DE19782060T1 - Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich - Google Patents
Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem AperturbereichInfo
- Publication number
- DE19782060T1 DE19782060T1 DE19782060T DE19782060T DE19782060T1 DE 19782060 T1 DE19782060 T1 DE 19782060T1 DE 19782060 T DE19782060 T DE 19782060T DE 19782060 T DE19782060 T DE 19782060T DE 19782060 T1 DE19782060 T1 DE 19782060T1
- Authority
- DE
- Germany
- Prior art keywords
- interferometer
- imaging system
- numerical aperture
- aperture range
- catadioptric imaging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/255—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring radius of curvature
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/734,402 US5757493A (en) | 1996-10-16 | 1996-10-16 | Interferometer with catadioptric imaging system having expanded range of numerical aperture |
PCT/US1997/018471 WO1998016799A1 (en) | 1996-10-16 | 1997-10-15 | Interferometer with catadioptric imaging system having expanded range of numerical aperture |
Publications (1)
Publication Number | Publication Date |
---|---|
DE19782060T1 true DE19782060T1 (de) | 1999-10-28 |
Family
ID=24951555
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19782060A Expired - Fee Related DE19782060B4 (de) | 1996-10-16 | 1997-10-15 | Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich |
DE19782060T Pending DE19782060T1 (de) | 1996-10-16 | 1997-10-15 | Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19782060A Expired - Fee Related DE19782060B4 (de) | 1996-10-16 | 1997-10-15 | Interferometer mit katadioptrischem Abbildungssystem mit erweitertem numerischem Aperturbereich |
Country Status (4)
Country | Link |
---|---|
US (1) | US5757493A (de) |
JP (1) | JP3242412B2 (de) |
DE (2) | DE19782060B4 (de) |
WO (1) | WO1998016799A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017222734A1 (de) | 2017-12-14 | 2019-06-19 | Carl Zeiss Industrielle Messtechnik Gmbh | Objektiv für eine Wellenfrontmessende Vorrichtung zur optischen Messung mindestens einer gekrümmten Messoberfläche |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6075597A (en) * | 1999-03-17 | 2000-06-13 | Olshausen; Michael Cohnitz | Method for coupling narrow-band, Fabry-Perot, etalon-type interference filters to two-mirror and catadioptric telescopes |
WO2001023936A1 (en) | 1999-09-28 | 2001-04-05 | Tropel Corporation | Double mirror catadioptric objective lens system with three optical surface multifunction component |
US6562906B2 (en) * | 2000-08-11 | 2003-05-13 | E. I. Du Pont De Nemours And Company | Bi-modal ionomers |
DE10039239A1 (de) * | 2000-08-11 | 2002-03-07 | Bosch Gmbh Robert | Optische Messvorrichtung |
KR20050098268A (ko) * | 2003-01-27 | 2005-10-11 | 제테틱 인스티튜트 | 트렌치의 특성을 측정하는 간섭 공초점 현미경에 사용되는누설 유도파 모드 |
US7023560B2 (en) * | 2003-02-19 | 2006-04-04 | Zetetic Institute | Method and apparatus for dark field interferometric confocal microscopy |
WO2005008214A2 (en) * | 2003-07-07 | 2005-01-27 | Zetetic Institute | Apparatus and method for ellipsometric measurements with high spatial resolution |
US7084984B2 (en) | 2003-07-07 | 2006-08-01 | Zetetic Institute | Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
TW200523578A (en) * | 2003-09-10 | 2005-07-16 | Zetetic Inst | Catoptric and catadioptric imaging systems with adaptive catoptric surfaces |
