SE333689B - - Google Patents
Info
- Publication number
- SE333689B SE333689B SE03972/67A SE397267A SE333689B SE 333689 B SE333689 B SE 333689B SE 03972/67 A SE03972/67 A SE 03972/67A SE 397267 A SE397267 A SE 397267A SE 333689 B SE333689 B SE 333689B
- Authority
- SE
- Sweden
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1522463A DE1522463C3 (de) | 1966-03-22 | 1966-03-22 | Verfahren zum Herstellen von Reliefdruckformen |
Publications (1)
Publication Number | Publication Date |
---|---|
SE333689B true SE333689B (xx) | 1971-03-22 |
Family
ID=6983303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE03972/67A SE333689B (xx) | 1966-03-22 | 1967-03-21 |
Country Status (9)
Country | Link |
---|---|
US (1) | US3551148A (xx) |
AT (1) | AT278054B (xx) |
BE (1) | BE695700A (xx) |
CH (1) | CH475094A (xx) |
DE (1) | DE1522463C3 (xx) |
ES (1) | ES338285A1 (xx) |
GB (1) | GB1173043A (xx) |
NL (1) | NL151521B (xx) |
SE (1) | SE333689B (xx) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3881935A (en) * | 1971-01-07 | 1975-05-06 | Powers Chemco Inc | Photosensitive polymer composition |
US4145222A (en) * | 1974-11-19 | 1979-03-20 | Toyobo Co., Ltd. | Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt |
DE2644986C3 (de) * | 1976-10-06 | 1981-11-19 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches Gemisch für die Herstellung von Reliefformen |
DE2909992A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen |
DE2967026D1 (en) * | 1978-12-01 | 1984-07-05 | Toray Industries | Light-sensitive polyamide resin composition |
JPS5756259A (en) * | 1980-09-19 | 1982-04-03 | Dainippon Printing Co Ltd | Manufacture of gravure plate |
DE3540480A1 (de) * | 1985-11-15 | 1987-05-21 | Hoechst Ag | Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
DE3767690D1 (de) * | 1986-12-26 | 1991-02-28 | Toray Industries | Lichtempfindliche photopolymerzusammensetzung und druckplatte. |
DE3736180A1 (de) * | 1987-10-26 | 1989-05-03 | Basf Ag | Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten |
US5221589A (en) * | 1990-04-06 | 1993-06-22 | Nippon Paint Co., Ltd. | Photosensitive resin composition |
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1966
- 1966-03-22 DE DE1522463A patent/DE1522463C3/de not_active Expired
-
1967
- 1967-03-15 CH CH377167A patent/CH475094A/de not_active IP Right Cessation
- 1967-03-16 US US623553A patent/US3551148A/en not_active Expired - Lifetime
- 1967-03-17 BE BE695700D patent/BE695700A/xx not_active IP Right Cessation
- 1967-03-21 NL NL676704185A patent/NL151521B/xx unknown
- 1967-03-21 GB GB03169/67A patent/GB1173043A/en not_active Expired
- 1967-03-21 SE SE03972/67A patent/SE333689B/xx unknown
- 1967-03-21 ES ES338285A patent/ES338285A1/es not_active Expired
- 1967-03-22 AT AT276467A patent/AT278054B/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
BE695700A (xx) | 1967-09-18 |
CH475094A (de) | 1969-07-15 |
DE1522463A1 (de) | 1969-07-24 |
AT278054B (de) | 1970-01-26 |
DE1522463C3 (de) | 1978-09-28 |
NL151521B (nl) | 1976-11-15 |
ES338285A1 (es) | 1968-04-01 |
DE1522463B2 (de) | 1978-01-26 |
NL6704185A (xx) | 1967-09-25 |
US3551148A (en) | 1970-12-29 |
GB1173043A (en) | 1969-12-03 |