DE1796320B2 - Selbsthemmende Besatzpatrone - Google Patents

Selbsthemmende Besatzpatrone

Info

Publication number
DE1796320B2
DE1796320B2 DE19651796320 DE1796320A DE1796320B2 DE 1796320 B2 DE1796320 B2 DE 1796320B2 DE 19651796320 DE19651796320 DE 19651796320 DE 1796320 A DE1796320 A DE 1796320A DE 1796320 B2 DE1796320 B2 DE 1796320B2
Authority
DE
Germany
Prior art keywords
cartridge
head
locking
filling
widening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19651796320
Other languages
German (de)
English (en)
Other versions
DE1796320C3 (xx
DE1796320A1 (de
Inventor
Hubert 4600 Dortmund Lichtenberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lichtenberg & Co Chemische Fabrik Zweigniederlassung Der Wenzel & Weidmann 4600 Dortmund GmbH
Original Assignee
Lichtenberg & Co Chemische Fabrik Zweigniederlassung Der Wenzel & Weidmann 4600 Dortmund GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lichtenberg & Co Chemische Fabrik Zweigniederlassung Der Wenzel & Weidmann 4600 Dortmund GmbH filed Critical Lichtenberg & Co Chemische Fabrik Zweigniederlassung Der Wenzel & Weidmann 4600 Dortmund GmbH
Priority to DE19651796320 priority Critical patent/DE1796320B2/de
Publication of DE1796320A1 publication Critical patent/DE1796320A1/de
Publication of DE1796320B2 publication Critical patent/DE1796320B2/de
Application granted granted Critical
Publication of DE1796320C3 publication Critical patent/DE1796320C3/de
Granted legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F42—AMMUNITION; BLASTING
    • F42D—BLASTING
    • F42D1/00—Blasting methods or apparatus, e.g. loading or tamping
    • F42D1/08—Tamping methods; Methods for loading boreholes with explosives; Apparatus therefor
    • F42D1/20—Tamping cartridges, i.e. cartridges containing tamping material

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Earth Drilling (AREA)
  • Toys (AREA)
DE19651796320 1964-02-14 1965-11-06 Selbsthemmende Besatzpatrone Granted DE1796320B2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19651796320 DE1796320B2 (de) 1964-02-14 1965-11-06 Selbsthemmende Besatzpatrone

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEL0047042 1964-02-14
DE19651796320 DE1796320B2 (de) 1964-02-14 1965-11-06 Selbsthemmende Besatzpatrone

Publications (3)

Publication Number Publication Date
DE1796320A1 DE1796320A1 (de) 1973-02-15
DE1796320B2 true DE1796320B2 (de) 1973-09-20
DE1796320C3 DE1796320C3 (xx) 1974-05-22

Family

ID=25756145

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19651796320 Granted DE1796320B2 (de) 1964-02-14 1965-11-06 Selbsthemmende Besatzpatrone

Country Status (1)

Country Link
DE (1) DE1796320B2 (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3814746A1 (de) * 1988-04-30 1989-11-09 Wilhelm Leppak System zur verspannung einer sprengladung in einem bohrloch
DE19935049A1 (de) * 1999-07-26 2001-02-01 Thomas Loewen Schutzhelm

Also Published As

Publication number Publication date
DE1796320C3 (xx) 1974-05-22
DE1796320A1 (de) 1973-02-15

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977
EGZ Application of addition ceased through non-payment of annual fee of main patent