DE1696110B1 - Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlen - Google Patents
Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlenInfo
- Publication number
- DE1696110B1 DE1696110B1 DE19681696110 DE1696110A DE1696110B1 DE 1696110 B1 DE1696110 B1 DE 1696110B1 DE 19681696110 DE19681696110 DE 19681696110 DE 1696110 A DE1696110 A DE 1696110A DE 1696110 B1 DE1696110 B1 DE 1696110B1
- Authority
- DE
- Germany
- Prior art keywords
- percent
- glass
- weight
- component
- vaporized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims description 30
- 239000000463 material Substances 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000007738 vacuum evaporation Methods 0.000 title claims 2
- 239000011521 glass Substances 0.000 claims description 66
- 239000000203 mixture Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 238000010894 electron beam technology Methods 0.000 claims description 11
- 239000003513 alkali Substances 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 9
- 239000011734 sodium Substances 0.000 claims description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000012298 atmosphere Substances 0.000 claims description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 3
- 239000004327 boric acid Substances 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 3
- 229910052700 potassium Inorganic materials 0.000 claims description 3
- 239000011591 potassium Substances 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 101100346656 Drosophila melanogaster strat gene Proteins 0.000 claims 1
- 239000005388 borosilicate glass Substances 0.000 claims 1
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 229910052697 platinum Inorganic materials 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 230000035882 stress Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000010309 melting process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052573 porcelain Inorganic materials 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000002262 irrigation Effects 0.000 description 1
- 238000003973 irrigation Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 210000003733 optic disk Anatomy 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Glass Compositions (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19681696110 DE1696110B1 (de) | 1968-01-23 | 1968-01-23 | Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlen |
| JP299669A JPS516694B1 (en)) | 1968-01-23 | 1969-01-17 | |
| CH74169A CH522747A (de) | 1968-01-23 | 1969-01-20 | Verfahren zur Herstellung von glasigen Schichten auf Substraten |
| GB341869A GB1208091A (en) | 1968-01-23 | 1969-01-21 | Improvements in or relating to glass |
| BE727217D BE727217A (en)) | 1968-01-23 | 1969-01-21 | |
| FR6901041A FR2000583A1 (en)) | 1968-01-23 | 1969-01-21 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEJ0035563 | 1968-01-23 | ||
| DE19681696110 DE1696110B1 (de) | 1968-01-23 | 1968-01-23 | Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1696110B1 true DE1696110B1 (de) | 1971-07-01 |
Family
ID=25754609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19681696110 Withdrawn DE1696110B1 (de) | 1968-01-23 | 1968-01-23 | Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlen |
Country Status (5)
| Country | Link |
|---|---|
| BE (1) | BE727217A (en)) |
| CH (1) | CH522747A (en)) |
| DE (1) | DE1696110B1 (en)) |
| FR (1) | FR2000583A1 (en)) |
| GB (1) | GB1208091A (en)) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3436001A1 (de) * | 1984-10-01 | 1986-04-03 | Siemens AG, 1000 Berlin und 8000 München | Elektrostatisches glasloeten von halbleiterbauteilen |
| EP0461468A1 (de) * | 1990-06-11 | 1991-12-18 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Bleioxidfreies Glas für elektrische Geräte |
| WO1994019506A1 (de) * | 1993-02-25 | 1994-09-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Im vakuum aufgedampte barriereschichten für die verpackungsindustrie und aufdampfgut für ihre herstellung |
| DE102005044522A1 (de) * | 2005-09-16 | 2007-03-22 | Schott Ag | Verfahren zum Aufbringen einer porösen Glasschicht |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115124248B (zh) * | 2022-06-23 | 2024-10-01 | 辽宁爱尔创生物材料有限公司 | 一种玻璃粉及其制备方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB709503A (en) * | 1952-06-27 | 1954-05-26 | English Electric Valve Co Ltd | Improvements in or relating to methods of making very thin films |
| GB787183A (en) * | 1953-09-30 | 1957-12-04 | Siemens Ag | Improvements in or relating to electric roll-type capacitors |
| US3276902A (en) * | 1963-10-01 | 1966-10-04 | Itt | Method of vapor deposition employing an electron beam |
-
1968
- 1968-01-23 DE DE19681696110 patent/DE1696110B1/de not_active Withdrawn
