DE1764378C3 - Integrierte Randschichtdiodenmatrix und Verfahren zu ihrer Herstellung - Google Patents
Integrierte Randschichtdiodenmatrix und Verfahren zu ihrer HerstellungInfo
- Publication number
- DE1764378C3 DE1764378C3 DE1764378A DE1764378A DE1764378C3 DE 1764378 C3 DE1764378 C3 DE 1764378C3 DE 1764378 A DE1764378 A DE 1764378A DE 1764378 A DE1764378 A DE 1764378A DE 1764378 C3 DE1764378 C3 DE 1764378C3
- Authority
- DE
- Germany
- Prior art keywords
- layer
- semiconductor
- integrated
- strips
- diode matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/16—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B20/00—Read-only memory [ROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/926—Elongated lead extending axially through another elongated lead
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49004—Electrical device making including measuring or testing of device or component part
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49069—Data storage inductor or core
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
Landscapes
- Semiconductor Memories (AREA)
- Electrodes Of Semiconductors (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Element Separation (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT1664467 | 1967-05-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE1764378A1 DE1764378A1 (de) | 1972-03-23 |
| DE1764378B2 DE1764378B2 (de) | 1973-05-17 |
| DE1764378C3 true DE1764378C3 (de) | 1973-12-20 |
Family
ID=11149070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE1764378A Expired DE1764378C3 (de) | 1967-05-30 | 1968-05-28 | Integrierte Randschichtdiodenmatrix und Verfahren zu ihrer Herstellung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3555365A (cg-RX-API-DMAC7.html) |
| DE (1) | DE1764378C3 (cg-RX-API-DMAC7.html) |
| FR (1) | FR1585038A (cg-RX-API-DMAC7.html) |
| GB (1) | GB1220843A (cg-RX-API-DMAC7.html) |
| SU (1) | SU473387A3 (cg-RX-API-DMAC7.html) |
| YU (1) | YU32377B (cg-RX-API-DMAC7.html) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3699395A (en) * | 1970-01-02 | 1972-10-17 | Rca Corp | Semiconductor devices including fusible elements |
| DE2023219C3 (de) * | 1970-05-12 | 1979-09-06 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Programmierbarer Halbleiter-Festwertspeicher |
| US3699403A (en) * | 1970-10-23 | 1972-10-17 | Rca Corp | Fusible semiconductor device including means for reducing the required fusing current |
| BE794202A (fr) * | 1972-01-19 | 1973-05-16 | Intel Corp | Liaison fusible pour circuit integre sur substrat semi-conducteur pour memoires |
| GB1445479A (en) * | 1974-01-22 | 1976-08-11 | Raytheon Co | Electrical fuses |
| FR2311410A1 (fr) * | 1975-05-13 | 1976-12-10 | Thomson Csf | Circuit de commutation integre, matrice de commutation et circuits logiques utilisant ledit circuit |
| US4032949A (en) * | 1975-05-15 | 1977-06-28 | Raytheon Company | Integrated circuit fusing technique |
| GB1532286A (en) * | 1976-10-07 | 1978-11-15 | Elliott Bros | Manufacture of electro-luminescent display devices |
| NL8002634A (nl) * | 1980-05-08 | 1981-12-01 | Philips Nv | Programmeerbare halfgeleiderinrichting en werkwijze ter vervaardiging daarvan. |
| US4412308A (en) * | 1981-06-15 | 1983-10-25 | International Business Machines Corporation | Programmable bipolar structures |
| US4518981A (en) * | 1981-11-12 | 1985-05-21 | Advanced Micro Devices, Inc. | Merged platinum silicide fuse and Schottky diode and method of manufacture thereof |
| US4974048A (en) * | 1989-03-10 | 1990-11-27 | The Boeing Company | Integrated circuit having reroutable conductive paths |
| US5139883A (en) * | 1989-05-09 | 1992-08-18 | Grigory Raykhtsaum | Intermetallic time-temperature integration fuse |
| US5247735A (en) * | 1991-12-18 | 1993-09-28 | International Business Machines Corporation | Electrical wire deletion |
