DE1917917C3 - Photopoylmensierbares Aufzeichnungs material Ausscheidung aus 1902639 - Google Patents

Photopoylmensierbares Aufzeichnungs material Ausscheidung aus 1902639

Info

Publication number
DE1917917C3
DE1917917C3 DE1917917*A DE1917917A DE1917917C3 DE 1917917 C3 DE1917917 C3 DE 1917917C3 DE 1917917 A DE1917917 A DE 1917917A DE 1917917 C3 DE1917917 C3 DE 1917917C3
Authority
DE
Germany
Prior art keywords
photopolymerizable
layer
plate
printing plate
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE1917917*A
Other languages
German (de)
English (en)
Other versions
DE1917917A1 (de
DE1917917B2 (de
Inventor
Yoshiaki Kyoto Oyabu
Kiyomi Suita Sakurai
Yasuyuki Takatsuki Takimoto
Takahiro Funabashi Tsunoda
Yasusi Osaka Umeda
Toshikazu Amagasaki Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of DE1917917A1 publication Critical patent/DE1917917A1/de
Publication of DE1917917B2 publication Critical patent/DE1917917B2/de
Application granted granted Critical
Publication of DE1917917C3 publication Critical patent/DE1917917C3/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE1917917*A 1968-01-22 1969-01-20 Photopoylmensierbares Aufzeichnungs material Ausscheidung aus 1902639 Expired DE1917917C3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP323868 1968-01-22
JP1687968 1968-03-15

Publications (3)

Publication Number Publication Date
DE1917917A1 DE1917917A1 (de) 1969-12-18
DE1917917B2 DE1917917B2 (de) 1973-03-15
DE1917917C3 true DE1917917C3 (de) 1973-10-04

Family

ID=26336772

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19691902639 Pending DE1902639A1 (de) 1968-01-22 1969-01-20 Photopolymerisierbare Harzzubereitungen,wasserwaschbare Photopolymerisat-Druckplatten und ihre Herstellung
DE1917917*A Expired DE1917917C3 (de) 1968-01-22 1969-01-20 Photopoylmensierbares Aufzeichnungs material Ausscheidung aus 1902639

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19691902639 Pending DE1902639A1 (de) 1968-01-22 1969-01-20 Photopolymerisierbare Harzzubereitungen,wasserwaschbare Photopolymerisat-Druckplatten und ihre Herstellung

Country Status (5)

Country Link
US (1) US3630746A (enExample)
BE (1) BE727168A (enExample)
DE (2) DE1902639A1 (enExample)
FR (1) FR2000515A1 (enExample)
GB (1) GB1233883A (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3936254A (en) * 1973-03-26 1976-02-03 Nippon Paint Company Ltd. Apparatus for the continuous manufacture of polymer plates
US3877939A (en) * 1973-06-25 1975-04-15 Nippon Paint Co Ltd Photopolymer printing plates and coated relief printing plates
US3898087A (en) * 1974-06-14 1975-08-05 Ball Corp Photopolymerizable compositions containing aminimides
JPS5917414B2 (ja) * 1975-10-07 1984-04-21 村上スクリ−ン （株） スクリ−ン版用感光性組成物及び感光膜
DE2846647A1 (de) 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
DE3015419A1 (de) 1980-04-22 1981-10-29 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignete mehrschichtelemente
DE3015340A1 (de) 1980-04-22 1981-10-29 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignete mehrschichtelemente
IT1159073B (it) * 1981-07-22 1987-02-25 Basf Ag Metodo per migliorare la preparazione,l'essiccazione e la immagazzinabilita' di elementi pluristrato adatti per la preparazione di stampi per stampaggio a rilievo
DE3144905A1 (de) * 1981-11-12 1983-05-19 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials
EP0081964B2 (en) * 1981-12-10 1993-08-04 Toray Industries, Inc. Photosensitive polymer composition
JPS6051833A (ja) * 1983-07-01 1985-03-23 Toray Ind Inc 感光性樹脂組成物
DE3324642A1 (de) * 1983-07-08 1985-01-17 Basf Ag, 6700 Ludwigshafen Verfahren zur stabilisierung von photopolymerisierbaren mischungen
DE3324643A1 (de) * 1983-07-08 1985-01-17 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare wasserloesliche oder wasserdispergierbare mischung
US5204222A (en) * 1988-07-16 1993-04-20 Hoechst Aktiengesellschaft Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates
DE3916463A1 (de) * 1989-05-20 1990-11-22 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
US5238772A (en) * 1989-06-21 1993-08-24 Hoechst Aktiengesellschaft Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units
US5683837A (en) * 1994-11-18 1997-11-04 Napp Systems, Inc. Water-soluble compositions for preparation of durable, high-resolution printing plates
WO1996018133A1 (en) * 1994-12-06 1996-06-13 Napp Systems, Inc. High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor
US20070071884A1 (en) * 2005-09-27 2007-03-29 Koji Takeshita Electroluminescent element and a method of manufacturing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE603930A (enExample) * 1960-05-19
US3147117A (en) * 1961-05-26 1964-09-01 Horizons Inc Process of forming print-out images from light sensitive organic amine compositions
US3366481A (en) * 1963-09-20 1968-01-30 Harmick Res & Dev Corp Photoengraving resists and compositions therefor
US3259499A (en) * 1965-01-18 1966-07-05 Du Pont Polymerizable elements
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer

