DE1564222A1 - MOS-Transistor mit zwei Steuerelektroden - Google Patents
MOS-Transistor mit zwei SteuerelektrodenInfo
- Publication number
- DE1564222A1 DE1564222A1 DE19661564222 DE1564222A DE1564222A1 DE 1564222 A1 DE1564222 A1 DE 1564222A1 DE 19661564222 DE19661564222 DE 19661564222 DE 1564222 A DE1564222 A DE 1564222A DE 1564222 A1 DE1564222 A1 DE 1564222A1
- Authority
- DE
- Germany
- Prior art keywords
- transistor
- mos transistor
- transistors
- control
- control electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010168 coupling process Methods 0.000 claims description 16
- 238000005859 coupling reaction Methods 0.000 claims description 16
- 239000011159 matrix material Substances 0.000 claims description 8
- 238000004804 winding Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 2
- 210000004072 lung Anatomy 0.000 claims 2
- BHMLFPOTZYRDKA-IRXDYDNUSA-N (2s)-2-[(s)-(2-iodophenoxy)-phenylmethyl]morpholine Chemical compound IC1=CC=CC=C1O[C@@H](C=1C=CC=CC=1)[C@H]1OCCNC1 BHMLFPOTZYRDKA-IRXDYDNUSA-N 0.000 claims 1
- 101150018711 AASS gene Proteins 0.000 claims 1
- 102220352928 c.35C>A Human genes 0.000 claims 1
- 239000010410 layer Substances 0.000 description 19
- 230000008878 coupling Effects 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 4
- 210000000056 organ Anatomy 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XKJMBINCVNINCA-UHFFFAOYSA-N Alfalone Chemical compound CON(C)C(=O)NC1=CC=C(Cl)C(Cl)=C1 XKJMBINCVNINCA-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K17/693—Switching arrangements with several input- or output-terminals, e.g. multiplexers, distributors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B20/00—Read-only memory [ROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/611—Insulated-gate field-effect transistors [IGFET] having multiple independently-addressable gate electrodes influencing the same channel
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Insulated Gate Type Field-Effect Transistor (AREA)
- Static Random-Access Memory (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DK2466AA DK134919B (da) | 1966-01-04 | 1966-01-04 | Matrix-kobling. |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1564222A1 true DE1564222A1 (de) | 1970-01-22 |
Family
ID=8088879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19661564222 Pending DE1564222A1 (de) | 1966-01-04 | 1966-12-29 | MOS-Transistor mit zwei Steuerelektroden |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1564222A1 (enrdf_load_stackoverflow) |
DK (1) | DK134919B (enrdf_load_stackoverflow) |
NO (1) | NO120840B (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2104379A1 (de) * | 1971-01-30 | 1972-08-17 | Beneking H | Schaltung zur Realisierung einer steuerbaren Kapazität |
DE3123242A1 (de) * | 1981-06-11 | 1983-02-03 | Siemens AG, 1000 Berlin und 8000 München | Integrierbare korrelatorschaltung fuer ein bildverarbeitendes system |
EP0137257A3 (en) * | 1983-09-08 | 1986-02-19 | International Business Machines Corporation | Resistive gate field effect transistor logic family |
WO2004006338A1 (en) * | 2002-07-02 | 2004-01-15 | Sandisk Corporation | Technique for fabricating logic elements using multiple gate layers |
-
1966
- 1966-01-04 DK DK2466AA patent/DK134919B/da unknown
- 1966-12-29 DE DE19661564222 patent/DE1564222A1/de active Pending
-
1967
- 1967-01-03 NO NO166240A patent/NO120840B/no unknown
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2104379A1 (de) * | 1971-01-30 | 1972-08-17 | Beneking H | Schaltung zur Realisierung einer steuerbaren Kapazität |
DE3123242A1 (de) * | 1981-06-11 | 1983-02-03 | Siemens AG, 1000 Berlin und 8000 München | Integrierbare korrelatorschaltung fuer ein bildverarbeitendes system |
EP0137257A3 (en) * | 1983-09-08 | 1986-02-19 | International Business Machines Corporation | Resistive gate field effect transistor logic family |
WO2004006338A1 (en) * | 2002-07-02 | 2004-01-15 | Sandisk Corporation | Technique for fabricating logic elements using multiple gate layers |
US7064034B2 (en) | 2002-07-02 | 2006-06-20 | Sandisk Corporation | Technique for fabricating logic elements using multiple gate layers |
US7265423B2 (en) | 2002-07-02 | 2007-09-04 | Sandisk Corporation | Technique for fabricating logic elements using multiple gate layers |
US7425744B2 (en) | 2002-07-02 | 2008-09-16 | Sandisk Corporation | Fabricating logic and memory elements using multiple gate layers |
Also Published As
Publication number | Publication date |
---|---|
DK134919B (da) | 1977-02-07 |
NO120840B (enrdf_load_stackoverflow) | 1970-12-14 |
DK134919C (enrdf_load_stackoverflow) | 1977-06-27 |
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