DE1615287A1 - Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum - Google Patents
Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter VakuumInfo
- Publication number
- DE1615287A1 DE1615287A1 DE19671615287 DE1615287A DE1615287A1 DE 1615287 A1 DE1615287 A1 DE 1615287A1 DE 19671615287 DE19671615287 DE 19671615287 DE 1615287 A DE1615287 A DE 1615287A DE 1615287 A1 DE1615287 A1 DE 1615287A1
- Authority
- DE
- Germany
- Prior art keywords
- carrier
- coating
- chamber
- electrodes
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims description 17
- 239000011521 glass Substances 0.000 title description 14
- 238000000576 coating method Methods 0.000 claims description 44
- 239000000126 substance Substances 0.000 claims description 39
- 239000011248 coating agent Substances 0.000 claims description 37
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 4
- 239000000110 cooling liquid Substances 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 238000005485 electric heating Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 11
- 238000002207 thermal evaporation Methods 0.000 description 5
- 239000002826 coolant Substances 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 239000012809 cooling fluid Substances 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000011819 refractory material Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910001922 gold oxide Inorganic materials 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 206010011878 Deafness Diseases 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000003351 stiffener Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LU52106A LU52106A1 (enrdf_load_stackoverflow) | 1966-10-05 | 1966-10-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1615287A1 true DE1615287A1 (de) | 1970-06-11 |
Family
ID=19724990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19671615287 Pending DE1615287A1 (de) | 1966-10-05 | 1967-09-21 | Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum |
Country Status (11)
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3767559A (en) * | 1970-06-24 | 1973-10-23 | Eastman Kodak Co | Sputtering apparatus with accordion pleated anode means |
| FR2098563A5 (enrdf_load_stackoverflow) * | 1970-07-10 | 1972-03-10 | Progil | |
| JPH0733576B2 (ja) * | 1989-11-29 | 1995-04-12 | 株式会社日立製作所 | スパツタ装置、及びターゲツト交換装置、並びにその交換方法 |
| JPH05804A (ja) * | 1990-08-01 | 1993-01-08 | Sumitomo Electric Ind Ltd | 大面積複合酸化物超電導薄膜の成膜装置 |
| US5292419A (en) * | 1990-12-20 | 1994-03-08 | Leybold Aktiengesellschaft | Sputtering unit |
| DE4040856A1 (de) | 1990-12-20 | 1992-06-25 | Leybold Ag | Zerstaeubungsanlage |
| US5279724A (en) * | 1991-12-26 | 1994-01-18 | Xerox Corporation | Dual sputtering source |
| US5322606A (en) * | 1991-12-26 | 1994-06-21 | Xerox Corporation | Use of rotary solenoid as a shutter actuator on a rotating arm |
| GB9405442D0 (en) * | 1994-03-19 | 1994-05-04 | Applied Vision Ltd | Apparatus for coating substrates |
| US6045671A (en) * | 1994-10-18 | 2000-04-04 | Symyx Technologies, Inc. | Systems and methods for the combinatorial synthesis of novel materials |
| DE19830223C1 (de) * | 1998-07-07 | 1999-11-04 | Techno Coat Oberflaechentechni | Vorrichtung und Verfahren zum mehrlagigen PVD - Beschichten von Substraten |
| US6833031B2 (en) * | 2000-03-21 | 2004-12-21 | Wavezero, Inc. | Method and device for coating a substrate |
| JP2003141719A (ja) * | 2001-10-30 | 2003-05-16 | Anelva Corp | スパッタリング装置及び薄膜形成方法 |
| JP4066044B2 (ja) * | 2002-11-08 | 2008-03-26 | 信行 高橋 | 成膜方法及びスパッタ装置 |
| CA2564539C (en) * | 2005-11-14 | 2014-05-06 | Sulzer Metco Coatings B.V. | A method for coating of a base body with a platinum modified aluminide ptmal by means of a physical deposition out of the gas phase |
| US8287647B2 (en) * | 2007-04-17 | 2012-10-16 | Lam Research Corporation | Apparatus and method for atomic layer deposition |
| KR100865475B1 (ko) * | 2007-08-30 | 2008-10-27 | 세메스 주식회사 | 노즐 어셈블리, 이를 갖는 처리액 공급 장치 및 이를이용하는 처리액 공급 방법 |
| US10586689B2 (en) * | 2009-07-31 | 2020-03-10 | Guardian Europe S.A.R.L. | Sputtering apparatus including cathode with rotatable targets, and related methods |