Also Published As

Publication number Publication date
DE1902639B2 (enExample) 1973-10-11
US3630746A (en) 1971-12-28
DE1917917A1 (de) 1969-12-18
FR2000515A1 (enExample) 1969-09-12
GB1233883A (enExample) 1971-06-03
DE1902639A1 (de) 1969-10-02
DE1917917B2 (de) 1973-03-15
BE727168A (enExample) 1969-07-01

Similar Documents

Publication Publication Date Title
DE1917917C3 (de) Photopoylmensierbares Aufzeichnungs material Ausscheidung aus 1902639
DE2064742C3 (de) Photopolymerisierbare Verbindungen
DE1906668C3 (de) Fotografisches Aufzeichnungsmaterial für Bildreproduktionen und Verfahren zu seiner Herstellung sowie ein Reproduktionsverfahren
DE2039861B2 (de) Photopolymerisierbare kopiermasse
DE1225048B (de) Photopolymerisierbares Aufzeichnungsmaterial und Verfahren zum Herstellen von Bildern
DE3007212A1 (de) Lichtempfindliche masse
DE2831101A1 (de) Lichtempfindliches bildausbildungsmaterial und anwendungsverfahren hierfuer
DE2127767B2 (de) Fotopolymerisierbares aufzeichnungsmaterial und verfahren zu dessen herstellung
EP0432450B1 (de) Entwicklerkonzentrat und daraus hergestellter Entwickler für belichtete negativ arbeitende Reproduktionsschichten mit Deckschicht sowie Verfahren zur Herstellung von Druckformen
DE1522444B2 (de) Polymerisationsinhibitor enthaltendes lichtvernetzbares gemisch
DE3938107A1 (de) Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen
DE2640105A1 (de) Verfahren zur herstellung von photopolymeren tiefdruckformen
DE3889415T2 (de) Photoschablone für Siebdruck.
CH644211A5 (de) Verfahren zur herstellung von lichtempfindlichem material fuer die gerbende entwicklung.
DE2362005A1 (de) Verfahren zum wasserfestmachen von photopolymeren druckplatten
DE2725730A1 (de) Photomaterial
DE1067219B (de) Verfahren zur Herstellung von durch Lichteinwirkung vernetzenden hochpolymeren Verbindungen
DE1905012C3 (de) Photopolymerisierbares Aufzeichnungsmaterial zum Herstellen von Reliefs
DE2645113C3 (de) Mit Wasser entwickelbares, lichtempfindliches Gemisch für Drucksiebe, mit Wasser entwickelbares Drucksieb und Verfahren zu seiner Herstellung
DE2230936C3 (de) Lichtempfindliches Gemisch
EP0195322B1 (de) Verfahren zur Herstellung eines photopolymerisierbaren Aufzeichnungsmaterials
EP0021429A2 (de) Photopolymerisierbares Kopiermaterial und Verfahren zur Herstellung von Reliefbildern
DE2631837A1 (de) Lichtempfindliche harzmassen und ihre verwendung
DE2558527A1 (de) Wasserloesliche lichtempfindliche harzmasse
DE2307292A1 (de) Photopolymerisierbare masse

Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977