US20050111007A1 (en) * | 2003-09-26 | 2005-05-26 | Zetetic Institute | Catoptric and catadioptric imaging system with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces |
WO2005033747A2 (en) * | 2003-10-01 | 2005-04-14 | Zetetic Institute | Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy |
US20050225774A1 (en) * | 2004-04-05 | 2005-10-13 | Carl Zeiss Smt Ag | Method for measuring and manufacturing an optical element and optical apparatus |
TW200538703A (en) * | 2004-05-06 | 2005-12-01 | Zetetic Inst | Apparatus and methods for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks |
WO2005114095A2 (en) * | 2004-05-21 | 2005-12-01 | Zetetic Institute | Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
WO2006023406A2 (en) * | 2004-08-16 | 2006-03-02 | Zetetic Institute | Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry |
WO2006023612A2 (en) * | 2004-08-19 | 2006-03-02 | Zetetic Institute | Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers |
US7492442B2 (en) * | 2004-08-27 | 2009-02-17 | Asml Holding N.V. | Adjustable resolution interferometric lithography system |
WO2006034065A2 (en) * | 2004-09-20 | 2006-03-30 | Zetetic Institute | Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces |
US7646490B2 (en) * | 2006-07-25 | 2010-01-12 | Zetetic Institute | Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase shifting point-diffraction interferometry |
US7751064B2 (en) * | 2008-01-22 | 2010-07-06 | Zygo Corporation | Interference objective for annular test surfaces |
US7609381B2 (en) * | 2008-03-20 | 2009-10-27 | The Aerospace Corporation | Compact, high-throughput spectrometer apparatus for hyperspectral remote sensing |
CN102047072B (zh) * | 2008-04-08 | 2012-09-05 | Qed技术国际股份有限公司 | 近空值子孔径测量的拼接 |
US8294904B2 (en) * | 2008-05-29 | 2012-10-23 | Corning Incorporated | Fizeau lens having aspheric compensation |
US8107084B2 (en) * | 2009-01-30 | 2012-01-31 | Zygo Corporation | Interference microscope with scan motion detection using fringe motion in monitor patterns |
EP2478328B1 (de) * | 2009-09-18 | 2016-07-27 | Carl Zeiss SMT GmbH | Verfahren zur messung einer form einer optischen fläche |
JP5483993B2 (ja) * | 2009-10-20 | 2014-05-07 | キヤノン株式会社 | 干渉計 |
DE102010029089B4 (de) * | 2010-05-18 | 2019-08-29 | Carl Zeiss Ag | Optisches System zur Kalibrierung einer Lichtquelle |
DE102010039746B4 (de) * | 2010-08-25 | 2016-02-25 | Carl Zeiss Ag | Aberrationskorrigiertes Mikroskop |
CN106154362B (zh) * | 2015-04-28 | 2017-12-08 | 南京理工大学 | 一种小f数多波长标准球面参考透镜组 |
CN108344383B (zh) * | 2018-02-09 | 2020-09-18 | 苏州大学 | 一种非接触式坐标测量机 |
CN108332683B (zh) * | 2018-02-09 | 2020-09-18 | 苏州大学 | 一种用于三维面形测量的干涉式光学探头 |
CN108344381B (zh) * | 2018-02-09 | 2020-06-16 | 苏州大学 | 一种非接触式三维面形测量方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2661658A (en) * | 1948-07-19 | 1953-12-08 | Ass Elect Ind | Optical system for increasing the working distances of microscope objectives |
SU149910A1 (ru) * | 1961-12-27 | 1962-11-30 | з М.М. Кривов | Интерферометр дл контрол качества поверхностей вращени второго пор дка |
US4869593A (en) * | 1988-04-22 | 1989-09-26 | Zygo Corporation | Interferometric surface profiler |
US4881816A (en) * | 1988-07-08 | 1989-11-21 | Zygo, Corporation | Linear and angular displacement measuring interferometer |
US4881815A (en) * | 1988-07-08 | 1989-11-21 | Zygo, Corporation | Linear and angular displacement measuring interferometer |
US4953960A (en) * | 1988-07-15 | 1990-09-04 | Williamson David M | Optical reduction system |
