DE2143522A1 - Verfahren zum Atzen von Chromfilm masken und Mittel zur Durchfuhrung des Verfahrens - Google Patents

Verfahren zum Atzen von Chromfilm masken und Mittel zur Durchfuhrung des Verfahrens

Info

Publication number
DE2143522A1
DE2143522A1 DE19712143522 DE2143522A DE2143522A1 DE 2143522 A1 DE2143522 A1 DE 2143522A1 DE 19712143522 DE19712143522 DE 19712143522 DE 2143522 A DE2143522 A DE 2143522A DE 2143522 A1 DE2143522 A1 DE 2143522A1
Authority
DE
Germany
Prior art keywords
cerium
etching
etchant
salt
chrome
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712143522
Other languages
German (de)
English (en)
Inventor
Eugene Roman Binghamton NY Skarvinko (V St A )
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2143522A1 publication Critical patent/DE2143522A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/26—Acidic compositions for etching refractory metals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
DE19712143522 1970-09-02 1971-08-31 Verfahren zum Atzen von Chromfilm masken und Mittel zur Durchfuhrung des Verfahrens Pending DE2143522A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6914270A 1970-09-02 1970-09-02

Publications (1)

Publication Number Publication Date
DE2143522A1 true DE2143522A1 (de) 1972-03-09

Family

ID=22087015

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712143522 Pending DE2143522A1 (de) 1970-09-02 1971-08-31 Verfahren zum Atzen von Chromfilm masken und Mittel zur Durchfuhrung des Verfahrens

Country Status (3)

Country Link
DE (1) DE2143522A1 (https=)
FR (1) FR2101771A5 (https=)
GB (1) GB1291038A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0182306B1 (en) * 1984-11-17 1991-07-24 Daikin Industries, Limited Etchant composition
DE3920081A1 (de) * 1989-06-20 1991-01-03 Foerster Inst Dr Friedrich Suchspulenanordnung

Also Published As

Publication number Publication date
FR2101771A5 (https=) 1972-03-31
GB1291038A (en) 1972-09-27

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