DE1930951A1 - Metallfilm und Verfahren zu seiner Herstellung - Google Patents

Metallfilm und Verfahren zu seiner Herstellung

Info

Publication number
DE1930951A1
DE1930951A1 DE19691930951 DE1930951A DE1930951A1 DE 1930951 A1 DE1930951 A1 DE 1930951A1 DE 19691930951 DE19691930951 DE 19691930951 DE 1930951 A DE1930951 A DE 1930951A DE 1930951 A1 DE1930951 A1 DE 1930951A1
Authority
DE
Germany
Prior art keywords
metal
deposited
deposition
carrier
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691930951
Other languages
German (de)
English (en)
Inventor
Ramsey Jun Thomas Haliburton
Richard Shield
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of DE1930951A1 publication Critical patent/DE1930951A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
DE19691930951 1968-06-24 1969-06-19 Metallfilm und Verfahren zu seiner Herstellung Pending DE1930951A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73940768A 1968-06-24 1968-06-24

Publications (1)

Publication Number Publication Date
DE1930951A1 true DE1930951A1 (de) 1970-01-02

Family

ID=24972148

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691930951 Pending DE1930951A1 (de) 1968-06-24 1969-06-19 Metallfilm und Verfahren zu seiner Herstellung

Country Status (4)

Country Link
DE (1) DE1930951A1 (enrdf_load_stackoverflow)
FR (1) FR2011590A1 (enrdf_load_stackoverflow)
GB (1) GB1265545A (enrdf_load_stackoverflow)
NL (1) NL6909376A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2540767A1 (fr) * 1983-02-14 1984-08-17 Instr I Outil de coupe pourvu d'un revetement resistant a l'usure constitue de composes refractaires de metaux difficilement fusibles et procede de fabrication dudit outil de coupe
GB2264718B (en) * 1992-03-04 1995-04-26 Univ Hull Coatings produced by vapour deposition

Also Published As

Publication number Publication date
GB1265545A (enrdf_load_stackoverflow) 1972-03-01
NL6909376A (enrdf_load_stackoverflow) 1969-12-30
FR2011590A1 (enrdf_load_stackoverflow) 1970-03-06

Similar Documents

Publication Publication Date Title
DE2820824C2 (enrdf_load_stackoverflow)
DE69032824T2 (de) Verfahren zum Laseraufdampfen
DE69914556T2 (de) Feldemissionselektronenquelle
DE69231757T2 (de) Verfahren zur Abscheidung von einem metallischen Material für die Herstellung von integrierten Schaltungen
DE3709066C2 (enrdf_load_stackoverflow)
DE3810237C2 (enrdf_load_stackoverflow)
DE112006002595T5 (de) Herstellungsvorrichtung und Herstellungsverfahren für ein Einkristall-Halbleiter
DE69129709T2 (de) Polykristalliner Silicium-Stab für das Zonenziehen und Verfahren zu seiner Herstellung
DE1446270A1 (de) Verfahren und Vorrichtung zum Herstellen duenner Folien
DE3217026C2 (enrdf_load_stackoverflow)
DE2005271C3 (de) Epitaxialverfahren zum Aufwachsen von Halbleitermaterial auf einem dotierten Halbleitersubstrat
DE1521396B1 (de) Verfahren und vorrichtung zum herstellen eines halbleiter bauelementes mit einer schottky sperrschicht
DE1138481B (de) Verfahren zur Herstellung von Halbleiteranordnungen durch einkristalline Abscheidung von Halbleitermaterial aus der Gasphase
DE2217737B2 (de) Verfahren zum Herstellen eines elektrischen Leitungssystems
DE2300813A1 (de) Verfahren zum niederschlagen von stickstoffdotiertem beta-tantal sowie eine beta-tantal-duennschicht aufweisender artikel
DE102006062029A1 (de) Verfahren zum Herstellen einer Halbleitervorrichtung
DE1515300A1 (de) Vorrichtung zur Herstellung hochwertiger duenner Schichten durch Kathodenzerstaeubung
DE1789021A1 (de) Zenerdiode und Verfahren zu ihrer Herstellung
DE3805010A1 (de) Verfahren zur herstellung duenner schichten aus oxydischem hochtemperatur-supraleiter
DE2231891A1 (de) Verfahren zum herstelllen amorpher halbleiterschichten
DE3134702A1 (de) Verfahren zum ablagern eines films eines schwerschmelzbaren metalls und durch dasselbe hergestelltes produkt
DE2517252A1 (de) Halbleiterelement
DE1930951A1 (de) Metallfilm und Verfahren zu seiner Herstellung
DE3152307A1 (de) Use of metallic glasses for fabrication of structures with submicron dimensions
DE1521601A1 (de) Vorrichtung zum epitaktischen Abscheiden von Silizium