DE2223367C3 - Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen - Google Patents
Mikrostrahlsonde zur quantitativen Erfassung von geladenen SekundärteilchenInfo
- Publication number
- DE2223367C3 DE2223367C3 DE2223367A DE2223367A DE2223367C3 DE 2223367 C3 DE2223367 C3 DE 2223367C3 DE 2223367 A DE2223367 A DE 2223367A DE 2223367 A DE2223367 A DE 2223367A DE 2223367 C3 DE2223367 C3 DE 2223367C3
- Authority
- DE
- Germany
- Prior art keywords
- primary beam
- lens
- electrode
- micro
- primary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000523 sample Substances 0.000 title claims description 46
- 239000011163 secondary particle Substances 0.000 title claims description 19
- 238000001514 detection method Methods 0.000 title claims description 4
- 239000002245 particle Substances 0.000 claims description 5
- 230000002301 combined effect Effects 0.000 claims description 2
- 230000005684 electric field Effects 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 description 7
- 239000011164 primary particle Substances 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2223367A DE2223367C3 (de) | 1972-05-12 | 1972-05-12 | Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen |
GB2236673A GB1426359A (en) | 1972-05-12 | 1973-05-10 | Microbeam probe apparatus |
US00358970A US3845305A (en) | 1972-05-12 | 1973-05-10 | Microbeam probe apparatus |
FR7317092A FR2184713B1 (enrdf_load_html_response) | 1972-05-12 | 1973-05-11 | |
JP5303973A JPS5637503B2 (enrdf_load_html_response) | 1972-05-12 | 1973-05-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2223367A DE2223367C3 (de) | 1972-05-12 | 1972-05-12 | Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen |
Publications (3)
Publication Number | Publication Date |
---|---|
DE2223367A1 DE2223367A1 (de) | 1973-11-29 |
DE2223367B2 DE2223367B2 (de) | 1978-03-30 |
DE2223367C3 true DE2223367C3 (de) | 1978-11-30 |
Family
ID=5844786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2223367A Expired DE2223367C3 (de) | 1972-05-12 | 1972-05-12 | Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen |
Country Status (5)
Country | Link |
---|---|
US (1) | US3845305A (enrdf_load_html_response) |
JP (1) | JPS5637503B2 (enrdf_load_html_response) |
DE (1) | DE2223367C3 (enrdf_load_html_response) |
FR (1) | FR2184713B1 (enrdf_load_html_response) |
GB (1) | GB1426359A (enrdf_load_html_response) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3231036A1 (de) * | 1982-08-20 | 1984-02-23 | Max Planck Gesellschaft | Kombinierte elektrostatische objektiv- und emissionslinse |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4205226A (en) * | 1978-09-01 | 1980-05-27 | The Perkin-Elmer Corporation | Auger electron spectroscopy |
DE2950329C2 (de) * | 1979-12-14 | 1985-06-05 | Leybold-Heraeus GmbH, 5000 Köln | Einrichtung zum Abtragen von Material von der Oberfläche eines Targets |
JPS56114269A (en) | 1980-02-15 | 1981-09-08 | Internatl Precision Inc | Scanning type electronic microscope |
US4491735A (en) * | 1982-04-05 | 1985-01-01 | The Perkin-Elmer Corporation | Restricted ion source of high current density |
DE3236273A1 (de) * | 1982-09-30 | 1984-04-05 | Siemens AG, 1000 Berlin und 8000 München | Spektrometerobjektiv mit parallelen objektiv- und spektrometerfeldern fuer die potentialmesstechnik |
