DE2153231A1 - Vorrichtung zum Überwachen des Niederschlags auf einem Schwingkristall - Google Patents

Vorrichtung zum Überwachen des Niederschlags auf einem Schwingkristall

Info

Publication number
DE2153231A1
DE2153231A1 DE19712153231 DE2153231A DE2153231A1 DE 2153231 A1 DE2153231 A1 DE 2153231A1 DE 19712153231 DE19712153231 DE 19712153231 DE 2153231 A DE2153231 A DE 2153231A DE 2153231 A1 DE2153231 A1 DE 2153231A1
Authority
DE
Germany
Prior art keywords
counter
monitor
frequency
oscillator
presettable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712153231
Other languages
German (de)
English (en)
Inventor
Vincent Tarrytown; HaIperin Arnold Peekskill; Koblenz Morris Avrom Mahopac; N.Y. Di Milia (V.St.A.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2153231A1 publication Critical patent/DE2153231A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D5/00—Control of dimensions of material
    • G05D5/02—Control of dimensions of material of thickness, e.g. of rolled material
    • G05D5/03—Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
    • G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
DE19712153231 1970-12-09 1971-10-26 Vorrichtung zum Überwachen des Niederschlags auf einem Schwingkristall Pending DE2153231A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9637770A 1970-12-09 1970-12-09

Publications (1)

Publication Number Publication Date
DE2153231A1 true DE2153231A1 (de) 1972-06-22

Family

ID=22257080

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712153231 Pending DE2153231A1 (de) 1970-12-09 1971-10-26 Vorrichtung zum Überwachen des Niederschlags auf einem Schwingkristall

Country Status (4)

Country Link
US (1) US3689747A (enExample)
DE (1) DE2153231A1 (enExample)
FR (1) FR2117066A5 (enExample)
GB (1) GB1314305A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4035240A1 (de) * 1990-03-30 1991-10-02 Leybold Inficon Inc Messen und steuern des beschichtens auf einem piezoelektrischen messkristall
CN104048590A (zh) * 2013-03-15 2014-09-17 英飞康公司 使用组织的3-d存储结构的高容量监视器晶体交换器

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3830090A (en) * 1972-07-27 1974-08-20 Gull Airborne Instruments Inc Electrical measuring apparatus employing analog condition responsive means to operate remote digital indicators
DE2257578A1 (de) * 1972-11-24 1974-06-06 Wandel & Goltermann Frequenzzaehler
HU170602B (enExample) * 1975-05-05 1977-07-28
CA1087712A (en) * 1976-11-01 1980-10-14 Northern Telecom Limited Control for wire coating line
US4207836A (en) * 1977-07-01 1980-06-17 Hitachi, Ltd. Vacuum vapor-deposition apparatus
US4215308A (en) * 1978-10-30 1980-07-29 Hewlett-Packard Company Self calibrating crystal controlled frequency counter method and apparatus
EP0038637A1 (en) * 1980-04-18 1981-10-28 Secretary of State for Social Services in Her Britannic Majesty's Gov. of the U.K. of Great Britain and Northern Ireland Improvements in or relating to a method and apparatus for detecting the presence of contaminants in a gaseous carrier
DE3315666A1 (de) * 1983-04-29 1984-10-31 Siemens AG, 1000 Berlin und 8000 München Verfahren zur messung des auftrages und abtrages von duennen schichten
WO1986007156A1 (en) * 1985-05-28 1986-12-04 Emkay Manufacturing Company High speed digital frequency counter
DE3700366A1 (de) * 1987-01-08 1988-07-21 Leybold Ag Einrichtung zum ermitteln der jeweiligen dicke von sich veraendernden material-schichten auf einem substrat waehrend des beschichtungsvorgangs
EP0284678B1 (en) * 1987-03-31 1992-06-03 Benjamin Gavish A device and method for monitoring small displacements of a peak in a frequency spectrum
US5117192A (en) * 1990-01-12 1992-05-26 Leybold Inficon Inc. Control circuitry for quartz crystal deposition monitor
JP2633106B2 (ja) * 1991-05-24 1997-07-23 シャープ株式会社 レジスト塗布装置
US6558735B2 (en) * 2001-04-20 2003-05-06 Eastman Kodak Company Reusable mass-sensor in manufacture of organic light-emitting devices
JP2012114157A (ja) * 2010-11-22 2012-06-14 Toshiba Corp ドロップレシピ作成方法およびデータベース作成方法
US11215586B2 (en) * 2017-01-30 2022-01-04 Aromatix, Inc. Ultrasound gas sensor system using machine learning
CN106967959A (zh) * 2017-05-15 2017-07-21 成都西沃克真空科技有限公司 一种晶振探头用控制系统

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH387752A (de) * 1960-07-21 1965-02-15 Ibm Verfahren und Einrichtung zur Regelung einer durch elektrische Schwingungen veränderliche Frequenz dargestellten Grösse eines Vorganges

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4035240A1 (de) * 1990-03-30 1991-10-02 Leybold Inficon Inc Messen und steuern des beschichtens auf einem piezoelektrischen messkristall
DE4035240C2 (de) * 1990-03-30 1998-10-15 Leybold Inficon Inc Messen und Steuern des Beschichtens auf einem piezoelektrischen Meßkristall
CN104048590A (zh) * 2013-03-15 2014-09-17 英飞康公司 使用组织的3-d存储结构的高容量监视器晶体交换器
CN104048590B (zh) * 2013-03-15 2017-09-19 英飞康公司 使用组织的3‑d存储结构的高容量监视器晶体交换器

Also Published As

Publication number Publication date
US3689747A (en) 1972-09-05
FR2117066A5 (enExample) 1972-07-21
GB1314305A (en) 1973-04-18

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