US4883357A (en) * | 1989-03-01 | 1989-11-28 | Zygo Corporation | Dual high stability interferometer |
US5031977A (en) * | 1989-12-27 | 1991-07-16 | General Signal Corporation | Deep ultraviolet (UV) lens for use in a photolighography system |
US5220454A (en) * | 1990-03-30 | 1993-06-15 | Nikon Corporation | Cata-dioptric reduction projection optical system |
US5241423A (en) * | 1990-07-11 | 1993-08-31 | International Business Machines Corporation | High resolution reduction catadioptric relay lens |
US5031976A (en) * | 1990-09-24 | 1991-07-16 | Kla Instruments, Corporation | Catadioptric imaging system |
US5155554A (en) * | 1990-12-20 | 1992-10-13 | General Signal Corporation | Large aperture reflective interferometer for measuring convex spherical surfaces |
DE4203464B4 (de) * | 1991-02-08 | 2007-02-01 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
US5402267A (en) * | 1991-02-08 | 1995-03-28 | Carl-Zeiss-Stiftung | Catadioptric reduction objective |
US5206515A (en) * | 1991-08-29 | 1993-04-27 | Elliott David J | Deep ultraviolet photolithography and microfabrication |
US5251070A (en) * | 1991-09-28 | 1993-10-05 | Nikon Corporation | Catadioptric reduction projection optical system |
JP3085481B2 (ja) * | 1991-09-28 | 2000-09-11 | 株式会社ニコン | 反射屈折縮小投影光学系、及び該光学系を備えた露光装置 |
US5212593A (en) * | 1992-02-06 | 1993-05-18 | Svg Lithography Systems, Inc. | Broad band optical reduction system using matched multiple refractive element materials |
US5283629A (en) * | 1992-03-30 | 1994-02-01 | Eastman Kodak Company | Method for assessing a vertex radius of curvature |
US5327219A (en) * | 1992-05-15 | 1994-07-05 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method and apparatus for removing unwanted reflections from an interferometer |
US5245402A (en) * | 1992-06-15 | 1993-09-14 | The United States Of America As Represented By The Secretary Of The Army | General aspherical surface optical testing device |
US5461456A (en) * | 1992-11-24 | 1995-10-24 | General Signal Corporation | Spatial uniformity varier for microlithographic illuminator |
US5410408A (en) * | 1993-12-22 | 1995-04-25 | Hughes Aircraft Company | Optical arrangement for performing null testing of aspheric surfaces including reflective/diffractive optics |
-
1996
- 1996-10-16 US US08/734,402 patent/US5757493A/en not_active Expired - Lifetime
-
1997
- 1997-10-15 DE DE19782060A patent/DE19782060B4/de not_active Expired - Fee Related
- 1997-10-15 JP JP51850998A patent/JP3242412B2/ja not_active Expired - Fee Related
- 1997-10-15 WO PCT/US1997/018471 patent/WO1998016799A1/en active Application Filing
- 1997-10-15 DE DE19782060T patent/DE19782060T1/de active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017222734A1 (de) | 2017-12-14 | 2019-06-19 | Carl Zeiss Industrielle Messtechnik Gmbh | Objektiv für eine Wellenfrontmessende Vorrichtung zur optischen Messung mindestens einer gekrümmten Messoberfläche |
DE102017222734B4 (de) | 2017-12-14 | 2022-05-25 | Carl Zeiss Industrielle Messtechnik Gmbh | Objektiv für eine Wellenfrontmessende Vorrichtung zur optischen Messung mindestens einer gekrümmten Messoberfläche |
Also Published As
Publication number | Publication date |
---|---|
JP3242412B2 (ja) | 2001-12-25 |
DE19782060B4 (de) | 2005-04-14 |
WO1998016799A1 (en) | 1998-04-23 |
JP2000505900A (ja) | 2000-05-16 |
US5757493A (en) | 1998-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
8125 | Change of the main classification |
Ipc: G01B 9/02 |