DE2015457B2 - Verfahren zur herstellung einer mehrschichtigen elektrisch leitenden duennschichtstruktur durch vakuumaufdampfen - Google Patents

Verfahren zur herstellung einer mehrschichtigen elektrisch leitenden duennschichtstruktur durch vakuumaufdampfen

Info

Publication number
DE2015457B2
DE2015457B2 DE19702015457 DE2015457A DE2015457B2 DE 2015457 B2 DE2015457 B2 DE 2015457B2 DE 19702015457 DE19702015457 DE 19702015457 DE 2015457 A DE2015457 A DE 2015457A DE 2015457 B2 DE2015457 B2 DE 2015457B2
Authority
DE
Germany
Prior art keywords
thin
film
gas
layers
electrically conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19702015457
Other languages
German (de)
English (en)
Other versions
DE2015457A1 (de
Inventor
Henry Charles New York N Y Turner Paul Anthony Murray Hill N J Theuerer, (V St A )
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Inc
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of DE2015457A1 publication Critical patent/DE2015457A1/de
Publication of DE2015457B2 publication Critical patent/DE2015457B2/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE19702015457 1969-04-04 1970-04-01 Verfahren zur herstellung einer mehrschichtigen elektrisch leitenden duennschichtstruktur durch vakuumaufdampfen Pending DE2015457B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81342169A 1969-04-04 1969-04-04

Publications (2)

Publication Number Publication Date
DE2015457A1 DE2015457A1 (de) 1970-10-08
DE2015457B2 true DE2015457B2 (de) 1972-02-10

Family

ID=25212323

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702015457 Pending DE2015457B2 (de) 1969-04-04 1970-04-01 Verfahren zur herstellung einer mehrschichtigen elektrisch leitenden duennschichtstruktur durch vakuumaufdampfen

Country Status (7)

Country Link
US (1) US3751293A (enExample)
BE (1) BE748215A (enExample)
DE (1) DE2015457B2 (enExample)
FR (1) FR2042936A5 (enExample)
GB (1) GB1306113A (enExample)
NL (1) NL145285B (enExample)
SE (1) SE364317B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407871A (en) * 1980-03-25 1983-10-04 Ex-Cell-O Corporation Vacuum metallized dielectric substrates and method of making same
US4431711A (en) * 1980-03-25 1984-02-14 Ex-Cell-O Corporation Vacuum metallizing a dielectric substrate with indium and products thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL235742A (enExample) * 1958-02-03 1900-01-01
US3063858A (en) * 1959-07-22 1962-11-13 Nat Res Corp Vapor source and processes for vaporizing iron, nickel and copper
US3402073A (en) * 1964-08-04 1968-09-17 Texas Instruments Inc Process for making thin film circuit devices

Also Published As

Publication number Publication date
SE364317B (enExample) 1974-02-18
DE2015457A1 (de) 1970-10-08
US3751293A (en) 1973-08-07
NL7004622A (enExample) 1970-10-06
NL145285B (nl) 1975-03-17
BE748215A (fr) 1970-08-31
GB1306113A (enExample) 1973-02-07
FR2042936A5 (enExample) 1971-02-12

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Legal Events

Date Code Title Description
E77 Valid patent as to the heymanns-index 1977