-09-29 GB GB4496972A patent/GB1345093A/en not_active Expired
- 1972-10-07 JP JP10104072A patent/JPS4847284A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0036310A3 (en) * | 1980-03-14 | 1981-12-30 | Fujitsu Limited | Method and apparatus for amending a photomask |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1345093A (en) | 1974-01-30 |
| JPS4847284A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-07-05 |
| IT967781B (it) | 1974-03-11 |
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