DE2132063A1 - Photosensitive Zusammensetzungen und Materialien - Google Patents
Photosensitive Zusammensetzungen und MaterialienInfo
- Publication number
- DE2132063A1 DE2132063A1 DE19712132063 DE2132063A DE2132063A1 DE 2132063 A1 DE2132063 A1 DE 2132063A1 DE 19712132063 DE19712132063 DE 19712132063 DE 2132063 A DE2132063 A DE 2132063A DE 2132063 A1 DE2132063 A1 DE 2132063A1
- Authority
- DE
- Germany
- Prior art keywords
- colloid
- composition according
- dithiacycloalkane
- photosensitive
- organic solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
- C07D339/02—Five-membered rings
- C07D339/04—Five-membered rings having the hetero atoms in positions 1 and 2, e.g. lipoic acid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/109—Polyester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Colloid Chemistry (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5213170A | 1970-07-02 | 1970-07-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2132063A1 true DE2132063A1 (de) | 1972-01-05 |
Family
ID=21975669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712132063 Pending DE2132063A1 (de) | 1970-07-02 | 1971-06-28 | Photosensitive Zusammensetzungen und Materialien |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3801327A (https=) |
| JP (1) | JPS532044B1 (https=) |
| DE (1) | DE2132063A1 (https=) |
| FR (1) | FR2097958A5 (https=) |
| GB (1) | GB1344915A (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61217036A (ja) * | 1985-03-22 | 1986-09-26 | Kuraray Co Ltd | 水溶性感光性組成物 |
| WO1998050437A1 (en) * | 1997-05-05 | 1998-11-12 | First Chemical Corporation | Biradical photoinitiators |
| US6783914B1 (en) | 2000-02-25 | 2004-08-31 | Massachusetts Institute Of Technology | Encapsulated inorganic resists |
| JP6879765B2 (ja) * | 2017-02-10 | 2021-06-02 | 株式会社ダイセル | レジスト親水化処理剤 |
| CN119874666B (zh) * | 2025-01-25 | 2025-11-25 | 常州大学 | 一类含可降解二硫键的过氧化酯引发剂及其制备可降解支化聚合物的应用 |
-
1970
- 1970-07-02 US US00052131A patent/US3801327A/en not_active Expired - Lifetime
-
1971
- 1971-05-28 GB GB1780371A patent/GB1344915A/en not_active Expired
- 1971-06-15 FR FR7122134A patent/FR2097958A5/fr not_active Expired
- 1971-06-28 DE DE19712132063 patent/DE2132063A1/de active Pending
- 1971-06-29 JP JP4690071A patent/JPS532044B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS532044B1 (https=) | 1978-01-25 |
| FR2097958A5 (https=) | 1972-03-03 |
| GB1344915A (en) | 1974-01-23 |
| US3801327A (en) | 1974-04-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |