DE1615287A1 - Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum - Google Patents

Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum

Info

Publication number
DE1615287A1
DE1615287A1 DE19671615287 DE1615287A DE1615287A1 DE 1615287 A1 DE1615287 A1 DE 1615287A1 DE 19671615287 DE19671615287 DE 19671615287 DE 1615287 A DE1615287 A DE 1615287A DE 1615287 A1 DE1615287 A1 DE 1615287A1
Authority
DE
Germany
Prior art keywords
carrier
coating
chamber
electrodes
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19671615287
Other languages
German (de)
English (en)
Inventor
Pierre Gallez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Glass Europe SA
Original Assignee
Glaverbel Belgium SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel Belgium SA filed Critical Glaverbel Belgium SA
Publication of DE1615287A1 publication Critical patent/DE1615287A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
DE19671615287 1966-10-05 1967-09-21 Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum Pending DE1615287A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU52106A LU52106A1 (xx) 1966-10-05 1966-10-05

Publications (1)

Publication Number Publication Date
DE1615287A1 true DE1615287A1 (de) 1970-06-11

Family

ID=19724990

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19671615287 Pending DE1615287A1 (de) 1966-10-05 1967-09-21 Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum

Country Status (11)

Country Link
US (1) US3616451A (xx)
AT (2) AT280514B (xx)
BE (1) BE704031A (xx)
CH (1) CH501063A (xx)
DE (1) DE1615287A1 (xx)
ES (1) ES345149A1 (xx)
FI (1) FI46636C (xx)
FR (1) FR1556228A (xx)
GB (1) GB1194428A (xx)
LU (1) LU52106A1 (xx)
NL (1) NL6713182A (xx)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767559A (en) * 1970-06-24 1973-10-23 Eastman Kodak Co Sputtering apparatus with accordion pleated anode means
FR2098563A5 (xx) * 1970-07-10 1972-03-10 Progil
JPH0733576B2 (ja) * 1989-11-29 1995-04-12 株式会社日立製作所 スパツタ装置、及びターゲツト交換装置、並びにその交換方法
JPH05804A (ja) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd 大面積複合酸化物超電導薄膜の成膜装置
DE4040856A1 (de) * 1990-12-20 1992-06-25 Leybold Ag Zerstaeubungsanlage
US5292419A (en) * 1990-12-20 1994-03-08 Leybold Aktiengesellschaft Sputtering unit
US5279724A (en) * 1991-12-26 1994-01-18 Xerox Corporation Dual sputtering source
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
US6045671A (en) * 1994-10-18 2000-04-04 Symyx Technologies, Inc. Systems and methods for the combinatorial synthesis of novel materials
DE19830223C1 (de) * 1998-07-07 1999-11-04 Techno Coat Oberflaechentechni Vorrichtung und Verfahren zum mehrlagigen PVD - Beschichten von Substraten
US6833031B2 (en) * 2000-03-21 2004-12-21 Wavezero, Inc. Method and device for coating a substrate
JP2003141719A (ja) * 2001-10-30 2003-05-16 Anelva Corp スパッタリング装置及び薄膜形成方法
JP4066044B2 (ja) * 2002-11-08 2008-03-26 信行 高橋 成膜方法及びスパッタ装置
CA2564539C (en) * 2005-11-14 2014-05-06 Sulzer Metco Coatings B.V. A method for coating of a base body with a platinum modified aluminide ptmal by means of a physical deposition out of the gas phase
US8287647B2 (en) * 2007-04-17 2012-10-16 Lam Research Corporation Apparatus and method for atomic layer deposition
KR100865475B1 (ko) * 2007-08-30 2008-10-27 세메스 주식회사 노즐 어셈블리, 이를 갖는 처리액 공급 장치 및 이를이용하는 처리액 공급 방법
US10586689B2 (en) * 2009-07-31 2020-03-10 Guardian Europe S.A.R.L. Sputtering apparatus including cathode with rotatable targets, and related methods
US20120027953A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating Reactor Assembly for Depositing Film on Substrate
US20130014700A1 (en) * 2011-07-11 2013-01-17 Hariharakeshava Sarpangala Hegde Target shield designs in multi-target deposition system.
US20160237555A1 (en) * 2013-10-24 2016-08-18 Meyer Burger (Germany) Ag Multi-Magnetron Arrangement
US11442132B2 (en) * 2017-07-07 2022-09-13 Nextracker Llc Systems for and methods of positioning solar panels in an array of solar panels to efficiently capture sunlight

Also Published As

Publication number Publication date
BE704031A (xx) 1968-03-19
US3616451A (en) 1971-10-26
LU52106A1 (xx) 1968-05-07
ES345149A1 (es) 1968-11-16
FR1556228A (xx) 1969-02-07
FI46636B (xx) 1973-01-31
GB1194428A (en) 1970-06-10
AT280514B (de) 1970-04-10
FI46636C (fi) 1973-05-08
NL6713182A (xx) 1968-04-08
AT284365B (de) 1970-09-10
CH501063A (fr) 1970-12-31

Similar Documents

Publication Publication Date Title
DE1615287A1 (de) Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum
DE69031126T2 (de) Drehende mikrowellenbeheizung zum grossflächigen beschichten
DE69835324T2 (de) Dampfphasenabscheidungsgerät mit kathodischem Lichtbogen (Ringförmige Kathode)
EP0550003B1 (de) Vakuumbehandlungsanlage und deren Verwendungen
DE4005956C1 (xx)
DE3050343T1 (de) Entrichtung zur Bestrahlung von Objekten mit Elektronen
DE2856364A1 (de) Vorrichtung zur kathodenzerstaeubung
DE3047113A1 (de) Katodenanordnung und regelverfahren fuer katodenzerstaeubungsanlagen mit einem magnetsystem zur erhoehung der zerstaeubungsrate
WO1986004616A1 (en) Spraying installation for reactive coating of a substrate with hard materials
DE1914747A1 (de) Vorrichtung zum mehrseitigen Aufstaeuben
WO2000039355A1 (de) Verfahren und einrichtung zum beschichten von substraten mittels bipolarer puls-magnetron-zerstäubung und deren anwendung
DE1956761A1 (de) Vorrichtung zur Kathodenzerstaeubung
DE2544725C3 (de) Elektronenstrahlverdampfer
DE102007060807B4 (de) Gasentladungsquelle, insbesondere für EUV-Strahlung
DE2917841A1 (de) Verdampfer fuer vakuumaufdampfanlagen
DE19623359A1 (de) Vorrichtung zum Beschichten eines Substrats
DE2221600A1 (de) Vorrichtung zum beschichten von substraten durch kathodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaess
EP0677599A1 (de) Einrichtung zur Behandlung von Gegenständen, insbesondere Galvanisiereinrichtun g für Leiterplatten
DE2647149C2 (de) Sputter-Beschichtungseinrichtung zur Herstellung beschichteter Träger
DE69305725T2 (de) Magnetron-Zerstäubungsvorrichtung und Dünnfilm-Beschichtungsverfahren
DE102004027989B4 (de) Werkstückträgervorrichtung zum Halten von Werkstücken
EP0389506B1 (de) Verfahren zum erzeugen dünner schichten aus hochschmelzendem oder bei hoher temperatur sublimierendem material welches aus unterschiedlichen chemischen verbindungen zusammengesetzt ist auf einem substrat
EP2561114B1 (de) Vorrichtung zum beschichten von substraten nach dem eb/pvd-verfahren
DE2655942C2 (xx)
DE2301593C3 (de) Wechselvorrichtung für Targets für Kathodenzerstäubung