DE3236271A1 (de) * | 1982-09-30 | 1984-04-05 | Siemens AG, 1000 Berlin und 8000 München | Spektrometerobjektiv fuer die korpuskularstrahl-messtechnik |
JPS6089050A (ja) * | 1983-10-20 | 1985-05-18 | Toshiba Corp | ストロボ走査電子顕微鏡 |
EP0152501B1 (de) * | 1984-02-18 | 1989-04-12 | Leybold Aktiengesellschaft | Einrichtung zur Messung der Winkelverteilung von an einer Probenoberfläche gestreuten geladenen Teilchen |
EP0178431B1 (de) * | 1984-09-18 | 1990-02-28 | ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH | Gegenfeld-Spektrometer für die Elektronenstrahl-Messtechnik |
FR2575597B1 (fr) * | 1984-12-28 | 1987-03-20 | Onera (Off Nat Aerospatiale) | Appareil pour la micro-analyse ionique a tres haute resolution d'un echantillon solide |
US4556794A (en) * | 1985-01-30 | 1985-12-03 | Hughes Aircraft Company | Secondary ion collection and transport system for ion microprobe |
FR2584234B1 (fr) * | 1985-06-28 | 1988-12-09 | Cameca | Testeur de circuit integre a faisceau d'electrons |
US4855596A (en) * | 1986-06-04 | 1989-08-08 | Arch Development Corp. | Photo ion spectrometer |
US4889987A (en) * | 1986-06-04 | 1989-12-26 | Arch Development Corporation | Photo ion spectrometer |
US4864130A (en) * | 1986-06-04 | 1989-09-05 | Arch Development Corporation | Photo ion spectrometer |
EP0281743B1 (de) * | 1987-02-02 | 1994-03-30 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Detektorobjectiv für Rastermikroskope |
US4818872A (en) * | 1987-05-11 | 1989-04-04 | Microbeam Inc. | Integrated charge neutralization and imaging system |
FR2624610B1 (fr) * | 1987-12-11 | 1990-03-30 | Cameca | Procede d'analyse en temps de vol, a balayage continu, et dispositif d'analyse pour la mise en oeuvre de ce procede |
DE3904032A1 (de) * | 1989-02-10 | 1990-08-16 | Max Planck Gesellschaft | Elektronenmikroskop zur untersuchung von festkoerperoberflaechen |
US4983830A (en) * | 1989-06-29 | 1991-01-08 | Seiko Instruments Inc. | Focused ion beam apparatus having charged particle energy filter |
DE4000579A1 (de) * | 1990-01-10 | 1991-07-11 | Integrated Circuit Testing | Ionenstrahlgeraet sowie verfahren zur durchfuehrung von potentialmessungen mittels eines ionenstrahles |
US5149974A (en) * | 1990-10-29 | 1992-09-22 | International Business Machines Corporation | Gas delivery for ion beam deposition and etching |
JP3730263B2 (ja) * | 1992-05-27 | 2005-12-21 | ケーエルエー・インストルメンツ・コーポレーション | 荷電粒子ビームを用いた自動基板検査の装置及び方法 |
DE69334274D1 (de) * | 1992-05-29 | 2009-05-14 | Univ Rockefeller | Verfahren zur Bestimmung der Folge von Peptiden unter Verwendung eines Massenspektrometers |
JPH08227689A (ja) * | 1995-02-22 | 1996-09-03 | Nec Corp | 二次イオン質量分析装置 |
FR2806527B1 (fr) * | 2000-03-20 | 2002-10-25 | Schlumberger Technologies Inc | Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique |
EP1388883B1 (en) * | 2002-08-07 | 2013-06-05 | Fei Company | Coaxial FIB-SEM column |
JP4519567B2 (ja) * | 2004-08-11 | 2010-08-04 | 株式会社日立ハイテクノロジーズ | 走査型電子顕微鏡およびこれを用いた試料観察方法 |
US7589322B2 (en) * | 2005-06-29 | 2009-09-15 | Horiba, Ltd. | Sample measuring device |
US7259373B2 (en) | 2005-07-08 | 2007-08-21 | Nexgensemi Holdings Corporation | Apparatus and method for controlled particle beam manufacturing |
GB2428868B (en) * | 2005-10-28 | 2008-11-19 | Thermo Electron Corp | Spectrometer for surface analysis and method therefor |
WO2008140585A1 (en) | 2006-11-22 | 2008-11-20 | Nexgen Semi Holding, Inc. | Apparatus and method for conformal mask manufacturing |
