DE1522463C3 - Verfahren zum Herstellen von Reliefdruckformen - Google Patents

Verfahren zum Herstellen von Reliefdruckformen

Info

Publication number
DE1522463C3
DE1522463C3 DE1522463A DEB0086310A DE1522463C3 DE 1522463 C3 DE1522463 C3 DE 1522463C3 DE 1522463 A DE1522463 A DE 1522463A DE B0086310 A DEB0086310 A DE B0086310A DE 1522463 C3 DE1522463 C3 DE 1522463C3
Authority
DE
Germany
Prior art keywords
mixture
methylol
parts
monomers
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE1522463A
Other languages
German (de)
English (en)
Other versions
DE1522463A1 (de
DE1522463B2 (de
Inventor
Rudolf Dr. 6940 Weinheim Brodt
Gerhard Dr. 6800 Mannheim Faulhaber
Josef Georg Dr. 6700 Ludwigshafen Floss
Herbert Dr. 6100 Darmstadt Henkler
Hans Dr. 6951 Heinsheim Wilhelm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Priority to DE1522463A priority Critical patent/DE1522463C3/de
Priority to CH377167A priority patent/CH475094A/de
Priority to US623553A priority patent/US3551148A/en
Priority to FR99275A priority patent/FR1520856A/fr
Priority to BE695700D priority patent/BE695700A/xx
Priority to ES338285A priority patent/ES338285A1/es
Priority to SE03972/67A priority patent/SE333689B/xx
Priority to NL676704185A priority patent/NL151521B/xx
Priority to GB03169/67A priority patent/GB1173043A/en
Priority to AT276467A priority patent/AT278054B/de
Publication of DE1522463A1 publication Critical patent/DE1522463A1/de
Publication of DE1522463B2 publication Critical patent/DE1522463B2/de
Application granted granted Critical
Publication of DE1522463C3 publication Critical patent/DE1522463C3/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE1522463A 1966-03-22 1966-03-22 Verfahren zum Herstellen von Reliefdruckformen Expired DE1522463C3 (de)

Priority Applications (10)

Application Number Priority Date Filing Date Title
DE1522463A DE1522463C3 (de) 1966-03-22 1966-03-22 Verfahren zum Herstellen von Reliefdruckformen
CH377167A CH475094A (de) 1966-03-22 1967-03-15 Platte, Film oder Folie zum Herstellen von Reliefformen für Druckzwecke
US623553A US3551148A (en) 1966-03-22 1967-03-16 Process for the production of printing plates
BE695700D BE695700A (ref) 1966-03-22 1967-03-17
FR99275A FR1520856A (fr) 1966-03-22 1967-03-17 Procédé de préparation de clichés d'impression en relief
SE03972/67A SE333689B (ref) 1966-03-22 1967-03-21
ES338285A ES338285A1 (es) 1966-03-22 1967-03-21 Procedimiento para la fabricacion de moldes en relieve parala impresion.
NL676704185A NL151521B (nl) 1966-03-22 1967-03-21 Werkwijze voor het maken van reliefvormen voor het drukken en volgens deze werkwijze verkregen reliefvormen.
GB03169/67A GB1173043A (en) 1966-03-22 1967-03-21 Photomechanical Process for the Production of Printing Plates
AT276467A AT278054B (de) 1966-03-22 1967-03-22 Photopolymerisierbares Material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1522463A DE1522463C3 (de) 1966-03-22 1966-03-22 Verfahren zum Herstellen von Reliefdruckformen

Publications (3)

Publication Number Publication Date
DE1522463A1 DE1522463A1 (de) 1969-07-24
DE1522463B2 DE1522463B2 (de) 1978-01-26
DE1522463C3 true DE1522463C3 (de) 1978-09-28

Family

ID=6983303

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1522463A Expired DE1522463C3 (de) 1966-03-22 1966-03-22 Verfahren zum Herstellen von Reliefdruckformen

Country Status (9)

Country Link
US (1) US3551148A (ref)
AT (1) AT278054B (ref)
BE (1) BE695700A (ref)
CH (1) CH475094A (ref)
DE (1) DE1522463C3 (ref)
ES (1) ES338285A1 (ref)
GB (1) GB1173043A (ref)
NL (1) NL151521B (ref)
SE (1) SE333689B (ref)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3881935A (en) * 1971-01-07 1975-05-06 Powers Chemco Inc Photosensitive polymer composition
US4145222A (en) * 1974-11-19 1979-03-20 Toyobo Co., Ltd. Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt
DE2644986C3 (de) * 1976-10-06 1981-11-19 Basf Ag, 6700 Ludwigshafen Lichtempfindliches Gemisch für die Herstellung von Reliefformen
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
WO1980001212A1 (en) * 1978-12-01 1980-06-12 Toray Industries Light-sensitive polyamide resin composition
JPS5756259A (en) * 1980-09-19 1982-04-03 Dainippon Printing Co Ltd Manufacture of gravure plate
DE3540480A1 (de) * 1985-11-15 1987-05-21 Hoechst Ag Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE3767690D1 (de) * 1986-12-26 1991-02-28 Toray Industries Lichtempfindliche photopolymerzusammensetzung und druckplatte.
DE3736180A1 (de) * 1987-10-26 1989-05-03 Basf Ag Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten
US5221589A (en) * 1990-04-06 1993-06-22 Nippon Paint Co., Ltd. Photosensitive resin composition

Also Published As

Publication number Publication date
DE1522463A1 (de) 1969-07-24
DE1522463B2 (de) 1978-01-26
BE695700A (ref) 1967-09-18
US3551148A (en) 1970-12-29
NL151521B (nl) 1976-11-15
NL6704185A (ref) 1967-09-25
AT278054B (de) 1970-01-26
CH475094A (de) 1969-07-15
ES338285A1 (es) 1968-04-01
GB1173043A (en) 1969-12-03
SE333689B (ref) 1971-03-22

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8330 Complete disclaimer