DE19782060T1 - Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich - Google Patents

Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich

Info

Publication number
DE19782060T1
DE19782060T1 DE19782060T DE19782060T DE19782060T1 DE 19782060 T1 DE19782060 T1 DE 19782060T1 DE 19782060 T DE19782060 T DE 19782060T DE 19782060 T DE19782060 T DE 19782060T DE 19782060 T1 DE19782060 T1 DE 19782060T1
Authority
DE
Germany
Prior art keywords
interferometer
imaging system
numerical aperture
aperture range
catadioptric imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19782060T
Other languages
English (en)
Other versions
DE19782060B4 (de
Inventor
Steven J Vankerkhove
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tropel Corp
Original Assignee
Tropel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tropel Corp filed Critical Tropel Corp
Publication of DE19782060T1 publication Critical patent/DE19782060T1/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/255Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring radius of curvature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE19782060T 1996-10-16 1997-10-15 Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich Pending DE19782060T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/734,402 US5757493A (en) 1996-10-16 1996-10-16 Interferometer with catadioptric imaging system having expanded range of numerical aperture
PCT/US1997/018471 WO1998016799A1 (en) 1996-10-16 1997-10-15 Interferometer with catadioptric imaging system having expanded range of numerical aperture

Publications (1)

Publication Number Publication Date
DE19782060T1 true DE19782060T1 (de) 1999-10-28

Family

ID=24951555

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19782060A Expired - Fee Related DE19782060B4 (de) 1996-10-16 1997-10-15 Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich
DE19782060T Pending DE19782060T1 (de) 1996-10-16 1997-10-15 Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19782060A Expired - Fee Related DE19782060B4 (de) 1996-10-16 1997-10-15 Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich

Country Status (4)

Country Link
US (1) US5757493A (de)
JP (1) JP3242412B2 (de)
DE (2) DE19782060B4 (de)
WO (1) WO1998016799A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017222734A1 (de) 2017-12-14 2019-06-19 Carl Zeiss Industrielle Messtechnik Gmbh Objektiv für eine Wellenfrontmessende Vorrichtung zur optischen Messung mindestens einer gekrümmten Messoberfläche

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DE10039239A1 (de) * 2000-08-11 2002-03-07 Bosch Gmbh Robert Optische Messvorrichtung
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WO2005008214A2 (en) * 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for ellipsometric measurements with high spatial resolution
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WO2005033747A2 (en) * 2003-10-01 2005-04-14 Zetetic Institute Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
US20050225774A1 (en) * 2004-04-05 2005-10-13 Carl Zeiss Smt Ag Method for measuring and manufacturing an optical element and optical apparatus
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WO2006023406A2 (en) * 2004-08-16 2006-03-02 Zetetic Institute Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
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WO2006034065A2 (en) * 2004-09-20 2006-03-30 Zetetic Institute Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces
US7646490B2 (en) * 2006-07-25 2010-01-12 Zetetic Institute Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase shifting point-diffraction interferometry
US7751064B2 (en) * 2008-01-22 2010-07-06 Zygo Corporation Interference objective for annular test surfaces
US7609381B2 (en) * 2008-03-20 2009-10-27 The Aerospace Corporation Compact, high-throughput spectrometer apparatus for hyperspectral remote sensing
CN102047072B (zh) * 2008-04-08 2012-09-05 Qed技术国际股份有限公司 近空值子孔径测量的拼接
US8294904B2 (en) * 2008-05-29 2012-10-23 Corning Incorporated Fizeau lens having aspheric compensation
US8107084B2 (en) * 2009-01-30 2012-01-31 Zygo Corporation Interference microscope with scan motion detection using fringe motion in monitor patterns
EP2478328B1 (de) * 2009-09-18 2016-07-27 Carl Zeiss SMT GmbH Verfahren zur messung einer form einer optischen fläche
JP5483993B2 (ja) * 2009-10-20 2014-05-07 キヤノン株式会社 干渉計
DE102010029089B4 (de) * 2010-05-18 2019-08-29 Carl Zeiss Ag Optisches System zur Kalibrierung einer Lichtquelle
DE102010039746B4 (de) * 2010-08-25 2016-02-25 Carl Zeiss Ag Aberrationskorrigiertes Mikroskop
CN106154362B (zh) * 2015-04-28 2017-12-08 南京理工大学 一种小f数多波长标准球面参考透镜组
CN108344383B (zh) * 2018-02-09 2020-09-18 苏州大学 一种非接触式坐标测量机
CN108332683B (zh) * 2018-02-09 2020-09-18 苏州大学 一种用于三维面形测量的干涉式光学探头
CN108344381B (zh) * 2018-02-09 2020-06-16 苏州大学 一种非接触式三维面形测量方法

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SU149910A1 (ru) * 1961-12-27 1962-11-30 з М.М. Кривов Интерферометр дл контрол качества поверхностей вращени второго пор дка
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DE4203464B4 (de) * 1991-02-08 2007-02-01 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
US5402267A (en) * 1991-02-08 1995-03-28 Carl-Zeiss-Stiftung Catadioptric reduction objective
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JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
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US5461456A (en) * 1992-11-24 1995-10-24 General Signal Corporation Spatial uniformity varier for microlithographic illuminator
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017222734A1 (de) 2017-12-14 2019-06-19 Carl Zeiss Industrielle Messtechnik Gmbh Objektiv für eine Wellenfrontmessende Vorrichtung zur optischen Messung mindestens einer gekrümmten Messoberfläche
DE102017222734B4 (de) 2017-12-14 2022-05-25 Carl Zeiss Industrielle Messtechnik Gmbh Objektiv für eine Wellenfrontmessende Vorrichtung zur optischen Messung mindestens einer gekrümmten Messoberfläche

Also Published As

Publication number Publication date
JP3242412B2 (ja) 2001-12-25
DE19782060B4 (de) 2005-04-14
WO1998016799A1 (en) 1998-04-23
JP2000505900A (ja) 2000-05-16
US5757493A (en) 1998-05-26

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8125 Change of the main classification

Ipc: G01B 9/02