-
1969
- 1969-01-20 CH CH74169A patent/CH522747A/de not_active IP Right Cessation
- 1969-01-21 GB GB341869A patent/GB1208091A/en not_active Expired
- 1969-01-21 BE BE727217D patent/BE727217A/xx unknown
- 1969-01-21 FR FR6901041A patent/FR2000583A1/fr not_active Withdrawn
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB709503A (en) * | 1952-06-27 | 1954-05-26 | English Electric Valve Co Ltd | Improvements in or relating to methods of making very thin films |
| GB787183A (en) * | 1953-09-30 | 1957-12-04 | Siemens Ag | Improvements in or relating to electric roll-type capacitors |
| US3276902A (en) * | 1963-10-01 | 1966-10-04 | Itt | Method of vapor deposition employing an electron beam |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3436001A1 (de) * | 1984-10-01 | 1986-04-03 | Siemens AG, 1000 Berlin und 8000 München | Elektrostatisches glasloeten von halbleiterbauteilen |
| EP0461468A1 (de) * | 1990-06-11 | 1991-12-18 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Bleioxidfreies Glas für elektrische Geräte |
| WO1994019506A1 (de) * | 1993-02-25 | 1994-09-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Im vakuum aufgedampte barriereschichten für die verpackungsindustrie und aufdampfgut für ihre herstellung |
| DE102005044522A1 (de) * | 2005-09-16 | 2007-03-22 | Schott Ag | Verfahren zum Aufbringen einer porösen Glasschicht |
| DE102005044522B4 (de) * | 2005-09-16 | 2010-02-11 | Schott Ag | Verfahren zum Aufbringen einer porösen Glasschicht, sowie Verbundmaterial und dessen Verwendung |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1208091A (en) | 1970-10-07 |
| BE727217A (en)) | 1969-07-01 |
| CH522747A (de) | 1972-05-15 |
| FR2000583A1 (en)) | 1969-09-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA1183555A (en) | Glass-ceramic coatings for use on metal substrates | |
| DE60318517T2 (de) | Bleifreies niedrigschmelzendes Glas | |
| DE69331300T2 (de) | Verfahren zur Abscheidung aus der Gasphase von einem Fluorid-Glasfilm auf einem Substrat | |
| EP0221968A1 (de) | Verfahren zur entfernung von metallionen aus körpern aus glas oder keramischen werkstoffen | |
| DE2351154C2 (de) | Verfahren zur Herstellung von Chalkogenidglasfasern | |
| US3998617A (en) | Method of improving the mechanical strength of glass | |
| DE68903980T2 (de) | Elektroleitendes glas und verfahren zu seiner herstellung. | |
| DE1696110B1 (de) | Verfahren zur herstellung von glasigen schichten auf substat materialien durch vakuumaufdampfen mittels elektronenstrahlen | |
| DE3886802T2 (de) | Verfahren zum beschleunigten Ausbrennen von organischen Materialien. | |
| DE2446742A1 (de) | Glaslotzusammensetzung | |
| DE1596820B1 (de) | Glas auf der Basis von ZnO-B2O3-SiO2 mit einem thermischen Ausdehnungskoffizienten von 44,5 bis 44,8.10-7/ deg.C(0 bis 300 deg.C) | |
| DE2032577A1 (de) | Verfahren zum Sintern und Schmel zen feuerfester Materialien ohne An wenden eines Tiegels | |
| US3801356A (en) | Method of producing vitreous layers on substrate materials | |
| EP0974559B1 (de) | Komposit-Lotglas mit niedriger Aufschmelztemperatur, ein Füllstoff hierfür, sowie deren Verwendung | |
| DE1496465B2 (de) | Kristallisierte abdichtglaeser mit waermeausdehnungskoeffi zienten von hoechstens 70 x 10 hoch 7 grad c (0 450 grad c) die bei temperaturen unter 700 grad c entglast worden sind und verfahren zur herstellung einer kristallisierten glasab dichtung | |
| DE2345102A1 (de) | Elektrischer widerstand und verfahren zu seiner herstellung | |
| DE2447353B2 (de) | Verfahren zum herstellen von lichtleitfasern | |
| DE1696110C (de) | Verfahren zur Herstellung von glasigen Schichten auf Substratmateriaüen durch Vakuumaufdampfen mittels Elektronenstrahlen | |
| DE1496544A1 (de) | Glasmassen fuer elektrische Widerstandsschichten | |
| DD263083A1 (de) | Verfahren zum glaetten und versiegeln thermisch gespritzter oberflaechenschichten | |
| DE69202277T2 (de) | Verfahren zur Herstellung von integriert-optischen Wellenleitern in Glas. | |
| DE3909539C2 (de) | Verwendung einer Glas-Keramik-Beschichtung als Schutzschicht gegen Sauerstoff bei Temperaturen oberhalb von 1000 DEG C | |
| DE2012366C3 (de) | Gläser des Systems SIO2 -Al2 O3 -Cu2 O mit niedriger Wärmeausdehnung, geringer Dichte und guter Wärmeschockfestigkeit und ihre Verwendung | |
| DE1149140B (de) | Fritte zur Herstellung von Leuchtemails | |
| DE19851927A1 (de) | Thermisch hochbelastbares Glas und seine Verwendung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E77 | Valid patent as to the heymanns-index 1977 | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: SCHOTT GLASWERKE, 6500 MAINZ, DE |
|
| 8339 | Ceased/non-payment of the annual fee |