| US5914648A (en) * | 1995-03-07 | 1999-06-22 | Caddock Electronics, Inc. | Fault current fusing resistor and method |
| US6059917A (en) * | 1995-12-08 | 2000-05-09 | Texas Instruments Incorporated | Control of parallelism during semiconductor die attach |
| US5731624A (en) * | 1996-06-28 | 1998-03-24 | International Business Machines Corporation | Integrated pad and fuse structure for planar copper metallurgy |
-
1968
- 1968-05-28 GB GB25487/68A patent/GB1220843A/en not_active Expired
- 1968-05-28 DE DE1764378A patent/DE1764378C3/de not_active Expired
- 1968-05-28 YU YU1235/68A patent/YU32377B/xx unknown
- 1968-05-29 US US732988A patent/US3555365A/en not_active Expired - Lifetime
- 1968-05-30 SU SU1246034A patent/SU473387A3/ru active
- 1968-05-30 FR FR1585038D patent/FR1585038A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR1585038A (cg-RX-API-DMAC7.html) | 1970-01-09 |
| US3555365A (en) | 1971-01-12 |
| DE1764378A1 (de) | 1972-03-23 |
| YU32377B (en) | 1974-10-31 |
| GB1220843A (en) | 1971-01-27 |
| YU123568A (en) | 1974-04-30 |
| DE1764378B2 (de) | 1973-05-17 |
| SU473387A3 (ru) | 1975-06-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1764378C3 (de) | Integrierte Randschichtdiodenmatrix und Verfahren zu ihrer Herstellung | |
| DE2217538C3 (de) | Verfahren zur Herstellung von Zwischenverbindungen in einer Halbleiteranordnung | |
| DE1933731C3 (de) | Verfahren zum Herstellen einer integrierten Halbleiterschaltung | |
| DE1614872C3 (de) | Halbleiteranordnung | |
| DE1266406B (de) | Verfahren zum Herstellen mechanisch halternder und elektrisch leitender Anschluesse an kleinen Plaettchen, insbesondere an Halbleiterplaettchen | |
| DE2411259A1 (de) | Integrierter schaltkreis und verfahren zu seiner herstellung | |
| DE2637667A1 (de) | Halbleiteranordnung | |
| DE2312413B2 (de) | Verfahren zur herstellung eines matrixschaltkreises | |
| DE1959900A1 (de) | Druckmessfuehler | |
| DE1764155A1 (de) | Verfahren zur Herstellung eines Halbleiterbauelements und durch dieses Verfahren hergestelltes Halbleiterbauelement | |
| DE68928193T2 (de) | Halbleiterchip und Verfahren zu seiner Herstellung | |
| DE2510757C2 (de) | Verfahren zum Herstellen von Trägersubstraten für hochintegrierte Halbleiterschaltungsplättchen | |
| DE2313106A1 (de) | Verfahren zum herstellen eines elektrischen verbindungssystems | |
| DE2823973A1 (de) | Verfahren zur herstellung eines halbleiters und nach diesem verfahren hergestellter halbleiter | |
| DE2101028C2 (de) | Verfahren zum Herstellen einer Mehrzahl von Halbleiterbauelementen | |
| DE69029936T2 (de) | Diodenmatrixtrennung | |
| DE2358495A1 (de) | Verfahren zur herstellung von substraten mit verbundenen leiterschichten | |
| DE2342923C2 (de) | Verfahren zur Herstellung einer Zweiphasen-Ladungsverschlebeanordnung und nach diesem Verfahren hergestellte Zweiphasen-Ladungs Verschiebeanordnung | |
| DE2336908C3 (de) | Integrierte Halbleiteranordnung mit Mehrlagen-Metallisierung | |
| DE3544539A1 (de) | Halbleiteranordnung mit metallisierungsbahnen verschiedener staerke sowie verfahren zu deren herstellung | |
| DE1280416B (de) | Verfahren zum Herstellen epitaktischer Halbleiterschichten auf elektrisch leitenden Schichten | |
| DE2252711B2 (de) | Verfahren zur herstellung eines matrixfeldes lichtemittierender halbleiterdioden | |
| DE2039027C3 (de) | Halbleiteranordnung mit einem Träger aus Isoliermaterial, einem Halbleiterbauelement und einem Anschlußfleck | |
| DE2453578A1 (de) | Verfahren zum feststellen von vollstaendig durchgehenden bohrungen in einer auf einem halbleitersubstrat angebrachten isolierschicht | |
| DE2105164C2 (de) | Halbleiterbauelement mit Basis- und Emitterzone und Widerstandsschicht und Verfahren zu seiner Herstellung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 | ||
| EHJ | Ceased/non-payment of the annual fee |