DE1920368A1 - Verfahren zum galvanischen Vernickeln bei hoher Temperatur und unter Druck - Google Patents

Verfahren zum galvanischen Vernickeln bei hoher Temperatur und unter Druck

Info

Publication number
DE1920368A1
DE1920368A1 DE19691920368 DE1920368A DE1920368A1 DE 1920368 A1 DE1920368 A1 DE 1920368A1 DE 19691920368 DE19691920368 DE 19691920368 DE 1920368 A DE1920368 A DE 1920368A DE 1920368 A1 DE1920368 A1 DE 1920368A1
Authority
DE
Germany
Prior art keywords
nickel
temperature
coatings
current
electrodeposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691920368
Other languages
German (de)
English (en)
Inventor
Guy Chauvin
Henri Coriou
Jean Hardy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of DE1920368A1 publication Critical patent/DE1920368A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/02—Heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
DE19691920368 1968-04-26 1969-04-22 Verfahren zum galvanischen Vernickeln bei hoher Temperatur und unter Druck Pending DE1920368A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR149775 1968-04-26

Publications (1)

Publication Number Publication Date
DE1920368A1 true DE1920368A1 (de) 1970-01-08

Family

ID=8649516

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691920368 Pending DE1920368A1 (de) 1968-04-26 1969-04-22 Verfahren zum galvanischen Vernickeln bei hoher Temperatur und unter Druck

Country Status (7)

Country Link
JP (1) JPS4837651B1 (enExample)
BE (1) BE731302A (enExample)
DE (1) DE1920368A1 (enExample)
FR (1) FR1572429A (enExample)
IL (1) IL32029A0 (enExample)
LU (1) LU58442A1 (enExample)
NL (1) NL6906328A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140224663A1 (en) * 2013-02-14 2014-08-14 Phillips 66 Company Method of electrochemically depositing high-activity electrocatalysts

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4425197A (en) * 1981-08-19 1984-01-10 Inoue-Japax Research Incorporated Method of and apparatus for electrodepositing a metal on a conductive surface

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140224663A1 (en) * 2013-02-14 2014-08-14 Phillips 66 Company Method of electrochemically depositing high-activity electrocatalysts

Also Published As

Publication number Publication date
LU58442A1 (enExample) 1969-07-21
BE731302A (enExample) 1969-09-15
FR1572429A (enExample) 1969-06-27
IL32029A0 (en) 1969-06-25
JPS4837651B1 (enExample) 1973-11-13
NL6906328A (enExample) 1969-10-28

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