US10991545B2 (en) | 2008-06-30 | 2021-04-27 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
US10566169B1 (en) | 2008-06-30 | 2020-02-18 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
FR2960698B1 (fr) | 2010-05-27 | 2013-05-10 | Centre Nat Rech Scient | Systeme de detection de cathodoluminescence reglable et microscope mettant en oeuvre un tel systeme. |
EP3966844A2 (en) | 2019-05-09 | 2022-03-16 | Attolight AG | Cathodoluminescence electron microscope |
US11227743B2 (en) | 2019-08-20 | 2022-01-18 | Attolight AG | Accurate wavelength calibration in cathodoluminescence SEM |
TWI808554B (zh) | 2020-12-04 | 2023-07-11 | 亞光股份有限公司 | 使用陰極發光測量判別半導體材料中的位錯類型和密度的裝置與方法 |
US11782001B2 (en) | 2020-12-04 | 2023-10-10 | Attolight AG | Dislocation type and density discrimination in semiconductor materials using cathodoluminescence measurements |
US12014896B2 (en) | 2021-01-19 | 2024-06-18 | Attolight AG | Cost effective probing in high volume manufacture of micro LEDs |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL53866C (enrdf_load_html_response) * | 1937-09-11 | |||
US2356535A (en) * | 1940-08-31 | 1944-08-22 | Ruska Ernst | Electronic lens |
US2330930A (en) * | 1941-04-30 | 1943-10-05 | Rca Corp | Scanning type of electron microscope |
DE1133841B (de) * | 1957-09-11 | 1962-07-26 | Leitz Ernst Gmbh | Elektronenmikroskop zur direkten Abbildung von Oberflaechen durch Sekundaerelektronen, Verfahren zur Untersuchung von Nichtleitern oder Halbleitern und Anordnung zur Durchfuehrung des Verfahrens |
US3253144A (en) * | 1963-05-27 | 1966-05-24 | Tektronix Inc | Electron lens having means for correcting astigmatism |
NL154050B (nl) * | 1966-08-13 | 1977-07-15 | Philips Nv | Elektronenmicroscoop. |
US3452241A (en) * | 1966-09-06 | 1969-06-24 | Rca Corp | Electron gun suitable for electron microscope |
US3374349A (en) * | 1966-11-14 | 1968-03-19 | Victor G. Macres | Electron probe having a specific shortfocal length magnetic lens and light microscope |
DE1614126B1 (de) * | 1967-02-27 | 1970-11-19 | Max Planck Gesellschaft | Korpuskularstrahlmikroskop,insbesondere Elektronenmikroskop,mit einer durch das Vorfeld einer Objektivlinse gebildeten Kondensorlinse und einer Bereichsblende |
-
1972
- 1972-05-12 DE DE2223367A patent/DE2223367C3/de not_active Expired
-
1973
- 1973-05-10 US US00358970A patent/US3845305A/en not_active Expired - Lifetime
- 1973-05-10 GB GB2236673A patent/GB1426359A/en not_active Expired
- 1973-05-11 FR FR7317092A patent/FR2184713B1/fr not_active Expired
- 1973-05-11 JP JP5303973A patent/JPS5637503B2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3231036A1 (de) * | 1982-08-20 | 1984-02-23 | Max Planck Gesellschaft | Kombinierte elektrostatische objektiv- und emissionslinse |
Also Published As
Publication number | Publication date |
---|---|
JPS4962184A (enrdf_load_html_response) | 1974-06-17 |
DE2223367A1 (de) | 1973-11-29 |
DE2223367B2 (de) | 1978-03-30 |
JPS5637503B2 (enrdf_load_html_response) | 1981-09-01 |
US3845305A (en) | 1974-10-29 |
FR2184713A1 (enrdf_load_html_response) | 1973-12-28 |
FR2184713B1 (enrdf_load_html_response) | 1974-05-17 |
GB1426359A (en) | 1976-02-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C3 | Grant after two publication steps (3rd publication) | ||
8339 | Ceased/non-payment of the annual fee |