| KR20130079489A (ko) * | 2010-07-28 | 2013-07-10 | 시너스 테크놀리지, 인코포레이티드 | 기판상에 막을 증착하기 위한 회전 반응기 조립체 |
| US20130014700A1 (en) * | 2011-07-11 | 2013-01-17 | Hariharakeshava Sarpangala Hegde | Target shield designs in multi-target deposition system. |
| WO2015059228A1 (de) * | 2013-10-24 | 2015-04-30 | Roth & Rau Ag | Multimagnetronanordnung |
| EP3649410B9 (en) * | 2017-07-07 | 2022-02-23 | Nextracker Inc. | System for positioning solar panels in an array of solar panels to efficiently capture sunlight |
-
1966
- 1966-10-05 LU LU52106A patent/LU52106A1/xx unknown
-
1967
- 1967-08-21 GB GB38382/67A patent/GB1194428A/en not_active Expired
- 1967-09-18 ES ES345149A patent/ES345149A1/es not_active Expired
- 1967-09-19 BE BE704031A patent/BE704031A/xx unknown
- 1967-09-19 CH CH1308567A patent/CH501063A/fr not_active IP Right Cessation
- 1967-09-21 FR FR121839A patent/FR1556228A/fr not_active Expired
- 1967-09-21 DE DE19671615287 patent/DE1615287A1/de active Pending
- 1967-09-26 AT AT874467A patent/AT280514B/de not_active IP Right Cessation
- 1967-09-27 AT AT877167A patent/AT284365B/de not_active IP Right Cessation
- 1967-09-27 US US670853A patent/US3616451A/en not_active Expired - Lifetime
- 1967-09-27 NL NL6713182A patent/NL6713182A/xx unknown
- 1967-10-05 FI FI672690A patent/FI46636C/fi active
Also Published As
| Publication number | Publication date |
|---|---|
| FI46636B (enrdf_load_stackoverflow) | 1973-01-31 |
| GB1194428A (en) | 1970-06-10 |
| ES345149A1 (es) | 1968-11-16 |
| FI46636C (fi) | 1973-05-08 |
| AT284365B (de) | 1970-09-10 |
| FR1556228A (enrdf_load_stackoverflow) | 1969-02-07 |
| LU52106A1 (enrdf_load_stackoverflow) | 1968-05-07 |
| AT280514B (de) | 1970-04-10 |
| NL6713182A (enrdf_load_stackoverflow) | 1968-04-08 |
| BE704031A (enrdf_load_stackoverflow) | 1968-03-19 |
| US3616451A (en) | 1971-10-26 |
| CH501063A (fr) | 1970-12-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1615287A1 (de) | Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum | |
| DE2400510C2 (de) | Verfahren zum Beschichten eines langgestreckten, filmartigen Trägers und Einrichtung zur Durchführung dieses Verfahrens | |
| DE69031126T2 (de) | Drehende mikrowellenbeheizung zum grossflächigen beschichten | |
| EP0235770B1 (de) | Vorrichtung zur Plasmabehandlung von Substraten in einer durch Hochfrequenz angeregten Plasmaentladung | |
| DE69835324T2 (de) | Dampfphasenabscheidungsgerät mit kathodischem Lichtbogen (Ringförmige Kathode) | |
| EP0550003B1 (de) | Vakuumbehandlungsanlage und deren Verwendungen | |
| DE4005956C1 (enrdf_load_stackoverflow) | ||
| DE3331245A1 (de) | Ebene magnetron-zerstaeubungsvorrichtung | |
| DE3050343T1 (de) | Entrichtung zur Bestrahlung von Objekten mit Elektronen | |
| DE2856364A1 (de) | Vorrichtung zur kathodenzerstaeubung | |
| WO1986004616A1 (en) | Spraying installation for reactive coating of a substrate with hard materials | |
| WO2000039355A1 (de) | Verfahren und einrichtung zum beschichten von substraten mittels bipolarer puls-magnetron-zerstäubung und deren anwendung | |
| DE1956761A1 (de) | Vorrichtung zur Kathodenzerstaeubung | |
| DE102007060807B4 (de) | Gasentladungsquelle, insbesondere für EUV-Strahlung | |
| DE2544725C3 (de) | Elektronenstrahlverdampfer | |
| DE1914747B2 (de) | H.f.-kathodenzerstaeubungsvorrichtung | |
| DE19623359A1 (de) | Vorrichtung zum Beschichten eines Substrats | |
| DE2221600A1 (de) | Vorrichtung zum beschichten von substraten durch kathodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaess | |
| EP0677599A1 (de) | Einrichtung zur Behandlung von Gegenständen, insbesondere Galvanisiereinrichtun g für Leiterplatten | |
| DE69305725T2 (de) | Magnetron-Zerstäubungsvorrichtung und Dünnfilm-Beschichtungsverfahren | |
| DE2647149C2 (de) | Sputter-Beschichtungseinrichtung zur Herstellung beschichteter Träger | |
| EP2561114B1 (de) | Vorrichtung zum beschichten von substraten nach dem eb/pvd-verfahren | |
| DE102018114819A1 (de) | Verfahren zur Beschichtung eines Substrats und Beschichtungsanlage | |
| DE2301593C3 (de) | Wechselvorrichtung für Targets für Kathodenzerstäubung | |
| DE2655942A1 (de) | Zerstaeubungsvorrichtung |